US2004075991A1PendingUtilityA1
Vapor phase connection techniques
Est. expiryAug 11, 2019(expired)· nominal 20-yr term from priority
H10W 70/095Y10T29/49126Y10T29/49165Y10T29/49155Y10T29/49167H05K 3/4076
41
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Claims
Abstract
Electrical connections are made between a pair of elements disposed on opposite side of the hole extending through a dielectric layer by evaporating a conductive material such as a metal having high vapor pressure within the hole while maintaining the hole in a substantially sealed condition. The process may be performed simultaneously to form numerous connections within a microelectronic unit as, for example, within a multilayer circuit panel.
Claims
exact text as granted — not AI-modified1 . A component for making connections in a microelectronic assembly comprising:
(a) a dielectric layer having first and second surfaces; (b) a plurality of elongated conductors on said first surface; and (c) slots in said dielectric layer extending through the layer beneath said conductors, said slots extending in the direction of elongation of said conductors.
2 . A component as claimed in claim 1 further comprising a dispersible conductive material disposed in said slots.Join the waitlist — get patent alerts
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