US2004075991A1PendingUtilityA1

Vapor phase connection techniques

Assignee: TESSERA INCPriority: Aug 11, 1999Filed: Oct 10, 2003Published: Apr 22, 2004
Est. expiryAug 11, 2019(expired)· nominal 20-yr term from priority
H10W 70/095Y10T29/49126Y10T29/49165Y10T29/49155Y10T29/49167H05K 3/4076
41
PatentIndex Score
0
Cited by
0
References
0
Claims

Abstract

Electrical connections are made between a pair of elements disposed on opposite side of the hole extending through a dielectric layer by evaporating a conductive material such as a metal having high vapor pressure within the hole while maintaining the hole in a substantially sealed condition. The process may be performed simultaneously to form numerous connections within a microelectronic unit as, for example, within a multilayer circuit panel.

Claims

exact text as granted — not AI-modified
1 . A component for making connections in a microelectronic assembly comprising: 
 (a) a dielectric layer having first and second surfaces;    (b) a plurality of elongated conductors on said first surface; and    (c) slots in said dielectric layer extending through the layer beneath said conductors, said slots extending in the direction of elongation of said conductors.    
     
     
         2 . A component as claimed in  claim 1  further comprising a dispersible conductive material disposed in said slots.

Join the waitlist — get patent alerts

Track US2004075991A1 — get alerts on status changes and closely related new filings.

We store only your email — no account needed. See our privacy policy.