US11634441B2ActiveUtilityA1

Group 5 metal compound for thin film deposition and method of forming group 5 metal-containing thin film using same

87
Assignee: EGTM CO LTDPriority: Jun 30, 2020Filed: Jun 9, 2021Granted: Apr 25, 2023
Est. expiryJun 30, 2040(~13.9 yrs left)· nominal 20-yr term from priority
Inventors:Tae Young LeeSung Jun JiSun Young Baik
H10P 14/6339H10P 14/668H10P 14/69395C23C 16/4481C23C 16/45553C23C 16/45527C23C 16/405C07F 17/00C23C 16/34C23C 16/18C07F 9/00
87
PatentIndex Score
2
Cited by
19
References
2
Claims

Abstract

A group 5 metal compound according to an embodiment of the present disclosure is represented by any one of the following <Chemical Formula 1> and <Chemical Formula 2>:In <Chemical Formula 1> and <Chemical Formula 2>,M is any one selected from group 5 metal elements,n is any one selected from an integer of 1 to 5,R1 is any one selected from a linear alkyl group having 3 to 6 carbon atoms and a branched alkyl group having 3 to 6 carbon atoms, andR2 and R3 are each independently any one selected from hydrogen, a linear alkyl group having 1 to 4 carbon atoms, and a branched alkyl group having 1 to 4 carbon atoms.

Claims

exact text as granted — not AI-modified
What is claimed is: 
     
       1. A group 5 metal compound represented by the following <Chemical Formula 
       
         
           
           
               
               
           
         
       
       wherein M is any one selected from the group 5 metal elements. 
     
     
       2. A precursor composition for depositing a group 5 metal-containing thin film, the precursor composition comprising the group 5 metal compound represented by the following <Chemical Formula 1>: 
       
         
           
           
               
               
           
         
       
       wherein M is any one selected from the group 5 metal elements.

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