Inventor · disambiguated record
Robert C. Cook
Also filed as: COOK ROBERT · COOK ROBERT C
19 granted patents·8 pending applications·1,381 citations·filing 1978–2009
96Inventor score
Files withTORREX EQUIPMENT CORP8SECURITRON MAGNALOCK CORP4APPLIED MATERIALS INC3COOK ROBERT C2FERROSIL CORP2
Top patents by PatentIndex Score
27 records- 0198US6321680B2Vertical plasma enhanced process apparatus and methodTORREX EQUIPMENT CORP·Filed 1999·Granted Nov 27, 2001·526 cites·4 claims
- 0294US5551985AMethod and apparatus for cold wall chemical vapor depositionTORREX EQUIPMENT CORP·Filed 1995·Granted Sep 3, 1996·135 cites·9 claims
- 0393US5668533AHigh security balanced-type, magnetically-actuated proximity switch systemSECURITRON MAGNALOCK CORP·Filed 1995·Granted Sep 16, 1997·87 cites·65 claims
- 0492US6352593B1Mini-batch process chamberTORREX EQUIPMENT CORP·Filed 1997·Granted Mar 5, 2002·118 cites·20 claims
- 0592US4682801AElectromagnet access control circuitSECURITRON MAGNALOCK CORP·Filed 1984·Granted Jul 28, 1987·82 cites·16 claims
- 0692US4149302AMonolithic semiconductor integrated circuit ferroelectric memory deviceFERROSIL CORP·Filed 1978·Granted Apr 17, 1979·50 cites·14 claims
- 0792US4149301AMonolithic semiconductor integrated circuit-ferroelectric memory driveFERROSIL CORP·Filed 1978·Granted Apr 17, 1979·49 cites·53 claims
- 0888US4871204ATouch bar release locking systemSECURITRON MAGNALOCK CORP·Filed 1988·Granted Oct 3, 1989·62 cites·18 claims
- 0986US7748542B2Batch deposition tool and compressed boatAPPLIED MATERIALS INC·Filed 2005·Granted Jul 6, 2010·11 cites·15 claims
- 1083US6352594B2Method and apparatus for improved chemical vapor deposition processes using tunable temperature controlled gas injectorsTORREX·Filed 1999·Granted Mar 5, 2002·80 cites·12 claims
- 1172US4262591AOffice label printer and dispenserCOOK ROBERT C·Filed 1978·Granted Apr 21, 1981·22 cites·1 claims
- 1270USRE36957EMethod and apparatus for cold wall chemical vapor depositionTORREX EQUIPMENT CORP·Filed 1998·Granted Nov 21, 2000·28 cites·10 claims
- 1370US4516114AMagnetic locking status detection systemSECURITRON MAGNALOCK CORP·Filed 1983·Granted May 7, 1985·27 cites·10 claims
- 1469US6167837B1Apparatus and method for plasma enhanced chemical vapor deposition (PECVD) in a single wafer reactorTORREX EQUIPMENT CORP·Filed 1999·Granted Jan 2, 2001·36 cites·8 claims
- 1566US6287635B1High rate silicon deposition method at low pressuresTORREX EQUIPMENT CORP·Filed 1999·Granted Sep 11, 2001·30 cites·19 claims
- 1660US6780464B2Thermal gradient enhanced CVD deposition at low pressureTORREX EQUIPMENT·Filed 2001·Granted Aug 24, 2004·8 cites·9 claims
- 1760US6506691B2High rate silicon nitride deposition method at low pressuresTORREX EQUIPMENT CORP·Filed 1999·Granted Jan 14, 2003·22 cites·12 claims
- 1858US7381926B2Removable heaterAPPLIED MATERIALS INC·Filed 2005·Granted Jun 3, 2008·1 cites·10 claims
- 1954US2010047447A1Multiple substrate item holder and reactorCOOK ROBERT C·Filed 2008·Application pending·0 cites
- 2049US2017060856A1Efficient search and analysis based on a range indexTURTLE HOWARD·Filed 2009·Application pending·0 cites
- 2143US2005013937A1Thermal gradient enhanced CVD deposition at low pressureFiled 2004·Application pending·0 cites
- 2240US2007084408A1Batch processing chamber with diffuser plate and injector assemblyAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 2339US6235652B1High rate silicon dioxide deposition at low pressuresTORREX EQUIPMENT CORP·Filed 1999·Granted May 22, 2001·7 cites·15 claims
- 2438US2007084406A1Reaction chamber with opposing pockets for gas injection and exhaustYUDOVSKY JOSEPH·Filed 2005·Application pending·0 cites
- 2536US2005188923A1Substrate carrier for parallel wafer processing reactorFiled 2004·Application pending·0 cites
- 2636US2003049372A1High rate deposition at low pressures in a small batch reactorFiled 2002·Application pending·0 cites
- 2732US2008308874A1Complementary Asymmetric High Voltage Devices and Method of FabricationNXP BV·Filed 2006·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →