Inventor · disambiguated record
Bassam Hanna Abraham
Also filed as: ABRAHAM BASSAM HANNA
20 granted patents·7 pending applications·148 citations·filing 2007–2022
95Inventor score
Top patents by PatentIndex Score
27 records- 0198US11306391B2Magnetically enhanced low temperature-high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like filmsIONQUEST CORP·Filed 2020·Granted Apr 19, 2022·3 cites·20 claims
- 0297US10913998B2Magnetically enhanced high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like filmsIONQUEST CORP·Filed 2019·Granted Feb 9, 2021·11 cites·15 claims
- 0397US10227691B2Magnetically enhanced low temperature-high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond like filmsIonQuest LLC·Filed 2016·Granted Mar 12, 2019·14 cites·15 claims
- 0497US10227692B2Magnetically enhanced high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like filmsIonQuest LLC·Filed 2018·Granted Mar 12, 2019·13 cites·14 claims
- 0597US9951414B2Magnetically enhanced high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like filmsIonQuest LLC·Filed 2016·Granted Apr 24, 2018·16 cites·16 claims
- 0696US11823859B2Sputtering a layer on a substrate using a high-energy density plasma magnetronIONQUEST CORP·Filed 2020·Granted Nov 21, 2023·4 cites·19 claims
- 0796US10957519B2Magnetically enhanced high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like filmsIonQuest LLC·Filed 2016·Granted Mar 23, 2021·10 cites·31 claims
- 0896US10480063B2Capacitive coupled plasma source for sputtering and resputteringIonQuest LLC·Filed 2016·Granted Nov 19, 2019·13 cites·20 claims
- 0994US7898183B2Methods and apparatus for generating strongly-ionized plasmas with ionizational instabilitiesZOND INC·Filed 2009·Granted Mar 1, 2011·21 cites·26 claims
- 1092US7663319B2Methods and apparatus for generating strongly-ionized plasmas with ionizational instabilitiesZOND INC·Filed 2007·Granted Feb 16, 2010·14 cites·27 claims
- 1191US11359274B2Electrically and magnetically enhanced ionized physical vapor deposition unbalanced sputtering sourceIONQUEST CORP·Filed 2019·Granted Jun 14, 2022·6 cites·24 claims
- 1291US10900118B2Magnetically enhanced low temperature-high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond like filmsIONQUEST CORP·Filed 2019·Granted Jan 26, 2021·3 cites·19 claims
- 1391US9123508B2Apparatus and method for sputtering hard coatingsCHISTYAKOV ROMAN·Filed 2011·Granted Sep 1, 2015·11 cites·11 claims
- 1488US11482404B2Electrically and magnetically enhanced ionized physical vapor deposition unbalanced sputtering sourceIonQuest LLC·Filed 2016·Granted Oct 25, 2022·5 cites·22 claims
- 1581US11821068B2Magnetically enhanced high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like filmsIONQUEST CORP·Filed 2022·Granted Nov 21, 2023·0 cites·20 claims
- 1679US9771648B2Method of ionized physical vapor deposition sputter coating high aspect-ratio structuresCHISTYAKOV ROMAN·Filed 2007·Granted Sep 26, 2017·4 cites·13 claims
- 1776US11286555B2Magnetically enhanced high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like filmsIONQUEST CORP·Filed 2020·Granted Mar 29, 2022·0 cites·17 claims
- 1869US11255012B2Electrically and magnetically enhanced ionized physical vapor deposition unbalanced sputtering sourceIONQUEST CORP·Filed 2019·Granted Feb 22, 2022·0 cites·13 claims
- 1968US12077849B2Electrically and magnetically enhanced ionized physical vapor deposition unbalanced sputtering sourceIONQUEST CORP·Filed 2022·Granted Sep 3, 2024·0 cites·20 claims
- 2068US2021317569A1Magnetically Enhanced High Density Plasma-Chemical Vapor Deposition Plasma Source For Depositing Diamond and Diamond-Like FilmsIONQUEST CORP·Filed 2021·Application pending·0 cites
- 2163US2009321249A1Method of Hard Coating a BladeZOND INC·Filed 2009·Application pending·0 cites
- 2262US2023005724A1Electrically and Magnetically Enhanced Ionized Physical Vapor Deposition Unbalanced Sputtering SourceIONQUEST CORP·Filed 2022·Application pending·0 cites
- 2360US2018044780A1Apparatus and method for sputtering hard coatingsCHISTYAKOV ROMAN·Filed 2017·Application pending·0 cites
- 2459US12217949B2Magnetically enhanced high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like filmsIONQUEST CORP·Filed 2021·Granted Feb 4, 2025·0 cites·31 claims
- 2556US2017029937A1Method of coating high aspect ratio featuresZOND INC·Filed 2016·Application pending·0 cites
- 2655US2015315697A1Apparatus and method for sputtering hard coatingsCHISTYAKOV ROMAN·Filed 2015·Application pending·0 cites
- 2739US2020176234A1High-power resonance pulse ac hedp sputtering source and method for material processingIONQUEST CORP·Filed 2017·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →