Inventor · disambiguated record
Joshua Hooge
Also filed as: HOOGE JOSHUA · HOOGE JOSHUA S · HOOGE JOSHUA STEVEN
23 granted patents·9 pending applications·85 citations·filing 2011–2024
93Inventor score
Top patents by PatentIndex Score
32 records- 0197US9519227B2Metrology for measurement of photosensitizer concentration within photo-sensitized chemically-amplified resist (PS-CAR)TOKYO ELECTRON LTD·Filed 2015·Granted Dec 13, 2016·12 cites·20 claims
- 0294US9618848B2Methods and techniques to use with photosensitized chemically amplified resist chemicals and processesTOKYO ELECTRON LTD·Filed 2015·Granted Apr 11, 2017·12 cites·10 claims
- 0394US8795952B2Line pattern collapse mitigation through gap-fill material applicationSOMERVELL MARK H·Filed 2011·Granted Aug 5, 2014·13 cites·20 claims
- 0493US10809620B1Systems and methods for developer drain line monitoringTOKYO ELECTRON LTD·Filed 2019·Granted Oct 20, 2020·8 cites·18 claims
- 0593US10622233B2Amelioration of global wafer distortion based on determination of localized distortions of a semiconductor waferTOKYO ELECTRON LTD·Filed 2018·Granted Apr 14, 2020·14 cites·20 claims
- 0692US10020195B2Chemical amplification methods and techniques for developable bottom anti-reflective coatings and dyed implant resistsTOKYO ELECTRON LTD·Filed 2015·Granted Jul 10, 2018·8 cites·18 claims
- 0789US9454081B2Line pattern collapse mitigation through gap-fill material applicationTOKYO ELECTRON LTD·Filed 2014·Granted Sep 27, 2016·4 cites·20 claims
- 0886US11738363B2Bath systems and methods thereofTOKYO ELECTRON LTD·Filed 2021·Granted Aug 29, 2023·1 cites·19 claims
- 0982US10048587B2Method and apparatus for increased recirculation and filtration in a photoresist dispense system using a liquid empty reservoirTOKYO ELECTRON LTD·Filed 2015·Granted Aug 14, 2018·3 cites·6 claims
- 1080US12226796B2Bath systems and methods thereofTOKYO ELECTRON LTD·Filed 2023·Granted Feb 18, 2025·0 cites·20 claims
- 1180US10403501B2High-purity dispense systemTOKYO ELECTRON LTD·Filed 2017·Granted Sep 3, 2019·3 cites·18 claims
- 1280US9711419B2Substrate backside texturingTOKYO ELECTRON LTD·Filed 2015·Granted Jul 18, 2017·3 cites·16 claims
- 1379US2025196175A1Bath systems and methods thereofTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1477US10262880B2Cover plate for wind mark control in spin coating processTOKYO ELECTRON LTD·Filed 2013·Granted Apr 16, 2019·4 cites·18 claims
- 1567US11168978B2Hardware improvements and methods for the analysis of a spinning reflective substratesTOKYO ELECTRON LTD·Filed 2020·Granted Nov 9, 2021·0 cites·20 claims
- 1664US12488452B2Wafer bath imagingTOKYO ELECTRON LTD·Filed 2021·Granted Dec 2, 2025·0 cites·18 claims
- 1762US11624607B2Hardware improvements and methods for the analysis of a spinning reflective substratesTOKYO ELECTRON LTD·Filed 2020·Granted Apr 11, 2023·0 cites·21 claims
- 1861US2025308977A1Eccentricity based wafer shape controlTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1959US2020348596A1Method and apparatus for multiple recirculation and filtration cycles per dispense in a photoresist dispense systemTOKYO ELECTRON LTD·Filed 2020·Application pending·0 cites
- 2058US11998945B2Methods and systems to monitor, control, and synchronize dispense systemsTOKYO ELECTRON LTD·Filed 2020·Granted Jun 4, 2024·0 cites·19 claims
- 2157US11276157B2Systems and methods for automated video analysis detection techniques for substrate processTOKYO ELECTRON LTD·Filed 2020·Granted Mar 15, 2022·0 cites·19 claims
- 2257US2024128212A1Surface energy modification in hybrid bondingTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 2356US11637031B2Systems and methods for spin process video analysis during substrate processingTOKYO ELECTRON LTD·Filed 2020·Granted Apr 25, 2023·0 cites·19 claims
- 2455US2016363868A1Line pattern collapse mitigation through gap-fill material applicationTOKYO ELECTRON LTD·Filed 2016·Application pending·0 cites
- 2555US2025105066A1Systems and methods that use infrared (ir) spectroscopy to monitor process chemicals utilized in a semiconductor processTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 2654US12165870B2Chemical amplification methods and techniques for developable bottom anti-reflective coatings and dyed implant resistsTOKYO ELECTRON LTD·Filed 2018·Granted Dec 10, 2024·0 cites·22 claims
- 2754US11474028B2Systems and methods for monitoring one or more characteristics of a substrateTOKYO ELECTRON LTD·Filed 2020·Granted Oct 18, 2022·0 cites·25 claims
- 2853US2024421009A1Systems and methods for determining a fluid height and/or a fluid velocity on a spinning substrateTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 2951US10534266B2Methods and techniques to use with photosensitized chemically amplified resist chemicals and processesTOKYO ELECTRON LTD·Filed 2017·Granted Jan 14, 2020·0 cites·22 claims
- 3048US2022269177A1Sensor technology integration into coating trackTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 3138US10354872B2High-precision dispense system with meniscus controlTOKYO ELECTRON LTD·Filed 2017·Granted Jul 16, 2019·0 cites·18 claims
- 3236US2016358786A1Techniques for Spin-on-Carbon PlanarizationTOKYO ELECTRON LTD·Filed 2016·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →