Inventor · disambiguated record
Masahide Iwasaki
Also filed as: IWASAKI MASAHIDE
21 granted patents·7 pending applications·184 citations·filing 2000–2018
94Inventor score
Files withTOKYO ELECTRON LTD17IWASAKI MASAHIDE4FAGUET JACQUES1HAYAMI TOSHIHIRO1KABUSHIKI KAISHI KOBE SEIKO SH1
Top patents by PatentIndex Score
28 records- 0196US10145014B2Film forming apparatusTOKYO ELECTRON LTD·Filed 2013·Granted Dec 4, 2018·17 cites·11 claims
- 0294US7846293B2Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2005·Granted Dec 7, 2010·42 cites·9 claims
- 0386US6164247AIntermediate fluid type vaporizer, and natural gas supply method using the vaporizerKABUSHIKI KAISHI KOBE SEIKO SH·Filed 2000·Granted Dec 26, 2000·38 cites·22 claims
- 0485US9275837B2Plasma processing apparatusYAMAZAWA YOHEI·Filed 2010·Granted Mar 1, 2016·7 cites·8 claims
- 0584US7419567B2Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2005·Granted Sep 2, 2008·8 cites·15 claims
- 0683US9887068B2Plasma process apparatusTOKYO ELECTRON LTD·Filed 2014·Granted Feb 6, 2018·4 cites·14 claims
- 0783US7789962B2Device and method for controlling temperature of a mounting table, a program therefor, and a processing apparatus including sameTOKYO ELECTRON LTD·Filed 2006·Granted Sep 7, 2010·8 cites·15 claims
- 0883US6367429B2Intermediate fluid type vaporizerKOBE STEEL LTD·Filed 2001·Granted Apr 9, 2002·38 cites·11 claims
- 0982US8973527B2Plasma processing apparatus, plasma processing method, method for cleaning plasma processing apparatus and pressure control valve for plasma processing apparatusNOZAWA TOSHIHISA·Filed 2009·Granted Mar 10, 2015·4 cites·5 claims
- 1078US9574267B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Feb 21, 2017·2 cites·5 claims
- 1174US8815014B2Method and system for performing different deposition processes within a single chamberFAGUET JACQUES·Filed 2011·Granted Aug 26, 2014·3 cites·15 claims
- 1268US9691591B2Plasma processing apparatusIWASAKI MASAHIDE·Filed 2012·Granted Jun 27, 2017·2 cites·9 claims
- 1367US9831067B2Film-forming apparatusTOKYO ELECTRON LTD·Filed 2013·Granted Nov 28, 2017·2 cites·13 claims
- 1467US8967082B2Plasma processing apparatus and gas supply device for plasma processing apparatusIWASAKI MASAHIDE·Filed 2010·Granted Mar 3, 2015·2 cites·12 claims
- 1566US10513777B2Film formation deviceTOKYO ELECTRON LTD·Filed 2013·Granted Dec 24, 2019·2 cites·7 claims
- 1665US10844489B2Film forming apparatus and shower headTOKYO ELECTRON LTD·Filed 2015·Granted Nov 24, 2020·1 cites·15 claims
- 1762US8182869B2Method for controlling temperature of a mounting tableIWASAKI MASAHIDE·Filed 2010·Granted May 22, 2012·1 cites·8 claims
- 1861US10734197B2Plasma process apparatusTOKYO ELECTRON LTD·Filed 2017·Granted Aug 4, 2020·0 cites·7 claims
- 1960US2010101728A1Plasma process apparatusTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 2052US8628640B2Plasma processing unit and high-frequency electric power supplying unitHAYAMI TOSHIHIRO·Filed 2004·Granted Jan 14, 2014·3 cites·25 claims
- 2148US2015155141A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 2246US9631274B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Apr 25, 2017·0 cites·4 claims
- 2346US8262848B2Plasma processing apparatus and methodIWASAKI MASAHIDE·Filed 2010·Granted Sep 11, 2012·0 cites·12 claims
- 2443US2015255258A1Plasma processing apparatus and substrate processing apparatus provided with sameTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 2540US2019177845A1Semiconductor Process ChamberSAMSUNG ELECTRONICS CO LTD·Filed 2018·Application pending·0 cites
- 2638US2018245216A1Film forming apparatusTOKYO ELECTRON LTD·Filed 2018·Application pending·0 cites
- 2735US2016138162A1Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2015·Application pending·0 cites
- 2833US2016322218A1Film Forming Method and Film Forming ApparatusTOKYO ELECTRON LTD·Filed 2016·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →