Inventor · disambiguated record
Lori D. Washington
Also filed as: WASHINGTON LORI · WASHINGTON LORI D
36 granted patents·28 pending applications·773 citations·filing 1999–2025
97Inventor score
Top patents by PatentIndex Score
64 records- 0197US7976631B2Multi-gas straight channel showerheadAPPLIED MATERIALS INC·Filed 2007·Granted Jul 12, 2011·247 cites·25 claims
- 0295US6911401B2Method for CVD process control for enhancing device performanceAPPLIED MATERIALS INC·Filed 2003·Granted Jun 28, 2005·240 cites·84 claims
- 0394US7413957B2Methods for forming a transistorAPPLIED MATERIALS INC·Filed 2005·Granted Aug 19, 2008·25 cites·18 claims
- 0493US7674352B2System and method for depositing a gaseous mixture onto a substrate surface using a showerhead apparatusAPPLIED MATERIALS INC·Filed 2006·Granted Mar 9, 2010·25 cites·5 claims
- 0593US7560364B2Dislocation-specific lateral epitaxial overgrowth to reduce dislocation density of nitride filmsAPPLIED MATERIALS INC·Filed 2006·Granted Jul 14, 2009·27 cites·23 claims
- 0692US9175393B1Tiled showerhead for a semiconductor chemical vapor deposition reactorHIGASHI GREGG·Filed 2011·Granted Nov 3, 2015·16 cites·21 claims
- 0792US7585769B2Parasitic particle suppression in growth of III-V nitride films using MOCVD and HVPEAPPLIED MATERIALS INC·Filed 2006·Granted Sep 8, 2009·21 cites·38 claims
- 0891US7651948B2Pre-cleaning of substrates in epitaxy chambersAPPLIED MATERIALS INC·Filed 2006·Granted Jan 26, 2010·18 cites·20 claims
- 0990US6455814B1Backside heating chamber for emissivity independent thermal processesAPPLIED MATERIALS INC·Filed 2001·Granted Sep 24, 2002·51 cites·17 claims
- 1088US10066297B2Tiled showerhead for a semiconductor chemical vapor deposition reactorALTA DEVICES INC·Filed 2015·Granted Sep 4, 2018·5 cites·20 claims
- 1188US9932670B2Method of decontamination of process chamber after in-situ chamber cleanAPPLIED MATERIALS INC·Filed 2014·Granted Apr 3, 2018·7 cites·7 claims
- 1287US8481118B2Multi-gas straight channel showerheadBURROWS BRIAN H·Filed 2011·Granted Jul 9, 2013·14 cites·9 claims
- 1386US7459380B2Dislocation-specific dielectric mask deposition and lateral epitaxial overgrowth to reduce dislocation density of nitride filmsAPPLIED MATERIALS INC·Filed 2006·Granted Dec 2, 2008·16 cites·28 claims
- 1485US12492487B2Movable central reflectors of semiconductor processing equipment, and related systems and methodsAPPLIED MATERIALS INC·Filed 2023·Granted Dec 9, 2025·0 cites·20 claims
- 1585US9212422B2CVD reactor with gas flow virtual wallsHIGASHI GREGG·Filed 2011·Granted Dec 15, 2015·3 cites·8 claims
- 1683US9644267B2Multi-gas straight channel showerheadAPPLIED MATERIALS INC·Filed 2013·Granted May 9, 2017·6 cites·20 claims
- 1781US7470599B2Dual-side epitaxy processes for production of nitride semiconductor structuresAPPLIED MATERIALS INC·Filed 2006·Granted Dec 30, 2008·8 cites·29 claims
- 1879US2024360590A1Gas exhaust frames including pathways having size variations, and related apparatus and methodsAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 1978US8105908B2Methods for forming a transistor and modulating channel stressTHIRUPAPULIYUR SUNDERRAJ·Filed 2005·Granted Jan 31, 2012·10 cites·6 claims
- 2078US7781016B2Method for measuring precursor amounts in bubbler sourcesAPPLIED MATERIALS INC·Filed 2006·Granted Aug 24, 2010·3 cites·21 claims
- 2178US7374960B1Stress measurement and stress balance in filmsAPPLIED MATERIALS INC·Filed 2006·Granted May 20, 2008·6 cites·17 claims
- 2273US2024318351A1Multi-thermal cvd chambers with shared gas delivery and exhaust systemAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 2372US7575982B2Stacked-substrate processes for production of nitride semiconductor structuresAPPLIED MATERIALS INC·Filed 2006·Granted Aug 18, 2009·4 cites·12 claims
- 2469US10718051B2Methods for chemical vapor deposition (CVD) in a movable liner assemblyALTA DEVICES INC·Filed 2018·Granted Jul 21, 2020·0 cites·14 claims
- 2568US9834860B2Method of high growth rate deposition for group III/V materialsWASHINGTON LORI D·Filed 2010·Granted Dec 5, 2017·3 cites·15 claims
- 2665US2025122624A1Gas flow improvement for process chamberAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 2764US2024141493A1Single piece or two piece susceptorAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 2863US12037701B2Multi-thermal CVD chambers with shared gas delivery and exhaust systemAPPLIED MATERIALS INC·Filed 2021·Granted Jul 16, 2024·0 cites·16 claims
- 2962US6544033B1Wafer carrierAPPLIED MATERIALS INC·Filed 2000·Granted Apr 8, 2003·9 cites·28 claims
- 3061US9982346B2Movable liner assembly for a deposition zone in a CVD reactorHIGASHI GREGG·Filed 2011·Granted May 29, 2018·0 cites·12 claims
- 3160US12512362B2Susceptor improvementAPPLIED MATERIALS INC·Filed 2023·Granted Dec 30, 2025·0 cites·20 claims
- 3257US7968413B2Methods for forming a transistorAPPLIED MATERIALS INC·Filed 2008·Granted Jun 28, 2011·0 cites·17 claims
- 3357US7833869B2Methods for forming a transistorAPPLIED MATERIALS INC·Filed 2008·Granted Nov 16, 2010·0 cites·18 claims
- 3456US12015042B2Structure and material engineering methods for optoelectronic devices signal to noise ratio enhancementAPPLIED MATERIALS INC·Filed 2020·Granted Jun 18, 2024·0 cites·9 claims
- 3556US10873001B2Methods of manufacturing optoelectronic devices using different growth substratesALTA DEVICES INC·Filed 2019·Granted Dec 22, 2020·0 cites·25 claims
- 3656US2009149008A1Method for depositing group iii/v compoundsAPPLIED MATERIALS INC·Filed 2008·Application pending·0 cites
- 3756US2025315565A1Process recipe transfer and chamber matching by modelingAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 3855US2024248298A1Apparatus and methods for heating tunability in processing chambersAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 3955US2024248297A1Apparatus and methods for heating tunability in processing chambersAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 4055US2024248282A1Apparatus and methods for heating tunability in processing chambersAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 4153US2008092819A1Substrate support structure with rapid temperature changeAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 4253US2023212742A1Model-based purge gas flowAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 4351US2007254093A1MOCVD reactor with concentration-monitor feedbackAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 4451US2007254100A1MOCVD reactor without metalorganic-source temperature controlAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 4551US2007256635A1UV activation of NH3 for III-N depositionAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 4650US11075313B2Optoelectronic devices manufactured using different growth substratesUTICA LEASECO LLC·Filed 2019·Granted Jul 27, 2021·0 cites·9 claims
- 4750US2008289575A1Methods and apparatus for depositing a group iii-v film using a hydride vapor phase epitaxy processBURROWS BRIAN H·Filed 2007·Application pending·0 cites
- 4850US2008276860A1Cross flow apparatus and method for hydride vapor phase depositionBURROWS BRIAN H·Filed 2007·Application pending·0 cites
- 4949US10811557B2Growth structure under a release layer for manufacturing of optoelectronic devicesALTA DEVICES INC·Filed 2018·Granted Oct 20, 2020·0 cites·25 claims
- 5048US2011117728A1Method of decontamination of process chamber after in-situ chamber cleanAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
Showing the top 50 of 64 patent records by PatentIndex Score.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →