Inventor · disambiguated record
Masato Kushibiki
Also filed as: KUSHIBIKI MASATO
20 granted patents·1 pending application·251 citations·filing 2002–2014
92Inventor score
Top patents by PatentIndex Score
21 records- 0198US8491805B2Semiconductor device manufacturing method and plasma etching apparatusKUSHIBIKI MASATO·Filed 2011·Granted Jul 23, 2013·211 cites·8 claims
- 0286US8383521B2Substrate processing methodTOKYO ELECTRON LTD·Filed 2010·Granted Feb 26, 2013·8 cites·8 claims
- 0386US7811939B2Plasma etching methodTOKYO ELECTRON LTD·Filed 2007·Granted Oct 12, 2010·12 cites·14 claims
- 0477US9660182B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2013·Granted May 23, 2017·5 cites·8 claims
- 0571US9208997B2Method of etching copper layer and maskTOKYO ELECTRON LTD·Filed 2013·Granted Dec 8, 2015·2 cites·3 claims
- 0671US8241511B2Substrate processing methodKUSHIBIKI MASATO·Filed 2008·Granted Aug 14, 2012·3 cites·7 claims
- 0770US8642136B2Substrate processing method and substrate processing apparatus for performing a deposition process and calculating a termination time of the deposition processKUSHIBIKI MASATO·Filed 2009·Granted Feb 4, 2014·3 cites·5 claims
- 0870US7604908B2Fine pattern forming methodTOKYO ELECTRON LTD·Filed 2006·Granted Oct 20, 2009·3 cites·12 claims
- 0968US9165784B2Substrate processing method and storage mediumNISHIMURA EIICHI·Filed 2012·Granted Oct 20, 2015·2 cites·4 claims
- 1063US9419211B2Etching method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2013·Granted Aug 16, 2016·1 cites·7 claims
- 1152US8772172B2Semiconductor device manufacturing method and plasma etching apparatusTOKYO ELECTRON LTD·Filed 2013·Granted Jul 8, 2014·0 cites·8 claims
- 1251US8530354B2Substrate processing methodKUSHIBIKI MASATO·Filed 2012·Granted Sep 10, 2013·0 cites·3 claims
- 1350US8252698B2Substrate processing methodKUSHIBIKI MASATO·Filed 2009·Granted Aug 28, 2012·0 cites·20 claims
- 1450US2013122429A1Pattern forming method and manufacturing method of semiconductor deviceTOKYO ELECTRON LTD·Filed 2012·Application pending·0 cites
- 1549US8962489B2Method for etching film containing cobalt and palladiumTOKYO ELECTRON LTD·Filed 2014·Granted Feb 24, 2015·0 cites·4 claims
- 1646US8815495B2Pattern forming method and manufacturing method of semiconductor deviceKUSHIBIKI MASATO·Filed 2010·Granted Aug 26, 2014·0 cites·15 claims
- 1745US7256135B2Etching method and computer storage medium storing program for controlling sameTOKYO ELECTRON LTD·Filed 2004·Granted Aug 14, 2007·1 cites·15 claims
- 1844US7897498B2Method for manufacturing semiconductor deviceTOKYO ELECTRON LTD·Filed 2005·Granted Mar 1, 2011·0 cites·9 claims
- 1941US8202805B2Substrate processing methodKUSHIBIKI MASATO·Filed 2010·Granted Jun 19, 2012·0 cites·18 claims
- 2039US8491804B2Substrate processing methodKUSHIBIKI MASATO·Filed 2010·Granted Jul 23, 2013·0 cites·20 claims
- 2133US7192532B2Dry etching methodTOKYO ELECTRON LTD·Filed 2002·Granted Mar 20, 2007·0 cites·11 claims
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