Inventor · disambiguated record
Yogananda Sarode Vishwanath
Also filed as: VISHWANATH YOGANANDA SARODE
7 granted patents·8 pending applications·159 citations·filing 2013–2024
79Inventor score
Files withAPPLIED MATERIALS INC15
Top patents by PatentIndex Score
15 records- 0198US9287095B2Semiconductor system assemblies and methods of operationAPPLIED MATERIALS INC·Filed 2013·Granted Mar 15, 2016·153 cites·17 claims
- 0283US9449794B2Symmetrical inductively coupled plasma source with side RF feeds and spiral coil antennaAPPLIED MATERIALS INC·Filed 2014·Granted Sep 20, 2016·5 cites·15 claims
- 0370US2024183656A1Detector for process kit ring wearAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 0468US11199267B2Symmetric flow valve for higher flow conductanceAPPLIED MATERIALS INC·Filed 2019·Granted Dec 14, 2021·1 cites·17 claims
- 0562US11835146B2Symmetric flow valve for flow conductance controlAPPLIED MATERIALS INC·Filed 2021·Granted Dec 5, 2023·0 cites·19 claims
- 0660US11913777B2Detector for process kit ring wearAPPLIED MATERIALS INC·Filed 2020·Granted Feb 27, 2024·0 cites·17 claims
- 0756US2024344199A1Semiconductor processing chamber lid and coatingAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 0855US2025279313A1Lid and hydbrid substrate support for efficient heating and cooling in process chambersAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 0952US12100576B2Metal oxide preclean chamber with improved selectivity and flow conductanceAPPLIED MATERIALS INC·Filed 2020·Granted Sep 24, 2024·0 cites·20 claims
- 1047US10672591B2Apparatus for removing particles from a twin chamber processing systemAPPLIED MATERIALS INC·Filed 2013·Granted Jun 2, 2020·0 cites·12 claims
- 1147US2016217981A1Semiconductor system assemblies and methods of operationAPPLIED MATERIALS INC·Filed 2016·Application pending·0 cites
- 1245US2015170879A1Semiconductor system assemblies and methods of operationAPPLIED MATERIALS INC·Filed 2013·Application pending·0 cites
- 1343US2021175103A1In situ failure detection in semiconductor processing chambersAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 1442US2020234928A1Semiconductor plasma processing equipment with wafer edge plasma sheath tuning abilityAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 1541US2019341233A1Semiconductor substrate processing apparatus and methodAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →