Inventor · disambiguated record
Walter D. Mieher
Also filed as: MIEHER WALTER · MIEHER WALTER D · MIEHER WALTER DEAN
43 granted patents·3 pending applications·1,655 citations·filing 2000–2017
99Inventor score
Top patents by PatentIndex Score
46 records- 0198US9470639B1Optical metrology with reduced sensitivity to grating anomaliesKLA TENCOR CORP·Filed 2016·Granted Oct 18, 2016·31 cites·20 claims
- 0298US7826071B2Parametric profiling using optical spectroscopic systemsKLA TENCOR CORP·Filed 2007·Granted Nov 2, 2010·114 cites·24 claims
- 0398US6486954B1Overlay alignment measurement markKLA TENCOR TECH CORP·Filed 2000·Granted Nov 26, 2002·199 cites·38 claims
- 0497US9885962B2Methods and apparatus for measuring semiconductor device overlay using X-ray metrologyKLA TENCOR CORP·Filed 2014·Granted Feb 6, 2018·35 cites·22 claims
- 0597US9347879B2Apparatus and methods for detecting overlay errors using scatterometryKLA TENCOR CORP·Filed 2015·Granted May 24, 2016·17 cites·21 claims
- 0697US8330281B2Overlay marks, methods of overlay mark design and methods of overlay measurementsGHINOVKER MARK·Filed 2007·Granted Dec 11, 2012·43 cites·9 claims
- 0797US7433040B2Apparatus and methods for detecting overlay errors using scatterometryKLA TENCOR TECH CORP·Filed 2007·Granted Oct 7, 2008·28 cites·18 claims
- 0897US7317824B2Overlay marks, methods of overlay mark design and methods of overlay measurementsKLA TENCOR TECH CORP·Filed 2006·Granted Jan 8, 2008·22 cites·60 claims
- 0997US7317531B2Apparatus and methods for detecting overlay errors using scatterometryKLA TENCOR TECH CORP·Filed 2003·Granted Jan 8, 2008·83 cites·30 claims
- 1097US7242477B2Apparatus and methods for detecting overlay errors using scatterometryKLA TENCOR TECH CORP·Filed 2004·Granted Jul 10, 2007·124 cites·20 claims
- 1197US7175945B2Focus masking structures, focus patterns and measurements thereofKLA TENCOR CORP·Filed 2005·Granted Feb 13, 2007·37 cites·4 claims
- 1297US6985618B2Overlay marks, methods of overlay mark design and methods of overlay measurementsKLA TENCOR TECH CORP·Filed 2002·Granted Jan 10, 2006·98 cites·41 claims
- 1396US7564557B2Apparatus and methods for detecting overlay errors using scatterometryKLA TENCOR TECH CORP·Filed 2007·Granted Jul 21, 2009·19 cites·7 claims
- 1496US7298481B2Apparatus and methods for detecting overlay errors using scatterometryKLA TENCOR TECH CORP·Filed 2004·Granted Nov 20, 2007·46 cites·11 claims
- 1596US7289213B2Apparatus and methods for detecting overlay errors using scatterometryKLA TENCOR TECH CORP·Filed 2004·Granted Oct 30, 2007·49 cites·15 claims
- 1696US7280212B2Apparatus and methods for detecting overlay errors using scatterometryKLA TENCOR TECH CORP·Filed 2004·Granted Oct 9, 2007·45 cites·12 claims
- 1795US7933016B2Apparatus and methods for detecting overlay errors using scatterometryKLA TENCOR TECH CORP·Filed 2009·Granted Apr 26, 2011·15 cites·20 claims
- 1895US7876440B2Apparatus and methods for detecting overlay errors using scatterometryKLA TENCOR TECH CORP·Filed 2009·Granted Jan 25, 2011·13 cites·18 claims
- 1995US7663753B2Apparatus and methods for detecting overlay errors using scatterometryKLA TENCOR TECH CORP·Filed 2007·Granted Feb 16, 2010·19 cites·45 claims
- 2095US7280230B2Parametric profiling using optical spectroscopic systemsKLA TENCOR TECH CORP·Filed 2002·Granted Oct 9, 2007·71 cites·32 claims
- 2194US10451412B2Apparatus and methods for detecting overlay errors using scatterometryKLA TENCOR CORP·Filed 2017·Granted Oct 22, 2019·7 cites·14 claims
- 2294US9030661B1Alignment measurement systemKLA TENCOR CORP·Filed 2014·Granted May 12, 2015·16 cites·20 claims
- 2394US7385699B2Apparatus and methods for detecting overlay errors using scatterometryKLA TENCOR TECH CORP·Filed 2004·Granted Jun 10, 2008·34 cites·33 claims
- 2494US7301634B2Apparatus and methods for detecting overlay errors using scatterometryKLA TENCOR TECH CORP·Filed 2004·Granted Nov 27, 2007·35 cites·33 claims
- 2594US7177457B2Overlay marks, methods of overlay mark design and methods of overlay measurementsKLA TENCOR CORP·Filed 2002·Granted Feb 13, 2007·33 cites·36 claims
- 2694US7068833B1Overlay marks, methods of overlay mark design and methods of overlay measurementsKLA TENCOR CORP·Filed 2001·Granted Jun 27, 2006·81 cites·38 claims
- 2793US10352876B2Signal response metrology for scatterometry based overlay measurementsKLA—TENCOR CORP·Filed 2015·Granted Jul 16, 2019·7 cites·20 claims
- 2893US9702693B2Apparatus for measuring overlay errorsKLA TENCOR CORP·Filed 2016·Granted Jul 11, 2017·6 cites·64 claims
- 2993US8040511B1Azimuth angle measurementKLA TENCOR CORP·Filed 2009·Granted Oct 18, 2011·37 cites·36 claims
- 3093US7879627B2Overlay marks and methods of manufacturing such marksKLA TENCOR TECH CORP·Filed 2009·Granted Feb 1, 2011·25 cites·12 claims
- 3193US7656512B2Method for determining lithographic focus and exposureKLA TENCOR TECH CORP·Filed 2008·Granted Feb 2, 2010·15 cites·40 claims
- 3293US7616313B2Apparatus and methods for detecting overlay errors using scatterometryKLA TENCOR TECH CORP·Filed 2006·Granted Nov 10, 2009·17 cites·36 claims
- 3393US7382447B2Method for determining lithographic focus and exposureKLA TENCOR TECH CORP·Filed 2002·Granted Jun 3, 2008·46 cites·18 claims
- 3491US10024654B2Method and system for determining in-plane distortions in a substrateKLA TENCOR CORP·Filed 2016·Granted Jul 17, 2018·11 cites·24 claims
- 3591US7352453B2Method for process optimization and control by comparison between 2 or more measured scatterometry signalsKLA TENCOR TECH CORP·Filed 2004·Granted Apr 1, 2008·56 cites·33 claims
- 3689US7274814B2Overlay marks, methods of overlay mark design and methods of overlay measurementsKLA TENCOR CORP·Filed 2006·Granted Sep 25, 2007·18 cites·27 claims
- 3789US6884552B2Focus masking structures, focus patterns and measurements thereofKLA TENCOR TECH CORP·Filed 2002·Granted Apr 26, 2005·29 cites·53 claims
- 3888US7379183B2Apparatus and methods for detecting overlay errors using scatterometryKLA TENCOR TECH CORP·Filed 2004·Granted May 27, 2008·18 cites·44 claims
- 3987US7181057B2Overlay marks, methods of overlay mark design and methods of overlay measurementsKLA TENCOR TECH CORP·Filed 2002·Granted Feb 20, 2007·40 cites·25 claims
- 4077US7867693B1Methods for forming device structures on a waferKLA TENCOR TECH CORP·Filed 2007·Granted Jan 11, 2011·5 cites·46 claims
- 4176US8452718B2Determination of training set size for a machine learning systemJIN WEN·Filed 2010·Granted May 28, 2013·9 cites·25 claims
- 4271US10401740B2System and method for focus determination using focus-sensitive overlay targetsKLA TENCOR CORP·Filed 2016·Granted Sep 3, 2019·1 cites·30 claims
- 4365US9081287B2Methods of measuring overlay errors in area-imaging e-beam lithographyKLA TENCOR CORP·Filed 2013·Granted Jul 14, 2015·1 cites·21 claims
- 4454US2010235114A1Systems and methods for determining one or more characteristics of a specimen using radiation in the terahertz rangeKLA TENCOR CORP·Filed 2009·Application pending·0 cites
- 4549US2007108368A1Focus masking structures, focus patterns and measurements thereofKLA TENCOR CORP·Filed 2006·Application pending·0 cites
- 4648US2012281275A1Systems and Methods for Determining One or More Characteristics of a Specimen Using Radiation in the Terahertz RangeLEVY ADY·Filed 2012·Application pending·0 cites
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