Inventor · disambiguated record
Youxian Wen
Also filed as: WEN YOUXIAN
17 granted patents·2 pending applications·460 citations·filing 2000–2023
95Inventor score
Top patents by PatentIndex Score
19 records- 0198US7478019B2Multiple tool and structure analysisKLA TENCOR CORP·Filed 2005·Granted Jan 13, 2009·225 cites·30 claims
- 0294US6898596B2Evolution of library data setsTHERMA WAVE INC·Filed 2002·Granted May 24, 2005·74 cites·18 claims
- 0391US9645097B2In-line wafer edge inspection, wafer pre-alignment, and wafer cleaningKLA TENCOR CORP·Filed 2015·Granted May 9, 2017·10 cites·21 claims
- 0491US6583876B2Apparatus for optical measurements of nitrogen concentration in thin filmsTHERMA WAVE INC·Filed 2001·Granted Jun 24, 2003·37 cites·4 claims
- 0587US7523439B2Determining position accuracy of double exposure lithography using optical metrologyTOKYO ELECTRON LTD·Filed 2006·Granted Apr 21, 2009·9 cites·19 claims
- 0683US9747520B2Systems and methods for enhancing inspection sensitivity of an inspection toolKLA TENCOR CORP·Filed 2016·Granted Aug 29, 2017·5 cites·17 claims
- 0783US7145664B2Global shape definition method for scatterometryTHERMA WAVE INC·Filed 2004·Granted Dec 5, 2006·20 cites·16 claims
- 0883US6784993B2Apparatus for optical measurements of nitrogen concentration in thin filmsTHERMA WAVE INC·Filed 2003·Granted Aug 31, 2004·16 cites·12 claims
- 0979US8543557B2Evolution of library data setsAIKENS DAVID M·Filed 2005·Granted Sep 24, 2013·8 cites·4 claims
- 1078US7613598B2Global shape definition method for scatterometryKLA TENCOR CORP·Filed 2006·Granted Nov 3, 2009·5 cites·19 claims
- 1177US9658150B2System and method for semiconductor wafer inspection and metrologyKLA TENCOR CORP·Filed 2016·Granted May 23, 2017·2 cites·20 claims
- 1276US7518740B2Evaluating a profile model to characterize a structure to be examined using optical metrologyTOKYO ELECTRON LTD·Filed 2006·Granted Apr 14, 2009·9 cites·20 claims
- 1375US6882421B2Apparatus for optical measurements of nitrogen concentration in thin filmsTHERMA WAVE INC·Filed 2004·Granted Apr 19, 2005·9 cites·7 claims
- 1472US7085676B2Feed forward critical dimension controlTOKYO ELECTRON LTD·Filed 2004·Granted Aug 1, 2006·11 cites·10 claims
- 1569US2023417682A1Metrology solutions for complex structures of interestONTO INNOVATION INC·Filed 2023·Application pending·0 cites
- 1668US6472238B1Evaluation of etching processes in semiconductorsTHERMA WAVE INC·Filed 2000·Granted Oct 29, 2002·12 cites·18 claims
- 1766US2024159656A1Combined modeling and machine learning in optical metrologyONTO INNOVATION INC·Filed 2023·Application pending·0 cites
- 1865US6989896B2Standardized sample for characterizing the performance of a scatterometerTHERMA WAVE INC·Filed 2002·Granted Jan 24, 2006·8 cites·5 claims
- 1946US7639375B2Determining transmittance of a photomask using optical metrologyTOKYO ELECTRON LTD·Filed 2006·Granted Dec 29, 2009·0 cites·20 claims
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