Inventor · disambiguated record
Hun-Jung Yi
Also filed as: YI HUN-JUNG
17 granted patents·24 pending applications·157 citations·filing 2000–2025
93Inventor score
Files withSAMSUNG ELECTRONICS CO LTD24YI HUN-JUNG5HWANG DONG-WON2KIM SE-YEON2SAMSUNG DISPLAY CO LTD2
Top patents by PatentIndex Score
41 records- 0191US7556712B2Laser cleaning of backside of wafer for photolithographic processingSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Jul 7, 2009·19 cites·5 claims
- 0291US7191545B2Apparatus to dry substratesSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Mar 20, 2007·20 cites·18 claims
- 0384US7351667B2Etching solution for silicon oxide method of manufacturing a semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Apr 1, 2008·10 cites·10 claims
- 0482US7943562B2Semiconductor substrate cleaning methods, and methods of manufacture using sameSAMSUNG ELECTRONICS CO LTD·Filed 2008·Granted May 17, 2011·9 cites·20 claims
- 0582US7880138B2Apparatus and method for analyzing contaminants on waferSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Feb 1, 2011·9 cites·20 claims
- 0680US6883248B2Apparatus for drying a substrate using an isopropyl alcohol vaporSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Apr 26, 2005·26 cites·36 claims
- 0777US7100306B2Wafer guides for processing semiconductor substratesSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Sep 5, 2006·4 cites·10 claims
- 0877US6959823B2Wafer guides for processing semiconductor substratesSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Nov 1, 2005·15 cites·5 claims
- 0973US8043974B2Semiconductor wet etchant and method of forming interconnection structure using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2008·Granted Oct 25, 2011·4 cites·16 claims
- 1068US6655042B2System and method for drying semiconductor substrateSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Dec 2, 2003·12 cites·35 claims
- 1164US6395144B1Method for treating toxic compounds-containing gas by non-thermal plasmaKOREA MACH & MATERIALS INST·Filed 2000·Granted May 28, 2002·12 cites·9 claims
- 1263US2025266251A1Apparatus for fabricating display panelSAMSUNG DISPLAY CO LTD·Filed 2025·Application pending·0 cites
- 1362US7386944B2Method and apparatus for drying a wafer, and an apparatus for cleaning and drying a waferSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Jun 17, 2008·9 cites·19 claims
- 1460US7959884B2Apparatus for purifying air and purifying method thereofSAMSUNG ELECTRONICS CO LTD·Filed 2009·Granted Jun 14, 2011·2 cites·17 claims
- 1555US6905570B2Apparatus for manufacturing integrated circuit deviceSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Jun 14, 2005·5 cites·19 claims
- 1655US2008194037A1Apparatus and methods for detecting metal concentration in an atmosphereSAMSUNG ELECTRONICS CO LTD·Filed 2008·Application pending·0 cites
- 1754US9267882B2Apparatus for detecting organic compounds and apparatus for manufacturing display device using the sameSAMSUNG DISPLAY CO LTD·Filed 2014·Granted Feb 23, 2016·0 cites·17 claims
- 1854US2009120459A1Apparatus and method for cleaning semiconductor substratesYI HUN-JUNG·Filed 2009·Application pending·0 cites
- 1953US2008216347A1Apparatus and method for drying semiconductor substratesYI HUN-JUNG·Filed 2008·Application pending·0 cites
- 2051US2011123400A1Apparatus for detecting metal concentration in an atmosphereHONG HYUN-KEE·Filed 2011·Application pending·0 cites
- 2151US2006260149A1Wafer guides for processing semiconductor substratesSAMSUNG ELECTRONICS CO LTD·Filed 2006·Application pending·0 cites
- 2251US2014102890A1Sputtering apparatusJUNG YOUNGJAE·Filed 2013·Application pending·0 cites
- 2347US7520068B2Apparatus and method for drying semiconductor substratesSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Apr 21, 2009·1 cites·27 claims
- 2446US2008145942A1Metal detection reagents including an ammonium salt and methods of using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2007·Application pending·0 cites
- 2545US2012009792A1Semiconductor wet etchant and method of forming interconnection structure using the samePARK JUNG-DAE·Filed 2011·Application pending·0 cites
- 2644US2007169795A1Apparatus for cleaning substratesYI HUN-JUNG·Filed 2007·Application pending·0 cites
- 2743US2007017117A1Apparatus for drying semiconductor substrateSAMSUNG ELECTRONICS CO LTD·Filed 2006·Application pending·0 cites
- 2843US2007181160A1Supporter and apparatus for cleaning substrates with the supporter, and method for cleaning substratesSAMSUNG ELECTRONICS CO LTD·Filed 2007·Application pending·0 cites
- 2943US2005039776A1Apparatus and method for cleaning semiconductor substratesSAMSUNG ELECTRONICS CO LTD·Filed 2004·Application pending·0 cites
- 3043US2004226186A1Apparatus for drying semiconductor substrates using azeotrope effect and drying method using the apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2004·Application pending·0 cites
- 3142US2006231125A1Apparatus and method for cleaning a semiconductor waferSAMSUNG ELECTRONICS CO LTD·Filed 2006·Application pending·0 cites
- 3241US2007102023A1Apparatus for treating substrates with phosphoric acid solution and method for regenerating the phosphoric acid solution employed thereinYI HUN-JUNG·Filed 2006·Application pending·0 cites
- 3341US2006237033A1Cleaning apparatus and methodSAMSUNG ELECTRONICS CO LTD·Filed 2006·Application pending·0 cites
- 3441US2004010932A1Apparatus for drying semiconductor substrates using azeotrope effect and drying method using the apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2003·Application pending·0 cites
- 3541US2009130842A1Method of forming contact hole and method of manufacturing semiconductor memory device using the sameHWANG DONG-WON·Filed 2008·Application pending·0 cites
- 3639US2009117499A1Cleaning solution for immersion photolithography system and immersion photolithograph process using the cleaning solutionKIM SE-YEON·Filed 2008·Application pending·0 cites
- 3739US2005045208A1Apparatus and method for cleaning semiconductor substratesFiled 2004·Application pending·0 cites
- 3838US2007037400A1Composition and methods removing polysiliconHWANG DONG-WON·Filed 2006·Application pending·0 cites
- 3935US2003085198A1Method of detecting etching process end point in semiconductor fabricating equipment and detector thereforYI HUN JUNG·Filed 2002·Application pending·0 cites
- 4035US2012006351A1Methods Of Cleaning And Plasma Processing Apparatus For Manufacturing SemiconductorsJUN HYUN-SU·Filed 2011·Application pending·0 cites
- 4130US8767203B2Plasma monitoring device using a cylindrical hollow electrodeKIM SE-YEON·Filed 2011·Granted Jul 1, 2014·0 cites·7 claims
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →