Inventor · disambiguated record
David W. Minsek
Also filed as: MINSEK DAVID · MINSEK DAVID W
20 granted patents·11 pending applications·453 citations·filing 2001–2016
95Inventor score
Files withADVANCED TECH MATERIALS17MINSEK DAVID W5MACDERMID ACUMEN INC2MICROCHEM CORP2RATH MELISSA K2
Top patents by PatentIndex Score
31 records- 0196US7922824B2Oxidizing aqueous cleaner for the removal of post-etch residuesADVANCED TECH MATERIALS·Filed 2006·Granted Apr 12, 2011·57 cites·20 claims
- 0296US6773873B2pH buffered compositions useful for cleaning residue from semiconductor substratesADVANCED TECH MATERIALS·Filed 2002·Granted Aug 10, 2004·115 cites·14 claims
- 0393US8951948B2Metal and dielectric compatible sacrificial anti-reflective coating cleaning and removal compositionRATH MELISSA K·Filed 2006·Granted Feb 10, 2015·21 cites·15 claims
- 0493US8337942B2Light induced plating of metals on silicon photovoltaic cellsMINSEK DAVID W·Filed 2011·Granted Dec 25, 2012·12 cites·17 claims
- 0591US7119052B2Compositions and methods for high-efficiency cleaning/polishing of semiconductor wafersADVANCED TECH MATERIALS·Filed 2003·Granted Oct 10, 2006·46 cites·86 claims
- 0690US7994108B2Composition useful for removal of post-etch photoresist and bottom anti-reflection coatingsADVANCED TECH MATERIALS·Filed 2006·Granted Aug 9, 2011·11 cites·18 claims
- 0788US8236485B2Photoresist removalMINSEK DAVID W·Filed 2003·Granted Aug 7, 2012·33 cites·25 claims
- 0887US9256134B2Photoresist removalADVANCED TECH MATERIALS·Filed 2014·Granted Feb 9, 2016·5 cites·16 claims
- 0986US6824952B1Deep-UV anti-reflective resist compositionsMICROCHEM CORP·Filed 2001·Granted Nov 30, 2004·31 cites·18 claims
- 1085US6849200B2Composition and process for wet stripping removal of sacrificial anti-reflective materialADVANCED TECH MATERIALS·Filed 2002·Granted Feb 1, 2005·45 cites·23 claims
- 1184US8765654B2Oxidizing aqueous cleaner for the removal of post-etch residuesMINSEK DAVID W·Filed 2011·Granted Jul 1, 2014·5 cites·18 claims
- 1282US8338087B2Composition and process for post-etch removal of photoresist and/or sacrificial anti-reflective material deposited on a substrateRATH MELISSA K·Filed 2004·Granted Dec 25, 2012·19 cites·41 claims
- 1381US7326673B2Treatment of semiconductor substrates using long-chain organothiols or long-chain acetatesADVANCED TECH MATERIALS·Filed 2002·Granted Feb 5, 2008·18 cites·15 claims
- 1481US6716568B1Epoxy photoresist composition with improved cracking resistanceMICROCHEM CORP·Filed 2001·Granted Apr 6, 2004·30 cites·14 claims
- 1580US8679734B2Photoresist removalMINSEK DAVID W·Filed 2012·Granted Mar 25, 2014·3 cites·20 claims
- 1675US9443713B2Oxidizing aqueous cleaner for the removal of post-etch residuesADVANCED TECH MATERIALS·Filed 2014·Granted Sep 13, 2016·2 cites·15 claims
- 1767US9783901B2Electroplating of metals on conductive oxide substratesMACDERMID ACUMEN INC·Filed 2014·Granted Oct 10, 2017·0 cites·20 claims
- 1865US9422513B2Metal and dielectric compatible sacrificial anti-reflective coating cleaning and removal compositionENTEGRIS INC·Filed 2014·Granted Aug 23, 2016·0 cites·14 claims
- 1965US8956687B2Light induced plating of metals on silicon photovoltaic cellsMACDERMID ACUMEN INC·Filed 2012·Granted Feb 17, 2015·0 cites·18 claims
- 2057US2013109605A1Composition and process for post-etch removal of photoresist and/or sacrificial anti-reflective material deposited on a substrateADVANCED TECH MATERIALS·Filed 2012·Application pending·0 cites
- 2154US2016152926A1Photoresist removalADVANCED TECH MATERIALS·Filed 2016·Application pending·0 cites
- 2253US8722142B2Light induced electroless platingMINSEK DAVID·Filed 2009·Granted May 13, 2014·0 cites·14 claims
- 2352US2008058238A1Supercritical fluid cleaning of semiconductor substratesADVANCED TECH MATERIALS·Filed 2007·Application pending·0 cites
- 2448US2006154186A1Composition useful for removal of post-etch photoresist and bottom anti-reflection coatingsADVANCED TECH MATERIALS·Filed 2005·Application pending·0 cites
- 2548US2011117751A1Non-selective oxide etch wet clean composition and method of useADVANCED TECH MATERIALS·Filed 2009·Application pending·0 cites
- 2647US2006063687A1Composition and process for ashless removal of post-etch photoresist and/or bottom anti-reflective material on a substrateMINSEK DAVID W·Filed 2004·Application pending·0 cites
- 2746US2010112728A1Methods for stripping material for wafer reclamationADVANCED TECH MATERIALS·Filed 2009·Application pending·0 cites
- 2845US2006122085A1Compositions and methods for high-efficiency cleaning of semiconductor wafersKORZENSKI MICHAEL B·Filed 2006·Application pending·0 cites
- 2943US2010163788A1Liquid cleaner for the removal of post-etch residuesADVANCED TECH MATERIALS·Filed 2007·Application pending·0 cites
- 3043US2009192065A1Dense fluid compositions for removal of hardened photoresist, post-etch residue and/or bottom anti-reflective coatingADVANCED TECH MATERIALS·Filed 2006·Application pending·0 cites
- 3140US2009032766A1Composition and method for selectively etching gate spacer oxide materialADVANCED TECH MATERIALS·Filed 2006·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →