Inventor · disambiguated record
Hans-Jurgen Mann
Also filed as: MANN HANS-JUERGEN · MANN HANS-JURGEN · MANN HANS-JÜRGEN
27 granted patents·5 pending applications·609 citations·filing 2001–2018
97Inventor score
Top patents by PatentIndex Score
32 records- 0197US7682031B2Catoptric objectives and systems using catoptric objectivesZEISS CARL SMT AG·Filed 2005·Granted Mar 23, 2010·48 cites·49 claims
- 0297US7209286B2Objective with pupil obscurationZEISS CARL SMT AG·Filed 2005·Granted Apr 24, 2007·32 cites·17 claims
- 0397US6894834B2Objective with pupil obscurationZEISS CARL SMT AG·Filed 2003·Granted May 17, 2005·90 cites·47 claims
- 0496US7190530B2Projection objectives including a plurality of mirrors with lenses ahead of mirror M3ZEISS CARL SMT AG·Filed 2006·Granted Mar 13, 2007·56 cites·23 claims
- 0595US6710917B28-mirror microlithography projection objectiveZEISS CARL SMT AG·Filed 2001·Granted Mar 23, 2004·88 cites·29 claims
- 0693US10068325B2Method for three-dimensionally measuring a 3D aerial image of a lithography maskZEISS CARL SMT GMBH·Filed 2017·Granted Sep 4, 2018·10 cites·20 claims
- 0793US7375798B2Projection system for EUV lithographyZEISS CARL SMT AG·Filed 2007·Granted May 20, 2008·25 cites·17 claims
- 0893US7355678B2Projection system for EUV lithographyZEISS CARL SMT AG·Filed 2005·Granted Apr 8, 2008·25 cites·20 claims
- 0992US6985210B2Projection system for EUV lithographyZEISS CARL SMT AG·Filed 2003·Granted Jan 10, 2006·34 cites·35 claims
- 1091US7151592B2Projection system for EUV lithographyZEISS CARL SMT AG·Filed 2003·Granted Dec 19, 2006·34 cites·31 claims
- 1190US10606048B2Imaging optical unit for a metrology system for examining a lithography maskZEISS CARL SMT GMBH·Filed 2017·Granted Mar 31, 2020·3 cites·21 claims
- 1289USRE42118EProjection system for EUV lithographyZEISS CARL SMT AG·Filed 2007·Granted Feb 8, 2011·20 cites·35 claims
- 1388US6867913B26-mirror microlithography projection objectiveZEISS CARL SMT AG·Filed 2001·Granted Mar 15, 2005·31 cites·23 claims
- 1484US7177076B28-mirror microlithography projection objectiveZEISS CARL SMT AG·Filed 2003·Granted Feb 13, 2007·19 cites·79 claims
- 1584US6577443B2Reduction objective for extreme ultraviolet lithographyZEISS STIFTUNG·Filed 2001·Granted Jun 10, 2003·30 cites·19 claims
- 1682US7221516B2Projection lens for a microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2005·Granted May 22, 2007·5 cites·21 claims
- 1781US7623620B2Reflective X-ray microscope and inspection system for examining objects with wavelengths <100 nmZEISS CARL SMT AG·Filed 2004·Granted Nov 24, 2009·26 cites·25 claims
- 1880US7952797B2Reflective optical element and EUV lithography applianceZEISS CARL SMT GMBH·Filed 2009·Granted May 31, 2011·6 cites·22 claims
- 1976US9110225B2Illumination optics for a metrology system for examining an object using EUV illumination light and metrology system comprising an illumination optics of this typeMANN HANS-JÜRGEN·Filed 2011·Granted Aug 18, 2015·4 cites·21 claims
- 2074US8854606B2Projection exposure system, method for manufacturing a micro-structured structural member by the aid of such a projection exposure system and polarization-optical element adapted for use in such a systemMANN HANS-JÜRGEN·Filed 2011·Granted Oct 7, 2014·2 cites·20 claims
- 2172US10634886B2Method for three-dimensionally measuring a 3D aerial image of a lithography maskZEISS CARL SMT GMBH·Filed 2018·Granted Apr 28, 2020·1 cites·6 claims
- 2272US7372539B2Method for distortion correction in a microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2004·Granted May 13, 2008·10 cites·18 claims
- 2370US7605905B2Method for distortion correction in a microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2008·Granted Oct 20, 2009·2 cites·14 claims
- 2463US7068436B2Projection lens for a microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2004·Granted Jun 27, 2006·5 cites·12 claims
- 2560US8537460B2Reflective optical element and EUV lithography applianceTRENKLER JOHANN·Filed 2012·Granted Sep 17, 2013·0 cites·20 claims
- 2656US7572556B2Masks, lithography device and semiconductor componentZEISS CARL SMT AG·Filed 2003·Granted Aug 11, 2009·3 cites·16 claims
- 2752US2008316451A1Catoptric objectives and systems using catoptric objectivesZEISS CARL SMT AG·Filed 2008·Application pending·0 cites
- 2850US2006066940A1Reflective optical element and EUV lithography applianceTRENKLER JOHANN·Filed 2005·Application pending·0 cites
- 2948US2007188729A1Projection Lens for a Microlithographic Projection Exposure ApparatusZEISS CARL SMT AG·Filed 2007·Application pending·0 cites
- 3048US2007070322A1Projection system for EUV lithographyZEISS CARL SMT AG·Filed 2006·Application pending·0 cites
- 3147US2006215272A1Objective in a microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2006·Application pending·0 cites
- 3230US7576934B2Groupwise corrected objectiveZEISS CARL SMT AG·Filed 2007·Granted Aug 18, 2009·0 cites·10 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →