Catoptric objectives and systems using catoptric objectives

Abstract

In general, in one aspect, the invention features an objective arranged to image radiation from an object plane to an image plane, including a plurality of elements arranged to direct the radiation from the object plane to the image plane, wherein the objective has an image side numerical aperture of more than 0.55 and a maximum image side field dimension of more than 1 mm, and the objective is a catoptric objective.

1 .- 68 . (canceled) 
   
   
       69 . An exposure method for exposing a substrate, the exposure method comprising: radiating exposure light beams onto a first exposure area and a second exposure area defined at different positions in a first direction respectively; and moving the substrate in the first direction so that a predetermined area on the substrate is moved relative to the first exposure area and the second exposure area to thereby perform multiple exposure for the predetermined area on the substrate with a first pattern image which is formed by the exposure light beam radiated onto the first exposure area and a second pattern image which is formed by the exposure light beam radiated onto the second exposure area and which is different from the first pattern image. 
   
   
       70 . The exposure method according to  claim 69 , wherein the first pattern image and the second pattern image are formed by using a reflecting element which is driven based on predetermined electronic data. 
   
   
       71 . The exposure method according to  claim 69 , wherein the exposure light beams are radiated onto the first and second exposure areas under mutually different exposure conditions. 
   
   
       72 . The exposure method according to  claim 69 , wherein the exposure light beam is radiated onto the first exposure area via a plurality of optical systems, and the exposure light beam is radiated onto the second exposure area via a plurality of optical systems. 
   
   
       73 . The exposure method according to  claim 69 , wherein first and second pattern-forming members are illuminated with the exposure light beams respectively to form the first and second pattern images, the exposure light beam is radiated onto the first exposure area via the first pattern-forming member and first and third optical systems, and the exposure light beam is radiated onto the second exposure area via a second optical system different from the first optical system and the third optical system.