Inventor · disambiguated record
Tadamitsu Kanekiyo
Also filed as: KANEKIYO TADAMITSU
22 granted patents·24 pending applications·218 citations·filing 1993–2019
95Inventor score
Top patents by PatentIndex Score
46 records- 0197US8397668B2Plasma processing apparatusKOBAYASHI HIROYUKI·Filed 2009·Granted Mar 19, 2013·43 cites·6 claims
- 0292US7662232B2Plasma processing apparatusHITACHI LTD·Filed 2007·Granted Feb 16, 2010·14 cites·3 claims
- 0389US8733282B2Plasma processing apparatusKOBAYASHI HIROYUKI·Filed 2013·Granted May 27, 2014·6 cites·6 claims
- 0489US8632637B2Method and apparatus for plasma processingHITACHI HIGH TECH CORP·Filed 2012·Granted Jan 21, 2014·6 cites·2 claims
- 0588US9038567B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2014·Granted May 26, 2015·5 cites·7 claims
- 0686US7833429B2Plasma processing methodHITACHI HIGH TECH CORP·Filed 2007·Granted Nov 16, 2010·7 cites·4 claims
- 0783US6586887B1High-frequency power supply apparatus for plasma generation apparatusHITACHI HIGH TECH CORP·Filed 2002·Granted Jul 1, 2003·28 cites·8 claims
- 0879US8062473B2Plasma processing apparatus and methodNISHIO RYOJI·Filed 2008·Granted Nov 22, 2011·4 cites·3 claims
- 0971US5961850APlasma processing method and apparatusHITACHI LTD·Filed 1996·Granted Oct 5, 1999·41 cites·15 claims
- 1068US8057634B2Method and apparatus for plasma processingNISHIO RYOJI·Filed 2004·Granted Nov 15, 2011·7 cites·6 claims
- 1167US8801951B2Plasma processing methodINOUE YOSHIHARU·Filed 2011·Granted Aug 12, 2014·2 cites·8 claims
- 1265US6914207B2Plasma processing methodHITACHI HIGH TECH CORP·Filed 2003·Granted Jul 5, 2005·6 cites·7 claims
- 1363US8163652B2Plasma processing method and plasma processing deviceMAEDA KENJI·Filed 2008·Granted Apr 24, 2012·1 cites·12 claims
- 1463US7740739B2Plasma processing apparatus and methodHITACHI HIGH TECH CORP·Filed 2004·Granted Jun 22, 2010·5 cites·9 claims
- 1561US5320707ADry etching methodHITACHI LTD·Filed 1993·Granted Jun 14, 1994·27 cites·35 claims
- 1660US8795467B2Plasma processing apparatus and methodNISHIO RYOJI·Filed 2009·Granted Aug 5, 2014·0 cites·4 claims
- 1760US7658815B2Plasma processing apparatus capable of controlling plasma emission intensityHITACHI HIGH TECH CORP·Filed 2008·Granted Feb 9, 2010·0 cites·2 claims
- 1859US2014137059A1Method and apparatus for plasma processingHITACHI HIGH TECH CORP·Filed 2014·Application pending·0 cites
- 1956US2009078563A1Plasma Processing Apparatus And Method Capable of Adjusting Temperature Within Sample TableARAMAKI TOORU·Filed 2008·Application pending·0 cites
- 2056US2009065145A1Plasma Processing Apparatus And Method Capable Of Adjusting Temperature Within Sample TableARAMAKI TOORU·Filed 2008·Application pending·0 cites
- 2155US2007227669A1Method and apparatus for plasma processingNISHIO RYOJI·Filed 2007·Application pending·0 cites
- 2255US2007232085A1Method and apparatus for plasma processingNISHIO RYOJI·Filed 2007·Application pending·0 cites
- 2355US2009000741A1Vacuum prcessing apparatus and vacuum processing method of sampleARAMAKI TOORU·Filed 2008·Application pending·0 cites
- 2455US2008011425A1Plasma Processing Apparatus And MethodNISHIO RYOJI·Filed 2007·Application pending·0 cites
- 2554US8366870B2Method and apparatus for plasma processingHITACHI HIGH TECH CORP·Filed 2011·Granted Feb 5, 2013·0 cites·1 claims
- 2654US7947189B2Vacuum processing apparatus and vacuum processing method of sampleHITACHI HIGH TECH CORP·Filed 2007·Granted May 24, 2011·0 cites·8 claims
- 2751US2006169410A1Plasma processing apparatus capable of controlling plasma emission intensityMAEDA KENJI·Filed 2005·Application pending·0 cites
- 2850US7435687B2Plasma processing method and plasma processing deviceHITACHI HIGH TECH CORP·Filed 2006·Granted Oct 14, 2008·0 cites·10 claims
- 2950US2006283549A1Plasma processing apparatus and method capable of adjusting temperature within sample tableARAMAKI TOORU·Filed 2005·Application pending·0 cites
- 3049US11456183B2Plasma processing method and plasma ashing apparatusHITACHI HIGH TECH CORP·Filed 2019·Granted Sep 27, 2022·0 cites·11 claims
- 3149US6156663AMethod and apparatus for plasma processingHITACHI LTD·Filed 1996·Granted Dec 5, 2000·16 cites·11 claims
- 3249US2006237391A1Vacuum processing apparatus and vacuum processing method of sampleARAMAKI TOORU·Filed 2005·Application pending·0 cites
- 3347US2010163187A1Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2009·Application pending·0 cites
- 3446US2006032585A1Plasma processing method and apparatusKAI YOSHITAKA·Filed 2005·Application pending·0 cites
- 3545US2009114152A1Apparatus for plasma treatmentARAMAKI TOORU·Filed 2008·Application pending·0 cites
- 3645US2006016559A1Plasma processing apparatusHITACHI LTD·Filed 2004·Application pending·0 cites
- 3743US2004173314A1Plasma processing apparatus and methodFiled 2003·Application pending·0 cites
- 3842US2010297849A1Plasma etching method for etching an objectMIYAKE MASATOSHI·Filed 2009·Application pending·0 cites
- 3940US2005014380A1Plasma processing method and apparatusFiled 2003·Application pending·0 cites
- 4038US2004040662A1Plasma processing method and apparatus for etching nonvolatile materialFiled 2002·Application pending·0 cites
- 4138US2006236932A1Plasma processing apparatusYOKOGAWA KENETSU·Filed 2005·Application pending·0 cites
- 4238US2009020227A1Vacuum processing apparatus for semiconductor fabrication apparatusANDOU YOUJI·Filed 2007·Application pending·0 cites
- 4337US2003160024A1Plasma processing method and apparatusFiled 2002·Application pending·0 cites
- 4434US2016079073A1Plasma processing methodHITACHI HIGH TECH CORP·Filed 2015·Application pending·0 cites
- 4534US2016079055A1Sample cleaning apparatus and sample cleaning methodHITACHI HIGH TECH CORP·Filed 2015·Application pending·0 cites
- 4632US2006196605A1Method and apparatus for plasma processingIKEGAMI EIJI·Filed 2005·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →