Inventor · disambiguated record
Michael Sogard
Also filed as: SOGARD MICHAEL · SOGARD MICHAEL R · SOGARD MICHAEL REID
79 granted patents·34 pending applications·1,418 citations·filing 1994–2020
99Inventor score
Top patents by PatentIndex Score
113 records- 0199US7456930B2Environmental system including vacuum scavenge for an immersion lithography apparatusNIKON CORP·Filed 2007·Granted Nov 25, 2008·51 cites·54 claims
- 0299US7355676B2Environmental system including vacuum scavenge for an immersion lithography apparatusNIKON CORP·Filed 2006·Granted Apr 8, 2008·51 cites·29 claims
- 0399US7321415B2Environmental system including vacuum scavenge for an immersion lithography apparatusNIKON CORP·Filed 2005·Granted Jan 22, 2008·63 cites·85 claims
- 0497US6628503B2Gas cooled electrostatic pin chuck for vacuum applicationsNIKON CORP·Filed 2001·Granted Sep 30, 2003·151 cites·7 claims
- 0597US6014200AHigh throughput electron beam lithography systemNIKON CORP·Filed 1998·Granted Jan 11, 2000·169 cites·38 claims
- 0696US7875864B2Devices and methods for thermophoretic and electrophoretic reduction of particulate contamination of lithographic reticles and other objectsNIKON CORP·Filed 2008·Granted Jan 25, 2011·21 cites·9 claims
- 0796US7367138B2Devices and methods for thermophoretic and electrophoretic reduction of particulate contamination of lithographic reticlesNIKON CORP·Filed 2005·Granted May 6, 2008·24 cites·17 claims
- 0895US8089610B2Environmental system including vacuum scavenge for an immersion lithography apparatusHAZELTON ANDREW J·Filed 2007·Granted Jan 3, 2012·13 cites·40 claims
- 0994US9423704B2Apparatus and methods for measuring thermally induced reticle distortionNIKON CORP·Filed 2015·Granted Aug 23, 2016·4 cites·22 claims
- 1094US8456610B2Environmental system including vacuum scavenge for an immersion lithography apparatusHAZELTON ANDREW J·Filed 2009·Granted Jun 4, 2013·11 cites·45 claims
- 1194US7477358B2EUV reticle handling system and methodNIKON CORP·Filed 2005·Granted Jan 13, 2009·16 cites·20 claims
- 1294US7342641B2Autofocus methods and devices for lithographyNIKON CORP·Filed 2005·Granted Mar 11, 2008·15 cites·24 claims
- 1393US8994918B2Apparatus and methods for measuring thermally induced reticle distortionSOGARD MICHAEL·Filed 2011·Granted Mar 31, 2015·7 cites·17 claims
- 1493US7250618B2Radiantly heated cathode for an electron gun and heating assemblyNIKON CORP·Filed 2005·Granted Jul 31, 2007·18 cites·71 claims
- 1591US6897940B2System for correcting aberrations and distortions in EUV lithographyNIKON CORP·Filed 2003·Granted May 24, 2005·39 cites·17 claims
- 1691US5552888AApparatus for measuring position of an X-Y stageNIKON PRECISION INC·Filed 1994·Granted Sep 3, 1996·66 cites·29 claims
- 1790US5631731AMethod and apparatus for aerial image analyzerNIKON PRECISION INC·Filed 1994·Granted May 20, 1997·79 cites·38 claims
- 1888US9244362B2Environmental system including vacuum scavenge for an immersion lithography apparatusNIKON CORP·Filed 2014·Granted Jan 26, 2016·2 cites·59 claims
- 1988US9244363B2Environmental system including a transport region for an immersion lithography apparatusNIKON CORP·Filed 2014·Granted Jan 26, 2016·2 cites·27 claims
- 2088US6376329B1Semiconductor wafer alignment using backside illuminationNIKON CORP·Filed 1997·Granted Apr 23, 2002·69 cites·13 claims
- 2186US8836914B2Environmental system including vacuum scavenge for an immersion lithography apparatusHAZELTON ANDREW J·Filed 2012·Granted Sep 16, 2014·2 cites·43 claims
- 2286US7426014B2Dynamic fluid control system for immersion lithographyNIKON CORP·Filed 2005·Granted Sep 16, 2008·7 cites·29 claims
- 2386US7030959B2Extreme ultraviolet reticle protection using gas flow thermophoresisNIKON CORP·Filed 2004·Granted Apr 18, 2006·22 cites·38 claims
- 2485US7804583B2EUV reticle handling system and methodNIKON CORP·Filed 2008·Granted Sep 28, 2010·6 cites·9 claims
- 2585US7709813B2Incidence surfaces and optical windows that are solvophobic to immersion liquidsNIKON CORP·Filed 2007·Granted May 4, 2010·6 cites·19 claims
- 2685US6989922B2Deformable mirror actuation systemNIKON CORP·Filed 2003·Granted Jan 24, 2006·23 cites·26 claims
- 2784US7598508B2Gaseous extreme-ultraviolet spectral purity filters and optical systems comprising sameNIKON CORP·Filed 2006·Granted Oct 6, 2009·12 cites·30 claims
- 2884US5866935ATunneling deviceNIKON PRECISION INC·Filed 1996·Granted Feb 2, 1999·44 cites·7 claims
- 2983US6864601B2Electric motors with reduced stray magnetic fieldsNIKON CORP·Filed 2001·Granted Mar 8, 2005·27 cites·76 claims
- 3083US6734117B2Periodic clamping method and apparatus to reduce thermal stress in a waferNIKON CORP·Filed 2002·Granted May 11, 2004·21 cites·39 claims
- 3181US7224435B2Using isotopically specified fluids as optical elementsNIKON CORP·Filed 2005·Granted May 29, 2007·5 cites·30 claims
- 3280US6529260B2Lifting support assembly for an exposure apparatusNIKON CORP·Filed 2001·Granted Mar 4, 2003·17 cites·100 claims
- 3379US6770987B1Brushless electric motors with reduced stray AC magnetic fieldsNIKON CORP·Filed 2000·Granted Aug 3, 2004·26 cites·75 claims
- 3479US6215642B1Vacuum compatible, deformable electrostatic chuck with high thermal conductivityNIKON CORP OF JAPAN·Filed 1999·Granted Apr 10, 2001·55 cites·17 claims
- 3577US8767174B2Temperature-controlled holding devices for planar articlesSOGARD MICHAEL R·Filed 2011·Granted Jul 1, 2014·4 cites·44 claims
- 3675US11313758B2Apparatus and methods for measuring thermally induced reticle distortionNIKON CORP·Filed 2020·Granted Apr 26, 2022·0 cites·28 claims
- 3775US7580112B2Containment system for immersion fluid in an immersion lithography apparatusNIKON CORP·Filed 2006·Granted Aug 25, 2009·3 cites·43 claims
- 3874US7554648B2Blind devices and methods for providing continuous thermophoretic protection of lithographic reticleNIKON CORP·Filed 2005·Granted Jun 30, 2009·4 cites·48 claims
- 3974US5784166APosition resolution of an interferometrially controlled moving stage by regression analysisNIKON CORP·Filed 1996·Granted Jul 21, 1998·33 cites·63 claims
- 4072US6302585B1Two Axis stage with arcuate surface bearingsNIKON CORP·Filed 2000·Granted Oct 16, 2001·12 cites·14 claims
- 4172US2018259860A1Environmental system including vacuum scavenge for an immersion lithography apparatusNIKON CORP·Filed 2018·Application pending·0 cites
- 4271US9977350B2Environmental system including vacuum scavenge for an immersion lithography apparatusNIKON CORP·Filed 2017·Granted May 22, 2018·0 cites·12 claims
- 4371US8842296B2Methods and devices for reducing errors in Goos-Hänchen corrections of displacement dataNIKON CORP·Filed 2013·Granted Sep 23, 2014·1 cites·32 claims
- 4470US7323698B2Thermally insulated thermophoretic plateNIKON CORP·Filed 2004·Granted Jan 29, 2008·9 cites·28 claims
- 4568US8711335B2Stroboscopic light source for a transmitter of a large scale metrology systemSOGARD MICHAEL·Filed 2012·Granted Apr 29, 2014·2 cites·20 claims
- 4668US6126169AAir bearing operable in a vacuum regionNIKON CORP·Filed 1998·Granted Oct 3, 2000·34 cites·25 claims
- 4767US10612997B2Apparatus and methods for measuring thermally induced reticle distortionNIKON CORP·Filed 2018·Granted Apr 7, 2020·0 cites·9 claims
- 4867US9658537B2Environmental system including vacuum scavenge for an immersion lithography apparatusNIKON CORP·Filed 2015·Granted May 23, 2017·0 cites·24 claims
- 4967US8852858B2Methods and devices for hybridization and binding assays using thermophoresisSOGARD MICHAEL·Filed 2007·Granted Oct 7, 2014·1 cites·26 claims
- 5067US6402380B1Fluid bearing operable in a vacuum regionNIKON CORP·Filed 2000·Granted Jun 11, 2002·8 cites·16 claims
Showing the top 50 of 113 patent records by PatentIndex Score.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →