Environmental system including vacuum scavenge for an immersion lithography apparatus

Abstract

A liquid immersion lithography apparatus includes: an optical assembly having a last optical element; a stage assembly having a recess in which a substrate is held by a holder, the stage assembly having a stage upper surface arranged such that the stage upper surface and an upper surface of the substrate held in the recess by the holder are substantially coplanar; a first inlet via which immersion liquid is drawn; a containment member arranged to surround the last optical element of the optical assembly; and an actuator by which the containment member is moved relative to the last optical element. The immersion liquid covers a portion of the upper surface of the substrate and the substrate is exposed through the immersion liquid.

What is claimed is: 
     
         1 . A liquid immersion lithography apparatus comprising:
 an optical assembly having a last optical element;   a stage assembly having a recess in which a substrate is held by a holder, the stage assembly having a stage upper surface arranged such that the stage upper surface and an upper surface of the substrate held in the recess by the holder are substantially coplanar;   a first inlet via which immersion liquid is drawn;   a containment member arranged to surround the last optical element of the optical assembly; and   an actuator by which the containment member is moved relative to the last optical element,   wherein the immersion liquid covers a portion of the upper surface of the substrate and the substrate is exposed through the immersion liquid.