Inventor · disambiguated record
Karl Leeser
Also filed as: LEESER KARL · LEESER KARL F · LEESER KARL FREDERICK
136 granted patents·58 pending applications·5,205 citations·filing 1999–2025
99Inventor score
Files withLAM RES CORP142NOVELLUS SYSTEMS INC24ANGSTRON SYSTEMS INC5APPLIED MATERIALS INC4LEESER KARL F2
Top patents by PatentIndex Score
194 records- 0199US10870922B2Moment cancelling pad raising mechanism in wafer positioning pedestal for semiconductor processingLAM RES CORP·Filed 2020·Granted Dec 22, 2020·6 cites·13 claims
- 0299US10121689B2Moment cancelling pad raising mechanism in wafer positioning pedestal for semiconductor processingLAM RES CORP·Filed 2018·Granted Nov 6, 2018·43 cites·22 claims
- 0399US10109517B1Rotational indexer with additional rotational axesLAM RES CORP·Filed 2018·Granted Oct 23, 2018·58 cites·20 claims
- 0499US6878402B2Method and apparatus for improved temperature control in atomic layer depositionNOVELLUS SYSTEMS INC·Filed 2001·Granted Apr 12, 2005·499 cites·19 claims
- 0599US6428859B1Sequential method for depositing a film by modulated ion-induced atomic layer deposition (MII-ALD)ANGSTRON SYSTEMS INC·Filed 2001·Granted Aug 6, 2002·810 cites·51 claims
- 0698US11264207B2Apparatuses and methods for avoiding electrical breakdown from RF terminal to adjacent non-RF terminalLAM RES CORP·Filed 2020·Granted Mar 1, 2022·8 cites·20 claims
- 0798US11056380B2Wafer positioning pedestal for semiconductor processingLAM RES CORP·Filed 2020·Granted Jul 6, 2021·4 cites·13 claims
- 0898US9960068B1Moment cancelling pad raising mechanism in wafer positioning pedestal for semiconductor processingLAM RES CORP·Filed 2016·Granted May 1, 2018·26 cites·25 claims
- 0998US9892956B1Wafer positioning pedestal for semiconductor processingLAM RES CORP·Filed 2016·Granted Feb 13, 2018·28 cites·6 claims
- 1098US9875891B2Selective inhibition in atomic layer deposition of silicon-containing filmsLAM RES CORP·Filed 2017·Granted Jan 23, 2018·478 cites·15 claims
- 1198US9704692B2System for instantaneous radiofrequency power measurement and associated methodsLAM RES CORP·Filed 2015·Granted Jul 11, 2017·22 cites·17 claims
- 1298US9564312B2Selective inhibition in atomic layer deposition of silicon-containing filmsLAM RES CORP·Filed 2014·Granted Feb 7, 2017·415 cites·14 claims
- 1398US9449795B2Ceramic showerhead with embedded RF electrode for capacitively coupled plasma reactorNOVELLUS SYSTEMS INC·Filed 2013·Granted Sep 20, 2016·398 cites·22 claims
- 1498US8940646B1Sequential precursor dosing in an ALD multi-station/batch reactorLAM RES CORP·Filed 2013·Granted Jan 27, 2015·540 cites·26 claims
- 1598US6569501B2Sequential method for depositing a film by modulated ion-induced atomic layer deposition (MII-ALD)ANGSTRON SYSTEMS INC·Filed 2002·Granted May 27, 2003·238 cites·53 claims
- 1698US6416822B1Continuous method for depositing a film by modulated ion-induced atomic layer deposition (MII-ALD)ANGSTRON SYSTEMS INC·Filed 2001·Granted Jul 9, 2002·416 cites·64 claims
- 1797US9758868B1Plasma suppression behind a showerhead through the use of increased pressureLAM RES CORP·Filed 2016·Granted Sep 12, 2017·24 cites·13 claims
- 1897US8053372B1Method of reducing plasma stabilization time in a cyclic deposition processNOVELLUS SYSTEMS INC·Filed 2006·Granted Nov 8, 2011·36 cites·20 claims
- 1997US6630201B2Adsorption process for atomic layer depositionANGSTRON SYSTEMS INC·Filed 2001·Granted Oct 7, 2003·337 cites·20 claims
- 2096US12136938B2Closed-loop multiple-output radio frequency (RF) matchingLAM RES CORP·Filed 2020·Granted Nov 5, 2024·4 cites·20 claims
- 2196US10804099B2Selective inhibition in atomic layer deposition of silicon-containing filmsLAM RES CORP·Filed 2017·Granted Oct 13, 2020·13 cites·16 claims
- 2296US10699937B2Wafer positioning pedestal for semiconductor processingLAM RES CORP·Filed 2019·Granted Jun 30, 2020·8 cites·20 claims
- 2396US10665429B2Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformityLAM RES CORP·Filed 2017·Granted May 26, 2020·6 cites·20 claims
- 2496US10400333B2Hybrid ceramic showerheadNOVELLUS SYSTEMS INC·Filed 2016·Granted Sep 3, 2019·7 cites·20 claims
- 2596US10020220B2Wafer positioning pedestal for semiconductor processingLAM RES CORP·Filed 2017·Granted Jul 10, 2018·9 cites·19 claims
- 2696US9793096B2Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformityLAM RES CORP·Filed 2015·Granted Oct 17, 2017·16 cites·18 claims
- 2796US9644271B1Systems and methods for using electrical asymmetry effect to control plasma process space in semiconductor fabricationLAM RES CORP·Filed 2016·Granted May 9, 2017·21 cites·24 claims
- 2896US9441296B2Hybrid ceramic showerheadSABRI MOHAMED·Filed 2012·Granted Sep 13, 2016·18 cites·24 claims
- 2996US9263350B2Multi-station plasma reactor with RF balancingLAM RES CORP·Filed 2014·Granted Feb 16, 2016·19 cites·12 claims
- 3096US8219308B2Monowheel type vehicleLEESER KARL F·Filed 2010·Granted Jul 10, 2012·26 cites·43 claims
- 3196US6800173B2Variable gas conductance control for a process chamberNOVELLUS SYSTEMS INC·Filed 2001·Granted Oct 5, 2004·134 cites·15 claims
- 3295US11984298B2Impedance transformation in radio-frequency-assisted plasma generationLAM RES CORP·Filed 2020·Granted May 14, 2024·5 cites·21 claims
- 3395US11387136B2Pad raising mechanism in wafer positioning pedestal for semiconductor processingLAM RES CORP·Filed 2020·Granted Jul 12, 2022·3 cites·16 claims
- 3495US11183368B2RF tuning systems including tuning circuits having impedances for setting and adjusting parameters of electrodes in electrostatic chucksLAM RES CORP·Filed 2018·Granted Nov 23, 2021·12 cites·42 claims
- 3595US10287683B2Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate regionLAM RES CORP·Filed 2016·Granted May 14, 2019·6 cites·14 claims
- 3695US10253412B2Deposition apparatus including edge plenum showerhead assemblyLAM RES CORP·Filed 2015·Granted Apr 9, 2019·8 cites·17 claims
- 3794US10224182B2Mechanical suppression of parasitic plasma in substrate processing chamberKEIL DOUGLAS·Filed 2011·Granted Mar 5, 2019·17 cites·21 claims
- 3894US9388494B2Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate regionNOVELLUS SYSTEMS INC·Filed 2012·Granted Jul 12, 2016·16 cites·16 claims
- 3993US10354909B2Wafer positioning pedestal for semiconductor processingLAM RES CORP·Filed 2018·Granted Jul 16, 2019·5 cites·22 claims
- 4093US9954508B2Multiple-output radiofrequency matching module and associated methodsLAM RES CORP·Filed 2015·Granted Apr 24, 2018·6 cites·24 claims
- 4193US9840776B2Multi-station plasma reactor with RF balancingLAM RES CORP·Filed 2015·Granted Dec 12, 2017·7 cites·8 claims
- 4293US9490149B2Chemical deposition apparatus having conductance controlLAM RES CORP·Filed 2013·Granted Nov 8, 2016·18 cites·31 claims
- 4392US11837443B2Showerhead faceplate having flow apertures configured for hollow cathode discharge suppressionLAM RES CORP·Filed 2022·Granted Dec 5, 2023·1 cites·18 claims
- 4492US9596744B2Radio frequency generator having multiple mutually exclusive oscillators for use in plasma processingLAM RES CORP·Filed 2015·Granted Mar 14, 2017·10 cites·16 claims
- 4592US9484233B2Carousel reactor for multi-station, sequential processing systemsNOVELLUS SYSTEMS INC·Filed 2013·Granted Nov 1, 2016·12 cites·41 claims
- 4691US11725282B2Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate regionNOVELLUS SYSTEMS INC·Filed 2021·Granted Aug 15, 2023·1 cites·12 claims
- 4791US7871678B1Method of increasing the reactivity of a precursor in a cyclic deposition processNOVELLUS SYSTEMS INC·Filed 2006·Granted Jan 18, 2011·14 cites·16 claims
- 4890US12401338B2Multiple-output radiofrequency matching module and associated methodsLAM RES CORP·Filed 2024·Granted Aug 26, 2025·0 cites·20 claims
- 4990US12394601B2Impedance transformation in radio-frequency-assisted plasma generationLAM RES CORP·Filed 2024·Granted Aug 19, 2025·1 cites·12 claims
- 5090US11258420B2Mutually induced filtersLAM RES CORP·Filed 2020·Granted Feb 22, 2022·2 cites·22 claims
Showing the top 50 of 194 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →