Inventor · disambiguated record
Hans-Jochen Paul
Also filed as: PAUL HANS-JOCHEN
13 granted patents·4 pending applications·73 citations·filing 2001–2016
89Inventor score
Top patents by PatentIndex Score
17 records- 0188US7196842B2Attenuating filter for ultraviolet lightZEISS CARL SMT AG·Filed 2004·Granted Mar 27, 2007·34 cites·33 claims
- 0276US6697194B2Antireflection coating for ultraviolet light at large angles of incidenceZEISS CARL SMT AG·Filed 2001·Granted Feb 24, 2004·15 cites·6 claims
- 0371US10474036B2Optical element and optical arrangement therewithZEISS CARL SMT GMBH·Filed 2016·Granted Nov 12, 2019·1 cites·24 claims
- 0467US8294991B2Interference systems for microlithgraphic projection exposure systemsMUELLER RALF·Filed 2010·Granted Oct 23, 2012·2 cites·24 claims
- 0564US6863398B2Method and coating system for coating substrates for optical componentsZEISS CARL SMT AG·Filed 2002·Granted Mar 8, 2005·8 cites·40 claims
- 0663US6825976B2Antireflection coating for ultraviolet lightZEISS CARL SMT AG·Filed 2002·Granted Nov 30, 2004·9 cites·47 claims
- 0760US7093937B2Optical component and coating system for coating substrates for optical componentsZEISS CARL SMT AG·Filed 2005·Granted Aug 22, 2006·2 cites·5 claims
- 0850US6836379B2Catadioptric objectiveZEISS CARL SMT AG·Filed 2002·Granted Dec 28, 2004·2 cites·20 claims
- 0944US2006050371A1Antireflection coating for ultraviolet light at large angles of incidenceZEISS CARL SMT AG·Filed 2005·Application pending·0 cites
- 1042US9188771B2Reflective optical imaging systemDODOC AURELIAN·Filed 2011·Granted Nov 17, 2015·0 cites·28 claims
- 1141US2012134015A1Mirror for euv wavelengths, projection objective for microlithography having such mirror and projection exposure apparatus having such projection objectivePAUL HANS-JOCHEN·Filed 2011·Application pending·0 cites
- 1240US2002191310A1Attenuating filter for ultraviolet lightZEISS CARL SEMICONDUCTOR MFG·Filed 2002·Application pending·0 cites
- 1339US9915876B2EUV mirror and optical system comprising EUV mirrorZEISS CARL SMT GMBH·Filed 2015·Granted Mar 13, 2018·0 cites·22 claims
- 1439US2012212810A1Mirror for the euv wavelength range, projection objective for microlithography cromprising such a mirror, and projection exposure apparatus for microlithography comprising such a projection objectivePAUL HANS-JOCHEN·Filed 2012·Application pending·0 cites
- 1537US9494718B2Mirror for the EUV wavelength range, substrate for such a mirror, projection objective for microlithography comprising such a mirror or such a substrate, and projection exposure apparatus for microlithography comprising such a projection objectiveMUELLENDER STEPHAN·Filed 2012·Granted Nov 15, 2016·0 cites·27 claims
- 1636US6967771B2Antireflection coating for ultraviolet light at large angles of incidenceZEISS CARL SMT AG·Filed 2004·Granted Nov 22, 2005·0 cites·18 claims
- 1734US9915873B2Reflective optical element, and optical system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2016·Granted Mar 13, 2018·0 cites·24 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →