Inventor · disambiguated record
Susumu Tauchi
Also filed as: TAUCHI SUSUMU
31 granted patents·11 pending applications·782 citations·filing 2002–2022
97Inventor score
Top patents by PatentIndex Score
42 records- 0199USD556704SGrounded electrode for a plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2005·Granted Dec 4, 2007·445 cites·1 claims
- 0298USD770992SElectrode cover for a plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2015·Granted Nov 8, 2016·107 cites·1 claims
- 0390USD804436SUpper chamber for a plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2015·Granted Dec 5, 2017·37 cites·1 claims
- 0490US7828928B2Vacuum processing apparatusHITACHI HIGH TECH CORP·Filed 2008·Granted Nov 9, 2010·10 cites·8 claims
- 0587US8075733B2Plasma processing apparatusWATANABE SEIICHI·Filed 2008·Granted Dec 13, 2011·11 cites·5 claims
- 0686US7335277B2Vacuum processing apparatusHITACHI HIGH TECH CORP·Filed 2003·Granted Feb 26, 2008·24 cites·12 claims
- 0784USD557425SCover ring for a plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2005·Granted Dec 11, 2007·31 cites·1 claims
- 0882USD812578SUpper chamber for a plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2016·Granted Mar 13, 2018·21 cites·1 claims
- 0980US8747046B2Vacuum processing apparatusISOMURA RYOICHI·Filed 2011·Granted Jun 10, 2014·8 cites·4 claims
- 1080US8538573B2Vacuum processing apparatus and programNAKATA TERUO·Filed 2011·Granted Sep 17, 2013·6 cites·8 claims
- 1178USD802790SCover ring for a plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2015·Granted Nov 14, 2017·18 cites·1 claims
- 1275US7247207B2Vacuum processing apparatusHITACHI HIGH TECH CORP·Filed 2004·Granted Jul 24, 2007·11 cites·13 claims
- 1374US7641069B2Vacuum processing apparatusHITACHI HIGH TECH CORP·Filed 2005·Granted Jan 5, 2010·3 cites·5 claims
- 1474US7194821B2Vacuum processing apparatus and vacuum processing methodHITACHI HIGH TECH CORP·Filed 2005·Granted Mar 27, 2007·12 cites·11 claims
- 1572US8148268B2Plasma treatment apparatus and plasma treatment methodSATO KOHEI·Filed 2008·Granted Apr 3, 2012·3 cites·5 claims
- 1670USD802545SLower chamber for a plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2015·Granted Nov 14, 2017·13 cites·1 claims
- 1768US9245780B2Vacuum processing apparatus and operating method of the sameSHIMOMURA TAKAHIRO·Filed 2012·Granted Jan 26, 2016·3 cites·2 claims
- 1868US2022389575A1Vacuum processing apparatusHITACHI HIGH TECH CORP·Filed 2022·Application pending·0 cites
- 1967US7833382B2Vacuum processing apparatusHITACHI HIGH TECH CORP·Filed 2008·Granted Nov 16, 2010·1 cites·11 claims
- 2066US7322561B2Vacuum processing apparatusHITACHI HIGH TECH CORP·Filed 2005·Granted Jan 29, 2008·2 cites·15 claims
- 2164US7416633B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2004·Granted Aug 26, 2008·9 cites·3 claims
- 2263US8286822B2Vacuum processing apparatusTAUCHI SUSUMU·Filed 2010·Granted Oct 16, 2012·1 cites·18 claims
- 2360US10665436B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2016·Granted May 26, 2020·1 cites·6 claims
- 2460US9011065B2Vacuum processing apparatus and operating method of vacuum processing apparatusTAUCHI SUSUMU·Filed 2010·Granted Apr 21, 2015·1 cites·7 claims
- 2559US8849446B2Vacuum processing apparatus and programNAKATA TERUO·Filed 2011·Granted Sep 30, 2014·1 cites·8 claims
- 2657US7976632B2Vacuum processing apparatusHITACHI HIGH TECH CORP·Filed 2008·Granted Jul 12, 2011·0 cites·10 claims
- 2752US7674351B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2004·Granted Mar 9, 2010·3 cites·10 claims
- 2851US8740011B2Vacuum processing apparatusTAUCHI SUSUMU·Filed 2011·Granted Jun 3, 2014·0 cites·19 claims
- 2948US8460467B2Vacuum processing apparatusMAKINO AKITAKA·Filed 2011·Granted Jun 11, 2013·0 cites·15 claims
- 3047US7807581B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2007·Granted Oct 5, 2010·0 cites·7 claims
- 3147US6837937B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2002·Granted Jan 4, 2005·0 cites·10 claims
- 3247US2016217976A1Vacuum processing apparatusHITACHI HIGH TECH CORP·Filed 2015·Application pending·0 cites
- 3345US2005051089A1Plasma processing apparatusFiled 2004·Application pending·0 cites
- 3444US2014295672A1Vacuum processing apparatus and operating method of the sameHITACHI HIGH TECH CORP·Filed 2014·Application pending·0 cites
- 3543US2015194327A1Vacuum processing system and vacuum processing method of semiconductor processing substrateHITACHI HIGH TECH CORP·Filed 2015·Application pending·0 cites
- 3640US2009165952A1Vacuum processing apparatusTAUCHI SUSUMU·Filed 2008·Application pending·0 cites
- 3735US2011110752A1Vacuum processing system and vacuum processing method of semiconductor processing substrateHITACHI HIGH TECH CORP·Filed 2010·Application pending·0 cites
- 3834US2013183121A1Vacuum processing apparatusISOMURA RYOICHI·Filed 2012·Application pending·0 cites
- 3931US2012027542A1Vacuum processorISOMURA RYOICHI·Filed 2010·Application pending·0 cites
- 4031US2011318143A1Vacuum processing apparatusISOMURA RYOICHI·Filed 2010·Application pending·0 cites
- 4129US9343340B2Vacuum processing apparatusNOGI KEITA·Filed 2011·Granted May 17, 2016·0 cites·6 claims
- 4229US2006054278A1Plasma processing apparatusMAKINO AKITAKA·Filed 2005·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →