USD802545SActiveUtility

Lower chamber for a plasma processing apparatus

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Assignee: HITACHI HIGH TECH CORPPriority: Jun 12, 2015Filed: Oct 30, 2015Granted: Nov 14, 2017
Est. expiryJun 12, 2035(~8.9 yrs left)· nominal 20-yr term from priority
Inventors:Susumu TauchiTakashi UemuraKohei Sato
70
PatentIndex Score
13
Cited by
17
References
1
Claims

Claims

exact text as granted — not AI-modified
CLAIM 
     
       The ornamental design for a lower chamber for a plasma processing apparatus, as shown and described.

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