USD770992SActiveUtility

Electrode cover for a plasma processing apparatus

Assignee: HITACHI HIGH TECH CORPPriority: Jun 12, 2015Filed: Oct 30, 2015Granted: Nov 8, 2016

Est. expiryJun 12, 2035(~8.9 yrs left)· nominal 20-yr term from priority

PatentIndex Score

107

Cited by

References

Claims

exact text as granted — not AI-modified

CLAIM 
     
       The ornamental design for an electrode cover for a plasma processing apparatus, as shown and described.

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