Inventor · disambiguated record
Robert C. Pack
Also filed as: PACK ROBERT · PACK ROBERT ANDREW · PACK ROBERT C · PACK ROBERT CHARLES
16 granted patents·7 pending applications·660 citations·filing 2000–2023
94Inventor score
Top patents by PatentIndex Score
23 records- 0198US7302672B2Method and system for context-specific mask writingCADENCE DESIGN SYSTEMS INC·Filed 2005·Granted Nov 27, 2007·71 cites·24 claims
- 0298US7231628B2Method and system for context-specific mask inspectionCADENCE DESIGN SYSTEMS INC·Filed 2003·Granted Jun 12, 2007·314 cites·19 claims
- 0395US8453102B1Hierarchical variation analysis of integrated circuitsPACK ROBERT C·Filed 2011·Granted May 28, 2013·59 cites·20 claims
- 0494US9038003B2Method and system for critical dimension uniformity using charged particle beam lithographyD2S INC·Filed 2013·Granted May 19, 2015·12 cites·29 claims
- 0594US8468482B1Modeling and simulating the impact of imperfectly patterned via arrays on integrated circuitsPACK ROBERT C·Filed 2011·Granted Jun 18, 2013·41 cites·18 claims
- 0693US9343267B2Method and system for dimensional uniformity using charged particle beam lithographyD2S INC·Filed 2014·Granted May 17, 2016·12 cites·13 claims
- 0791US7249342B2Method and system for context-specific mask writingCADENCE DESIGN SYSTEMS INC·Filed 2003·Granted Jul 24, 2007·37 cites·30 claims
- 0890US6562638B1Integrated scheme for predicting yield of semiconductor (MOS) devices from designed layoutCYPRESS SEMICONDUCTOR CORP·Filed 2000·Granted May 13, 2003·69 cites·11 claims
- 0986US9859100B2Method and system for dimensional uniformity using charged particle beam lithographyD2S INC·Filed 2016·Granted Jan 2, 2018·3 cites·12 claims
- 1086US7784016B2Method and system for context-specific mask writingCADENCE DESIGN SYSTEMS INC·Filed 2007·Granted Aug 24, 2010·7 cites·21 claims
- 1185US8407627B2Method and system for context-specific mask inspectionPACK ROBERT C·Filed 2007·Granted Mar 26, 2013·7 cites·36 claims
- 1282US8959463B2Method and system for dimensional uniformity using charged particle beam lithographyD2S INC·Filed 2013·Granted Feb 17, 2015·5 cites·26 claims
- 1372US7024638B2Method for creating patterns for producing integrated circuitsCADENCE DESIGN SYSTEMS INC·Filed 2003·Granted Apr 4, 2006·21 cites·34 claims
- 1471US8745549B2Method and system for forming high precision patterns using charged particle beam lithographyFUJIMURA AKIRA·Filed 2012·Granted Jun 3, 2014·2 cites·27 claims
- 1570US2025384154A1Method and system for controlling access to data in an industrial plant or in a database associated to the industrial plantBASF SE·Filed 2023·Application pending·0 cites
- 1663US10431422B2Method and system for dimensional uniformity using charged particle beam lithographyD2S INC·Filed 2017·Granted Oct 1, 2019·0 cites·15 claims
- 1760US2023135102A1Methods and mechanisms for process recipe optimizationAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 1857US2023053175A1Process network with several plantsBASF SE·Filed 2021·Application pending·0 cites
- 1956US2023418272A1System for Determining Operating Points in a Chemical PlantBASF SE·Filed 2021·Application pending·0 cites
- 2048US2024160161A1Chemical process modelingBASF SE·Filed 2022·Application pending·0 cites
- 2144US10055535B2Method, system and program product for identifying anomalies in integrated circuit design layoutsGLOBALFOUNDRIES INC·Filed 2016·Granted Aug 21, 2018·0 cites·20 claims
- 2244US2022198333A1Recipe optimization through machine learningAPPLIED MATERIALS INC·Filed 2021·Application pending·0 cites
- 2330US2004009174A1Method of treating asthmaFiled 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →