Inventor · disambiguated record
Walter Zygmunt
Also filed as: ZYGMUNT WALTER
8 granted patents·1 pending application·1,173 citations·filing 1998–2008
91Inventor score
Files withAPPLIED MATERIALS INC9
Top patents by PatentIndex Score
9 records- 0198US6929700B2Hydrogen assisted undoped silicon oxide deposition process for HDP-CVDAPPLIED MATERIALS INC·Filed 2003·Granted Aug 16, 2005·482 cites·18 claims
- 0298US6596653B2Hydrogen assisted undoped silicon oxide deposition process for HDP-CVDAPPLIED MATERIALS INC·Filed 2001·Granted Jul 22, 2003·542 cites·29 claims
- 0394US6740601B2HDP-CVD deposition process for filling high aspect ratio gapsAPPLIED MATERIALS INC·Filed 2001·Granted May 25, 2004·53 cites·39 claims
- 0487US6200911B1Method and apparatus for modifying the profile of narrow, high-aspect-ratio gaps using differential plasma powerAPPLIED MATERIALS INC·Filed 1998·Granted Mar 13, 2001·57 cites·3 claims
- 0586US7196021B2HDP-CVD deposition process for filling high aspect ratio gapsAPPLIED MATERIALS INC·Filed 2005·Granted Mar 27, 2007·5 cites·14 claims
- 0683US6579811B2Method and apparatus for modifying the profile of narrow, high-aspect-ratio gaps through wafer heatingAPPLIED MATERIALS INC·Filed 2000·Granted Jun 17, 2003·19 cites·12 claims
- 0776US7704897B2HDP-CVD SiON films for gap-fillAPPLIED MATERIALS INC·Filed 2008·Granted Apr 27, 2010·7 cites·27 claims
- 0871US6914016B2HDP-CVD deposition process for filling high aspect ratio gapsAPPLIED MATERIALS INC·Filed 2004·Granted Jul 5, 2005·8 cites·31 claims
- 0941US2003157812A1Method and apparatus for modifying the profile of narrow, high-aspect-ratio gaps using RF powerAPPLIED MATERIALS INC·Filed 2003·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Walter Zygmunt files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →