Inventor · disambiguated record
Steve Ghanayem
Also filed as: GHANAYEM STEVE · GHANAYEM STEVE G
36 granted patents·12 pending applications·2,396 citations·filing 1992–2021
98Inventor score
Top patents by PatentIndex Score
48 records- 0196US9601339B2Methods for depositing fluorine/carbon-free conformal tungstenAPPLIED MATERIALS INC·Filed 2015·Granted Mar 21, 2017·13 cites·18 claims
- 0296US7601652B2Method for treating substrates and films with photoexcitationAPPLIED MATERIALS INC·Filed 2005·Granted Oct 13, 2009·486 cites·18 claims
- 0396US6677247B2Method of increasing the etch selectivity of a contact sidewall to a preclean etchantAPPLIED MATERIALS INC·Filed 2002·Granted Jan 13, 2004·116 cites·24 claims
- 0496US6638810B2Tantalum nitride CVD deposition by tantalum oxide densificationAPPLIED MATERIALS INC·Filed 2001·Granted Oct 28, 2003·324 cites·46 claims
- 0596US5552016AMethod and apparatus for etchback endpoint detectionAPPLIED MATERIALS INC·Filed 1995·Granted Sep 3, 1996·130 cites·4 claims
- 0695US9230815B2Methods for depositing fluorine/carbon-free conformal tungstenAPPLIED MATERIALS INC·Filed 2013·Granted Jan 5, 2016·17 cites·20 claims
- 0794US6464795B1Substrate support member for a processing chamberAPPLIED MATERIALS INC·Filed 2000·Granted Oct 15, 2002·98 cites·28 claims
- 0894US6319766B1Method of tantalum nitride deposition by tantalum oxide densificationAPPLIED MATERIALS INC·Filed 2000·Granted Nov 20, 2001·91 cites·23 claims
- 0994US6251190B1Gate electrode connection structure by in situ chemical vapor deposition of tungsten and tungsten nitrideAPPLIED MATERIALS INC·Filed 2000·Granted Jun 26, 2001·84 cites·18 claims
- 1093US6162715AMethod of forming gate electrode connection structure by in situ chemical vapor deposition of tungsten and tungsten nitrideAPPLIED MATERIALS INC·Filed 1998·Granted Dec 19, 2000·136 cites·34 claims
- 1192US6328808B1Apparatus and method for aligning and controlling edge deposition on a substrateAPPLIED MATERIALS INC·Filed 2000·Granted Dec 11, 2001·44 cites·16 claims
- 1292US6309713B1Deposition of tungsten nitride by plasma enhanced chemical vapor depositionAPPLIED MATERIALS INC·Filed 1997·Granted Oct 30, 2001·89 cites·16 claims
- 1392US6156382AChemical vapor deposition process for depositing tungstenAPPLIED MATERIALS INC·Filed 1997·Granted Dec 5, 2000·171 cites·23 claims
- 1492US5328722AMetal chemical vapor deposition process using a shadow ringAPPLIED MATERIALS INC·Filed 1992·Granted Jul 12, 1994·149 cites·25 claims
- 1589US6106634AMethods and apparatus for reducing particle contamination during wafer transportAPPLIED MATERIALS INC·Filed 1999·Granted Aug 22, 2000·83 cites·22 claims
- 1683US6192601B1Method and apparatus for reducing particle contamination during wafer transportAPPLIED MATERIALS INC·Filed 2000·Granted Feb 27, 2001·26 cites·19 claims
- 1783US5985033AApparatus and method for delivering a gasAPPLIED MATERIALS INC·Filed 1997·Granted Nov 16, 1999·57 cites·25 claims
- 1883US5292554ADeposition apparatus using a perforated pumping plateAPPLIED MATERIALS INC·Filed 1992·Granted Mar 8, 1994·81 cites·24 claims
- 1981US7774887B2Scrubber box and methods for using the sameAPPLIED MATERIALS INC·Filed 2008·Granted Aug 17, 2010·6 cites·10 claims
- 2080US7377002B2Scrubber boxAPPLIED MATERIALS INC·Filed 2004·Granted May 27, 2008·20 cites·5 claims
- 2178US6186092B1Apparatus and method for aligning and controlling edge deposition on a substrateAPPLIED MATERIALS INC·Filed 1997·Granted Feb 13, 2001·39 cites·32 claims
- 2276US11887855B2Methods for depositing fluorine/carbon-free conformal tungstenAPPLIED MATERIALS INC·Filed 2021·Granted Jan 30, 2024·0 cites·19 claims
- 2376US7192486B2Clog-resistant gas delivery systemAPPLIED MATERIALS INC·Filed 2002·Granted Mar 20, 2007·15 cites·18 claims
- 2471US7745309B2Methods for surface activation by plasma immersion ion implantation process utilized in silicon-on-insulator structureAPPLIED MATERIALS INC·Filed 2006·Granted Jun 29, 2010·5 cites·23 claims
- 2569US6174373B1Non-plasma halogenated gas flow prevent metal residuesAPPLIED MATERIALS INC·Filed 2000·Granted Jan 16, 2001·7 cites·17 claims
- 2668US6248176B1Apparatus and method for delivering a gasAPPLIED MATERIALS INC·Filed 1999·Granted Jun 19, 2001·28 cites·20 claims
- 2760US10985023B2Methods for depositing fluorine/carbon-free conformal tungstenAPPLIED MATERIALS INC·Filed 2017·Granted Apr 20, 2021·0 cites·14 claims
- 2858US6303480B1Silicon layer to improve plug filling by CVDAPPLIED MATERIALS INC·Filed 1999·Granted Oct 16, 2001·20 cites·25 claims
- 2958US6271129B1Method for forming a gap filling refractory metal layer having reduced stressAPPLIED MATERIALS INC·Filed 1997·Granted Aug 7, 2001·21 cites·34 claims
- 3051US2012210937A1Substrate processing apparatus using a batch processing chamberTHAKUR RANDHIR·Filed 2012·Application pending·0 cites
- 3151US2006156979A1Substrate processing apparatus using a batch processing chamberAPPLIED MATERIALS INC·Filed 2005·Application pending·0 cites
- 3250US6204174B1Method for high rate deposition of tungstenAPPLIED MATERIALS INC·Filed 1997·Granted Mar 20, 2001·16 cites·15 claims
- 3350US6070599ANon-plasma halogenated gas flow to prevent metal residuesAPPLIED MATERIALS INC·Filed 1997·Granted Jun 6, 2000·10 cites·14 claims
- 3450US2007042130A1Method of treating films using UV-generated active speciesAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 3549US10429747B2Hybrid laser and implant treatment for overlay error correctionAPPLIED MATERIALS INC·Filed 2017·Granted Oct 1, 2019·0 cites·20 claims
- 3648US2010173495A1Substrate processing apparatus using a batch processing chamberAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
- 3743US2008268617A1Methods for substrate surface cleaning suitable for fabricating silicon-on-insulator structuresAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 3843US2007259111A1Method and apparatus for photo-excitation of chemicals for atomic layer deposition of dielectric filmSINGH KAUSHAL K·Filed 2006·Application pending·0 cites
- 3940US2007084408A1Batch processing chamber with diffuser plate and injector assemblyAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 4039US5777245AParticle dispersing system and method for testing semiconductor manufacturing equipmentAPPLIED MATERIALS INC·Filed 1996·Granted Jul 7, 1998·9 cites·3 claims
- 4139US2004163590A1In-situ health check of liquid injection vaporizerAPPLIED MATERIALS INC·Filed 2003·Application pending·0 cites
- 4239US2006286819A1Method for silicon based dielectric deposition and clean with photoexcitationAPPLIED MATERIALS INC·Filed 2005·Application pending·0 cites
- 4338US6602770B2Silicon layer to improve plug filling by CVDAPPLIED MATERIALS INC·Filed 2001·Granted Aug 5, 2003·0 cites·21 claims
- 4438US2007084406A1Reaction chamber with opposing pockets for gas injection and exhaustYUDOVSKY JOSEPH·Filed 2005·Application pending·0 cites
- 4536US6210483B1Anti-notch thinning heaterAPPLIED MATERIALS INC·Filed 1998·Granted Apr 3, 2001·3 cites·20 claims
- 4636US2001016429A1Deposition of tungsten nitride by plasma enhanced chemical vapor depositionAPPLIED MATERIALS INC·Filed 2001·Application pending·0 cites
- 4735US2003019427A1In situ stabilized high concentration BPSG films for PMD applicationAPPLIED MATERIALS INC·Filed 2001·Application pending·0 cites
- 4833US5709772ANon-plasma halogenated gas flow to prevent metal residuesAPPLIED MATERIALS INC·Filed 1996·Granted Jan 20, 1998·2 cites·14 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →