Inventor · disambiguated record
Alan Ouye
Also filed as: OUYE ALAN · OUYE ALAN H · OUYE ALAN HIROSHI
27 granted patents·9 pending applications·1,200 citations·filing 1998–2021
97Inventor score
Top patents by PatentIndex Score
36 records- 0198US7270709B2Method and apparatus of generating PDMAT precursorAPPLIED MATERIALS INC·Filed 2005·Granted Sep 18, 2007·50 cites·20 claims
- 0298US6916398B2Gas delivery apparatus and method for atomic layer depositionAPPLIED MATERIALS INC·Filed 2001·Granted Jul 12, 2005·646 cites·21 claims
- 0398US6905541B2Method and apparatus of generating PDMAT precursorAPPLIED MATERIALS INC·Filed 2003·Granted Jun 14, 2005·119 cites·32 claims
- 0496US8668776B2Gas delivery apparatus and method for atomic layer depositionCHEN LING·Filed 2010·Granted Mar 11, 2014·21 cites·14 claims
- 0596US7699023B2Gas delivery apparatus for atomic layer depositionAPPLIED MATERIALS INC·Filed 2007·Granted Apr 20, 2010·34 cites·20 claims
- 0696US7597758B2Chemical precursor ampoule for vapor deposition processesAPPLIED MATERIALS INC·Filed 2007·Granted Oct 6, 2009·16 cites·20 claims
- 0794US7775508B2Ampoule for liquid draw and vapor draw with a continuous level sensorAPPLIED MATERIALS INC·Filed 2006·Granted Aug 17, 2010·28 cites·23 claims
- 0893US7780785B2Gas delivery apparatus for atomic layer depositionAPPLIED MATERIALS INC·Filed 2002·Granted Aug 24, 2010·61 cites·26 claims
- 0993US7780788B2Gas delivery apparatus for atomic layer depositionAPPLIED MATERIALS INC·Filed 2005·Granted Aug 24, 2010·17 cites·62 claims
- 1092US9478455B1Thermal pyrolytic graphite shadow ring assembly for heat dissipation in plasma chamberOUYE ALAN HIROSHI·Filed 2015·Granted Oct 25, 2016·10 cites·19 claims
- 1192US7909961B2Method and apparatus for photomask plasma etchingAPPLIED MATERIALS INC·Filed 2006·Granted Mar 22, 2011·21 cites·4 claims
- 1292US6955211B2Method and apparatus for gas temperature control in a semiconductor processing systemAPPLIED MATERIALS INC·Filed 2002·Granted Oct 18, 2005·70 cites·19 claims
- 1390US7943005B2Method and apparatus for photomask plasma etchingAPPLIED MATERIALS INC·Filed 2006·Granted May 17, 2011·15 cites·19 claims
- 1487US9165812B2Cooled tape frame lift and low contact shadow ring for plasma heat isolationAPPLIED MATERIALS INC·Filed 2014·Granted Oct 20, 2015·6 cites·13 claims
- 1585US9378930B2Inductively coupled plasma reactor having RF phase control and methods of use thereofGRIMBERGEN MICHAEL N·Filed 2010·Granted Jun 28, 2016·7 cites·14 claims
- 1684US7588736B2Apparatus and method for generating a chemical precursorAPPLIED MATERIALS INC·Filed 2006·Granted Sep 15, 2009·7 cites·51 claims
- 1783US9236284B2Cooled tape frame lift and low contact shadow ring for plasma heat isolationOUYE ALAN HIROSHI·Filed 2014·Granted Jan 12, 2016·5 cites·13 claims
- 1882US7524374B2Method and apparatus for generating a precursor for a semiconductor processing systemAPPLIED MATERIALS INC·Filed 2004·Granted Apr 28, 2009·26 cites·45 claims
- 1981US6228208B1Plasma density and etch rate enhancing semiconductor processing chamberAPPLIED MATERIALS INC·Filed 1998·Granted May 8, 2001·33 cites·18 claims
- 2078US8062422B2Method and apparatus for generating a precursor for a semiconductor processing systemCHEN LING·Filed 2009·Granted Nov 22, 2011·1 cites·20 claims
- 2173US9293304B2Plasma thermal shield for heat dissipation in plasma chamberAPPLIED MATERIALS INC·Filed 2013·Granted Mar 22, 2016·2 cites·5 claims
- 2255US11721566B2Sensor assembly and methods of vapor monitoring in process chambersAPPLIED MATERIALS INC·Filed 2021·Granted Aug 8, 2023·0 cites·18 claims
- 2354US2008038463A1Atomic layer deposition processAPPLIED MATERIALS INC·Filed 2007·Application pending·0 cites
- 2452US2007099415A1Integration process of tungsten atomic layer deposition for metallization applicationCHEN LING·Filed 2006·Application pending·0 cites
- 2551US2015170885A1Plasma thermal shield for heat dissipation in plasma chamberOUYE ALAN HIROSHI·Filed 2014·Application pending·0 cites
- 2648US8568553B2Method and apparatus for photomask plasma etchingKUMAR AJAY·Filed 2011·Granted Oct 29, 2013·0 cites·20 claims
- 2747US2009220865A1Method and apparatus for source field shaping in a plasma etch reactorAPPLIED MATERIALS INC·Filed 2008·Application pending·0 cites
- 2846US11195756B2Proximity contact cover ring for plasma dicingAPPLIED MATERIALS INC·Filed 2014·Granted Dec 7, 2021·0 cites·8 claims
- 2944US2015170955A1Actively-cooled shadow ring for heat dissipation in plasma chamberAPPLIED MATERIALS INC·Filed 2013·Application pending·0 cites
- 3041US6598316B2Apparatus to reduce contaminants from semiconductor wafersAPPLIED MATERIALS INC·Filed 2002·Granted Jul 29, 2003·0 cites·18 claims
- 3141US2003124262A1Integration of ALD tantalum nitride and alpha-phase tantalum for copper metallization applicationFiled 2002·Application pending·0 cites
- 3239US10595365B2Chamber lid heater ring assemblyOUYE ALAN H·Filed 2011·Granted Mar 17, 2020·0 cites·9 claims
- 3339US2012103526A1High purity aluminum coating hard anodizationOUYE ALAN·Filed 2011·Application pending·0 cites
- 3438US6406553B1Method to reduce contaminants from semiconductor wafersAPPLIED MATERIALS INC·Filed 1999·Granted Jun 18, 2002·5 cites·11 claims
- 3535US2010276391A1Inductively coupled plasma reactor having rf phase control and methods of use thereofAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
- 3631US2011236806A1Dc voltage charging of cathode for plasma strikingAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →