Inventor · disambiguated record
Satoshi Une
Also filed as: UNE SATOSHI
7 granted patents·6 pending applications·1 citations·filing 2004–2022
70Inventor score
Technology areasH10P
Top patents by PatentIndex Score
13 records- 0160US7909933B2Plasma processing methodHITACHI HIGH TECH CORP·Filed 2009·Granted Mar 22, 2011·1 cites·5 claims
- 0253US12374532B2Plasma processing methodHITACHI HIGH TECH CORP·Filed 2022·Granted Jul 29, 2025·0 cites·7 claims
- 0351US2025095981A1Plasma processing methodHITACHI HIGH TECH CORP·Filed 2022·Application pending·0 cites
- 0447US8143175B2Dry etching methodUNE SATOSHI·Filed 2009·Granted Mar 27, 2012·0 cites·8 claims
- 0543US10229838B2Plasma etching methodHITACHI HIGH TECH CORP·Filed 2017·Granted Mar 12, 2019·0 cites·6 claims
- 0643US2008216865A1Plasma Processing MethodISHIHARA MASUNORI·Filed 2007·Application pending·0 cites
- 0742US11424106B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2018·Granted Aug 23, 2022·0 cites·5 claims
- 0840US11658040B2Plasma processing methodHITACHI HIGH TECH CORP·Filed 2019·Granted May 23, 2023·0 cites·9 claims
- 0940US8277563B2Plasma processing methodISHIHARA MASUNORI·Filed 2011·Granted Oct 2, 2012·0 cites·8 claims
- 1039US2007218696A1Dry etching methodKUWABARA KENICHI·Filed 2006·Application pending·0 cites
- 1139US2007207618A1Dry etching methodUNE SATOSHI·Filed 2006·Application pending·0 cites
- 1237US2014151327A1Plasma etching methodHITACHI HIGH TECH CORP·Filed 2013·Application pending·0 cites
- 1334US2006016781A1Dry etching methodKUWABARA KENICHI·Filed 2004·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →