Plasma Processing Method

Abstract

The invention provides a plasma processing method capable of reducing particle caused by flinging up of particles by airflow due to the pressure fluctuation in the processing chamber during the time the sample is carried into the processing chamber, subjected to plasma processing and carried out of the processing chamber. The invention provides a plasma processing method using a plasma processing apparatus comprising multiple plasma processing chambers for processing samples, a transfer chamber connected to the processing chambers for transferring samples, and a supply system for supplying gas which is the same gas as a transferring gas supplied to the transfer chamber to both the processing chambers and transfer chamber or to only the processing chambers, wherein the process comprises (b) a step of transferring the sample into the processing chamber with the transferring gas supplied to the processing chamber; (c) thereafter, generating plasma from the transferring gas supplied to the processing chamber while maintaining the supply of transferring gas to the processing chamber; (d) a step of switching the gas supplied to the processing chamber from transferring gas to processing gas while maintaining plasma by supplying processing gas continuously to the processing chamber; and (e) a step of subjecting the sample to plasma processing.

1 . A plasma processing method using a plasma processing apparatus having a processing chamber for subjecting a sample to plasma processing, a transfer chamber connected to the processing chamber for transferring the sample, and a supply system for feeding gas which is the same gas as a transferring gas supplied to the transferring chamber to both the processing chamber and the transfer chamber or to only the processing chamber when transferring the sample from the transfer chamber to the processing chamber; the plasma processing method comprising:
 a step of transferring the sample into the processing chamber after introducing the transferring gas to the processing chamber;   a step of generating plasma using the transferring gas in the processing chamber while maintaining the supply of transferring gas to the processing chamber; and   a step of supplying processing gas continuously into the plasma processing chamber while maintaining plasma so as to switch gases from transferring gas to processing gas to thereby subject the sample to plasma processing.   
     
     
         2 . A plasma processing method using a plasma processing apparatus having a processing chamber for subjecting a sample to plasma processing, a transfer chamber connected to the processing chamber for transferring the sample, and a supply system for feeding gas which is the same gas as a transferring gas supplied to the transferring chamber to both the processing chamber and the transfer chamber or to only the processing chamber when transferring the sample from the transfer chamber to the processing chamber; the plasma processing method comprising:
 a step of continuously switching gases supplied to the processing chamber from processing gas to transferring gas while maintaining plasma in the processing chamber prior to terminating plasma processing of the sample using processing gas;   a step of terminating plasma using transferring gas; and   a step of transferring the processed sample from the processing chamber to the transferring chamber while maintaining the supply of transferring gas after terminating plasma.   
     
     
         3 . A plasma processing method using a plasma processing apparatus having a processing chamber for subjecting a sample to plasma processing, a transfer chamber connected to the processing chamber for transferring the sample, and a supply system for feeding gas which is the same gas as a transferring gas supplied to the transferring chamber to both the processing chamber and the transfer chamber or to only the processing chamber when transferring the sample from the transfer chamber to the processing chamber; the plasma processing method comprising:
 a step of transferring the sample into the processing chamber after introducing the transferring gas to the processing chamber;   a step of generating plasma using the transferring gas in the processing chamber while maintaining the supply of transferring gas to the processing chamber;   a step of supplying processing gas continuously into the plasma processing chamber while maintaining plasma so as to switch gases from transferring gas to processing gas to thereby subject the sample to plasma processing;   a step of continuously switching gases supplied to the processing chamber from processing gas to transferring gas while maintaining plasma in the processing chamber prior to terminating plasma processing of the sample using processing gas;   a step of terminating plasma using transferring gas; and   a step of transferring the processed sample from the processing chamber to the transferring chamber while maintaining the supply of transferring gas after terminating plasma.   
     
     
         4 . The plasma processing method according to  claim 1 , wherein
 the transferring gas is selected from argon gas, nitrogen gas, or a mixed gas composed of argon gas and nitrogen gas.   
     
     
         5 . The plasma processing method according to  claim 2 , wherein
 the transferring gas is selected from argon gas, nitrogen gas, or a mixed gas composed of argon gas and nitrogen gas.   
     
     
         6 . The plasma processing method according to  claim 3 , wherein
 the transferring gas is selected from argon gas, nitrogen gas, or a mixed gas composed of argon gas and nitrogen gas.