Inventor · disambiguated record
Paul D. Shirley
Also filed as: SHIRLEY PAUL · SHIRLEY PAUL D
32 granted patents·10 pending applications·386 citations·filing 1995–2022
97Inventor score
Top patents by PatentIndex Score
42 records- 0191US11450552B2Methods and apparatus for adjusting surface topography of a substrate support apparatusMICRON TECHNOLOGY INC·Filed 2019·Granted Sep 20, 2022·5 cites·16 claims
- 0287US5912049AProcess liquid dispense method and apparatusMICRON TECHNOLOGY INC·Filed 1997·Granted Jun 15, 1999·72 cites·24 claims
- 0385US8124326B2Methods of patterning positive photoresistSHIRLEY PAUL D·Filed 2009·Granted Feb 28, 2012·10 cites·33 claims
- 0484US7737055B2Systems and methods for manipulating liquid films on semiconductor substratesMICRON TECHNOLOGY INC·Filed 2008·Granted Jun 15, 2010·7 cites·19 claims
- 0583US7470638B2Systems and methods for manipulating liquid films on semiconductor substratesMICRON TECHNOLOGY INC·Filed 2006·Granted Dec 30, 2008·7 cites·19 claims
- 0683US6817057B2Spindle chuck cleanerMICRON TECHNOLOGY INC·Filed 2001·Granted Nov 16, 2004·21 cites·82 claims
- 0781US8163468B2Method of reducing photoresist defects during fabrication of a semiconductor deviceHISHIRO YOSHIKI·Filed 2008·Granted Apr 24, 2012·6 cites·8 claims
- 0877US6548111B1Method for controlling a temperature of a microelectronic substrateMICRON TECHNOLOGY INC·Filed 2000·Granted Apr 15, 2003·16 cites·17 claims
- 0976US7361234B2Photolithographic stepper and/or scanner machines including cleaning devices and methods of cleaning photolithographic stepper and/or scanner machinesMICRON TECHNOLOGY INC·Filed 2006·Granted Apr 22, 2008·4 cites·19 claims
- 1076US5925410AVibration-enhanced spin-on film techniques for semiconductor device processingMICRON TECHNOLOGY INC·Filed 1997·Granted Jul 20, 1999·47 cites·34 claims
- 1175US6830619B2Method and apparatus for controlling a temperature of a microelectronic substrateMICRON TECHNOLOGY INC·Filed 2001·Granted Dec 14, 2004·14 cites·43 claims
- 1275US5849435AMethod for forming a thin uniform layer of resist for lithographyMICRON TECHNOLOGY INC·Filed 1997·Granted Dec 15, 1998·29 cites·32 claims
- 1373US12183621B2Methods for adjusting surface topography of a substrate support apparatusMICRON TECHNOLOGY INC·Filed 2022·Granted Dec 31, 2024·0 cites·19 claims
- 1473US6322626B1Apparatus for controlling a temperature of a microelectronics substrateMICRON TECHNOLOGY INC·Filed 1999·Granted Nov 27, 2001·32 cites·54 claims
- 1570US5609995AMethod for forming a thin uniform layer of resist for lithographyMICRON TECHNOLOGY INC·Filed 1995·Granted Mar 11, 1997·25 cites·32 claims
- 1668US6872254B2Method and apparatus for controlling air over a spinning microelectronic substrateMICRON TECHNOLOGY INC·Filed 2003·Granted Mar 29, 2005·9 cites·11 claims
- 1768US6576055B2Method and apparatus for controlling air over a spinning microelectronic substrateMICRON TECHNOLOGY INC·Filed 2001·Granted Jun 10, 2003·9 cites·22 claims
- 1867US8859195B2Methods of lithographically patterning a substrateHISHIRO YOSHIKI·Filed 2012·Granted Oct 14, 2014·1 cites·14 claims
- 1966US6548110B1Process liquid dispense method and apparatusMICRON TECHNOLOGY INC·Filed 2000·Granted Apr 15, 2003·8 cites·22 claims
- 2065US7370659B2Photolithographic stepper and/or scanner machines including cleaning devices and methods of cleaning photolithographic stepper and/or scanner machinesMICRON TECHNOLOGY INC·Filed 2003·Granted May 13, 2008·8 cites·22 claims
- 2163US6569241B2Substrate spinning apparatusMICRON TECHNOLOGY INC·Filed 2002·Granted May 27, 2003·6 cites·20 claims
- 2261US6398868B1Substrate coating apparatusMICRON TECHNOLOGY INC·Filed 2000·Granted Jun 4, 2002·5 cites·10 claims
- 2356US6402845B1Process liquid dispense method and apparatusMICRON TECHNOLOGY INC·Filed 2000·Granted Jun 11, 2002·4 cites·26 claims
- 2456US6232247B1Substrate coating apparatus and semiconductor processing method of improving uniformity of liquid depositionMICRON TECHNOLOGY INC·Filed 1999·Granted May 15, 2001·14 cites·34 claims
- 2555US6555276B2Substrate coating and semiconductor processing method of improving uniformity of liquid depositionMICRON TECHNOLOGY INC·Filed 2001·Granted Apr 29, 2003·4 cites·20 claims
- 2653US2007056608A1Spindle chuck cleanerMICRON TECHNOLOGY INC·Filed 2006·Application pending·0 cites
- 2752US6261635B1Method for controlling air over a spinning microelectronic substrateMICRON TECHNOLOGY INC·Filed 1999·Granted Jul 17, 2001·13 cites·33 claims
- 2852US2006243305A1Spindle chuck cleanerMICRON TECHNOLOGY INC·Filed 2006·Application pending·0 cites
- 2951US8309297B2Methods of lithographically patterning a substrateHISHIRO YOSHIKI·Filed 2007·Granted Nov 13, 2012·0 cites·23 claims
- 3051US2007056513A1System for situ photoresist thickness characterizatonSHIRLEY PAUL D·Filed 2006·Application pending·0 cites
- 3151US2007065575A1Method for in situ photoresist thickness characterizationSHIRLEY PAUL D·Filed 2006·Application pending·0 cites
- 3251US2007061035A1Method and computer-readable medium for in situ photoresist thickness characterizationSHIRLEY PAUL D·Filed 2006·Application pending·0 cites
- 3351US2007026134A1Method for in situ photoresist thickness characterizationSHIRLEY PAUL D·Filed 2006·Application pending·0 cites
- 3450US7605350B2System for two-step resist soft bake to prevent ILD outgassing during semiconductor processingMICRON TECHNOLOGY INC·Filed 2005·Granted Oct 20, 2009·0 cites·16 claims
- 3547US6645703B2Methods of photo-processing photoresistMICRON TECHNOLOGY INC·Filed 2001·Granted Nov 11, 2003·2 cites·11 claims
- 3647US2006263514A1Device and method for forming improved resist layerSHIRLEY PAUL D·Filed 2006·Application pending·0 cites
- 3744US2005148203A1Method, apparatus, system and computer-readable medium for in situ photoresist thickness characterizationFiled 2003·Application pending·0 cites
- 3843US7846851B2Method and apparatus for a two-step resist soft bake to prevent ILD outgassing during semiconductor processingMICRON TECHNOLOGY INC·Filed 2004·Granted Dec 7, 2010·0 cites·14 claims
- 3943US2004159333A1Spindle chuck cleanerMICRON TECHNOLOGY INC·Filed 2004·Application pending·0 cites
- 4042US2005175775A1Device and method for forming improved resist layerFiled 2004·Application pending·0 cites
- 4137US6171401B1Process liquid dispense apparatusMICRON TECHNOLOGY INC·Filed 1998·Granted Jan 9, 2001·5 cites·8 claims
- 4232US6482552B2Reticle forming methodsMICRON TECHNOLOGY INC·Filed 1999·Granted Nov 19, 2002·3 cites·14 claims
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