Inventor · disambiguated record
Katsuhiko Mitani
Also filed as: MITANI KATSUHIKO
13 granted patents·5 pending applications·656 citations·filing 1988–2006
94Inventor score
Top patents by PatentIndex Score
18 records- 0199US6197151B1Plasma processing apparatus and plasma processing methodHITACHI LTD·Filed 2000·Granted Mar 6, 2001·223 cites·5 claims
- 0296US6245190B1Plasma processing system and plasma processing methodHITACHI LTD·Filed 1998·Granted Jun 12, 2001·194 cites·10 claims
- 0395US6129806APlasma processing apparatus and plasma processing methodHITACHI LTD·Filed 1997·Granted Oct 10, 2000·92 cites·12 claims
- 0488US6902683B1Plasma processing apparatus and plasma processing methodHITACHI LTD·Filed 2000·Granted Jun 7, 2005·29 cites·2 claims
- 0562US4979009AHeterojunction bipolar transistorHITACHI LTD·Filed 1989·Granted Dec 18, 1990·18 cites·7 claims
- 0653US2006144518A1Plasma processing apparatus and plasma processing methodKAJI TETSUNORI·Filed 2006·Application pending·0 cites
- 0749US5381027ASemiconductor device having a heterojunction and a two dimensional gas as an active layerHITACHI LTD·Filed 1993·Granted Jan 10, 1995·18 cites·18 claims
- 0848US5296733AHetero junction bipolar transistor with improved electrode wiring contact regionHITACHI LTD·Filed 1990·Granted Mar 22, 1994·14 cites·27 claims
- 0948US4983532AProcess for fabricating heterojunction bipolar transistorsHITACHI LTD·Filed 1988·Granted Jan 8, 1991·11 cites·14 claims
- 1047US5401357ADry etching methodHITACHI LTD·Filed 1992·Granted Mar 28, 1995·17 cites·20 claims
- 1146US2005082006A1Plasma processing apparatusFiled 2004·Application pending·0 cites
- 1245US5668402ASemiconductor deviceHITACHI LTD·Filed 1993·Granted Sep 16, 1997·15 cites·19 claims
- 1345US2004178180A1Plasma processing apparatusFiled 2004·Application pending·0 cites
- 1443US5258631ASemiconductor device having a two-dimensional electron gas as an active layerHITACHI LTD·Filed 1992·Granted Nov 2, 1993·13 cites·11 claims
- 1542US2002069971A1Plasma processing apparatus and plasma processing methodFiled 2002·Application pending·0 cites
- 1640US2006183057A1Patterning methodMITANI KATSUHIKO·Filed 2005·Application pending·0 cites
- 1738US5019524AMethod of manufacturing a heterojunction bipolar transistorHITACHI LTD·Filed 1989·Granted May 28, 1991·6 cites·32 claims
- 1834US5017517AMethod of fabricating semiconductor device using an Sb protection layerHITACHI LTD·Filed 1990·Granted May 21, 1991·6 cites·23 claims
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