Inventor · disambiguated record
Erik Robert Hosler
Also filed as: HOSLER ERIK R · HOSLER ERIK ROBERT
11 granted patents·4 pending applications·18 citations·filing 2014–2024
84Inventor score
Top patents by PatentIndex Score
15 records- 0184US12022599B2Polarization-multiplexed radiator system, light source system, and method of operationXLIGHT INC·Filed 2023·Granted Jun 25, 2024·1 cites·23 claims
- 0281US9844124B2Method, apparatus and system for using free-electron laser compatible EUV beam for semiconductor wafer metrologyGLOBALFOUNDRIES INC·Filed 2015·Granted Dec 12, 2017·3 cites·20 claims
- 0378US10996564B2Uniformity control of metal-based photoresistsGLOBALFOUNDRIES US INC·Filed 2018·Granted May 4, 2021·4 cites·8 claims
- 0477US9541839B2Method and device for splitting a high-power light beam to provide simultaneous sub-beams to photolithography scannersGLOBALFOUNDRIES INC·Filed 2015·Granted Jan 10, 2017·4 cites·20 claims
- 0576US9754829B2Self-aligned conductive polymer pattern placement error compensation layerGLOBALFOUNDRIES INC·Filed 2015·Granted Sep 5, 2017·3 cites·18 claims
- 0665US9633942B1Conductively doped polymer pattern placement error compensation layerGLOBALFOUNDRIES INC·Filed 2015·Granted Apr 25, 2017·1 cites·17 claims
- 0765US9392679B2Method, apparatus and system for using free-electron laser compatible EUV beam for semiconductor wafer processingGLOBALFOUNDRIES INC·Filed 2014·Granted Jul 12, 2016·2 cites·7 claims
- 0861US2025172753A1Optical solid state device including evanescently coupled optical waveguides in a stitched reticle field and methods of forming the samePSIQUANTUM CORP·Filed 2024·Application pending·0 cites
- 0955US10444645B1Balancing collector contamination of a light source by selective depositionGLOBALFOUNDRIES INC·Filed 2018·Granted Oct 15, 2019·0 cites·20 claims
- 1051US10748671B2Radial lithographic source homogenizerGLOBALFOUNDRIES INC·Filed 2018·Granted Aug 18, 2020·0 cites·20 claims
- 1142US9748176B2Pattern placement error compensation layer in via openingGLOBALFOUNDRIES INC·Filed 2015·Granted Aug 29, 2017·0 cites·18 claims
- 1241US9704807B2Pattern placement error compensation layerGLOBALFOUNDRIES INC·Filed 2015·Granted Jul 11, 2017·0 cites·6 claims
- 1341US2017252785A1In-situ euv collector cleaning utilizing a cryogenic processGLOBALFOUNDRIES INC·Filed 2016·Application pending·0 cites
- 1440US2020018709A1Wafer distortion measurement and overlay correctionGLOBALFOUNDRIES INC·Filed 2018·Application pending·0 cites
- 1532US2017019982A1Method, apparatus and system for providing multiple euv beams for semiconductor processingGLOBALFOUNDRIES INC·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →