Inventor · disambiguated record
Motonari Takebayashi
Also filed as: TAKEBAYASHI MOTONARI
11 granted patents·6 pending applications·51 citations·filing 2003–2023
88Inventor score
Technology areasH10P
Files withHITACHI INT ELECTRIC INC12KOKUSAI ELECTRIC CORP2OGAWA SHIZUE1SAKATA MASAKAZU1TOYODA KAZUYUKI1
Top patents by PatentIndex Score
17 records- 0194US7861668B2Batch-type remote plasma processing apparatusHITACHI INT ELECTRIC INC·Filed 2007·Granted Jan 4, 2011·19 cites·5 claims
- 0289US8020514B2Batch-type remote plasma processing apparatusHITACHI INT ELECTRIC INC·Filed 2009·Granted Sep 20, 2011·9 cites·6 claims
- 0386US8028652B2Batch-type remote plasma processing apparatusHITACHI INT ELECTRIC INC·Filed 2007·Granted Oct 4, 2011·7 cites·18 claims
- 0482US9039912B2Batch-type remote plasma processing apparatusHITACHI INT ELECTRIC INC·Filed 2012·Granted May 26, 2015·3 cites·15 claims
- 0579US8444363B2Substrate processing apparatusSAKATA MASAKAZU·Filed 2009·Granted May 21, 2013·7 cites·5 claims
- 0665US7958842B2Substrate processing apparatusHITACHI INT ELECTRIC INC·Filed 2005·Granted Jun 14, 2011·2 cites·14 claims
- 0763US10604839B2Substrate processing apparatus, method of manufacturing semiconductor device, and method of processing substrateHITACHI INT ELECTRIC INC·Filed 2015·Granted Mar 31, 2020·1 cites·8 claims
- 0863US8518182B2Substrate processing apparatusOGAWA SHIZUE·Filed 2011·Granted Aug 27, 2013·2 cites·5 claims
- 0961US8544411B2Batch-type remote plasma processing apparatusTOYODA KAZUYUKI·Filed 2009·Granted Oct 1, 2013·1 cites·5 claims
- 1059US9373499B2Batch-type remote plasma processing apparatusHITACHI INT ELECTRIC INC·Filed 2015·Granted Jun 21, 2016·0 cites·18 claims
- 1156US2024242983A1Substrate processing apparatus, substrate processing method, method of manufacturing semiconductor device and non-transitory computer-readable recording mediumKOKUSAI ELECTRIC CORP·Filed 2023·Application pending·0 cites
- 1246US2010323507A1Substrate processing apparatus and producing method of deviceHITACHI INT ELECTRIC INC·Filed 2010·Application pending·0 cites
- 1346US2010258530A1Substrate processing apparatus and producing method of deviceHITACHI INT ELECTRIC INC·Filed 2010·Application pending·0 cites
- 1443US2003164143A1Batch-type remote plasma processing apparatusHITACHI INT ELECTRIC INC·Filed 2003·Application pending·0 cites
- 1541US12195853B2Substrate processing apparatus, method of manufacturing semiconductor device, substrate processing method, and recording mediumKOKUSAI ELECTRIC CORP·Filed 2021·Granted Jan 14, 2025·0 cites·19 claims
- 1641US2006260544A1Substrate processing and method of manufacturing deviceHITACHI INT ELECTRIC INC·Filed 2004·Application pending·0 cites
- 1733US2015252474A1Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording mediumHITACHI INT ELECTRIC INC·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →