Inventor · disambiguated record
Benjamin Bierman
Also filed as: BIERMAN BENJAMIN · BIERMAN BENJAMIN B
14 granted patents·2,374 citations·filing 1996–2000
96Inventor score
Files withAPPLIED MATERIALS INC14
Top patents by PatentIndex Score
14 records- 0199US5879128ALift pin and support pin apparatus for a processing chamberAPPLIED MATERIALS INC·Filed 1996·Granted Mar 9, 1999·607 cites·39 claims
- 0298US5781693AGas introduction showerhead for an RTP chamber with upper and lower transparent plates and gas flow therebetweenAPPLIED MATERIALS INC·Filed 1996·Granted Jul 14, 1998·909 cites·28 claims
- 0396US6090210AMulti-zone gas flow control in a process chamberAPPLIED MATERIALS INC·Filed 1996·Granted Jul 18, 2000·234 cites·16 claims
- 0491US6215106B1Thermally processing a substrateAPPLIED MATERIALS INC·Filed 1999·Granted Apr 10, 2001·87 cites·23 claims
- 0590US5960555AMethod and apparatus for purging the back side of a substrate during chemical vapor processingAPPLIED MATERIALS INC·Filed 1997·Granted Oct 5, 1999·92 cites·24 claims
- 0686US6157106AMagnetically-levitated rotor system for an RTP chamberAPPLIED MATERIALS INC·Filed 1997·Granted Dec 5, 2000·79 cites·11 claims
- 0784US5848889ASemiconductor wafer support with graded thermal massAPPLIED MATERIALS INC·Filed 1996·Granted Dec 15, 1998·74 cites·27 claims
- 0883US6395363B1Sloped substrate supportAPPLIED MATERIALS INC·Filed 1996·Granted May 28, 2002·88 cites·18 claims
- 0981US6803546B1Thermally processing a substrateAPPLIED MATERIALS INC·Filed 2000·Granted Oct 12, 2004·25 cites·33 claims
- 1079US5884412AMethod and apparatus for purging the back side of a substrate during chemical vapor processingAPPLIED MATERIALS INC·Filed 1996·Granted Mar 23, 1999·49 cites·24 claims
- 1177US6123766AMethod and apparatus for achieving temperature uniformity of a substrateAPPLIED MATERIALS INC·Filed 1997·Granted Sep 26, 2000·37 cites·15 claims
- 1273US6133152ACo-rotating edge ring extension for use in a semiconductor processing chamberAPPLIED MATERIALS INC·Filed 1997·Granted Oct 17, 2000·43 cites·22 claims
- 1361US5920797AMethod for gaseous substrate supportAPPLIED MATERIALS INC·Filed 1996·Granted Jul 6, 1999·25 cites·22 claims
- 1460US6035100AReflector cover for a semiconductor processing chamberAPPLIED MATERIALS INC·Filed 1997·Granted Mar 7, 2000·25 cites·22 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →