Inventor · disambiguated record
Anthony Yen
Also filed as: YEN ANTHONY
151 granted patents·7 pending applications·2,986 citations·filing 1998–2024
99Inventor score
Files withTAIWAN SEMICONDUCTOR MFG CO LTD87TAIWAN SEMICONDUCTOR MFG48LEE HSIN-CHANG5LU YEN-CHENG3TEXAS INSTRUMENTS INC3
Top patents by PatentIndex Score
158 records- 0199US9869939B2Lithography processTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Jan 16, 2018·145 cites·20 claims
- 0299US9618837B2Extreme ultraviolet lithography process and mask with reduced shadow effect and enhanced intensityTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Apr 11, 2017·129 cites·20 claims
- 0399US8039179B2Integrated circuit layout designTAIWAN SEMICONDUCTOR MFG·Filed 2010·Granted Oct 18, 2011·121 cites·20 claims
- 0498US9869928B2Extreme ultraviolet light (EUV) photomasks, and fabrication methods thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Jan 16, 2018·128 cites·20 claims
- 0598US9823585B2EUV focus monitoring systems and methodsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Nov 21, 2017·28 cites·20 claims
- 0698US9256123B2Method of making an extreme ultraviolet pellicleTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Feb 9, 2016·365 cites·20 claims
- 0798US8841047B2Extreme ultraviolet lithography process and maskYU SHINN-SHENG·Filed 2012·Granted Sep 23, 2014·326 cites·20 claims
- 0898US8828625B2Extreme ultraviolet lithography mask and multilayer deposition method for fabricating sameLU YEN-CHENG·Filed 2012·Granted Sep 9, 2014·301 cites·20 claims
- 0998US8785084B2Method for mask fabrication and repairLU YEN-CHENG·Filed 2012·Granted Jul 22, 2014·84 cites·20 claims
- 1098US8709682B2Mask and method for forming the maskCHEN CHIA-JEN·Filed 2012·Granted Apr 29, 2014·82 cites·20 claims
- 1198US8679707B2Method of fabricating a lithography maskLEE HSIN-CHANG·Filed 2012·Granted Mar 25, 2014·86 cites·20 claims
- 1298US8628897B1Extreme ultraviolet lithography process and maskLU YEN-CHENG·Filed 2012·Granted Jan 14, 2014·97 cites·20 claims
- 1398US7862962B2Integrated circuit layout designTAIWAN SEMICONDUCTOR MFG·Filed 2009·Granted Jan 4, 2011·46 cites·20 claims
- 1497US10459352B2Mask cleaningTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Oct 29, 2019·10 cites·20 claims
- 1597US8877409B2Reflective mask and method of making sameHSU PEI-CHENG·Filed 2012·Granted Nov 4, 2014·324 cites·20 claims
- 1697US8791024B1Method to define multiple layer patterns using a single exposureTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Jul 29, 2014·31 cites·27 claims
- 1797US7989355B2Method of pitch halvingTAIWAN SEMICONDUCTOR MFG·Filed 2009·Granted Aug 2, 2011·58 cites·20 claims
- 1896US9488905B2Extreme ultraviolet lithography process and mask with reduced shadow effect and enhanced intensityTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Nov 8, 2016·6 cites·20 claims
- 1995US10001701B1Pellicle structures and methods of fabricating thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Jun 19, 2018·7 cites·20 claims
- 2095US9678431B2EUV lithography system and method with optimized throughput and stabilityTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Jun 13, 2017·6 cites·20 claims
- 2195US9360749B2Pellicle structure and method for forming the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Jun 7, 2016·10 cites·21 claims
- 2294US10162258B2Pellicle fabrication methods and structures thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Dec 25, 2018·8 cites·20 claims
- 2394US9075313B2Multiple exposures in extreme ultraviolet lithographyTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Jul 7, 2015·9 cites·20 claims
- 2494US8765330B2Phase shift mask for extreme ultraviolet lithography and method of fabricating sameSHIH CHIA-TSUNG·Filed 2012·Granted Jul 1, 2014·85 cites·20 claims
- 2593US8241823B2Method of fabrication of a semiconductor device having reduced pitchSHIEH MING-FENG·Filed 2011·Granted Aug 14, 2012·11 cites·20 claims
- 2693US6492073B1Removal of line end shortening in microlithography and mask set for removalTAIWAN SEMICONDUCTOR MFG·Filed 2001·Granted Dec 10, 2002·59 cites·20 claims
- 2792US9244341B2Photomask and method for forming the sameTAIWAN SEMICONDUCTOR MFG·Filed 2015·Granted Jan 26, 2016·4 cites·20 claims
- 2892US8589828B2Reduce mask overlay error by removing film deposited on blank of maskLEE HSIN-CHANG·Filed 2012·Granted Nov 19, 2013·29 cites·20 claims
- 2991US10718718B2EUV vessel inspection method and related systemTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Jul 21, 2020·4 cites·20 claims
- 3091US9213232B2Reflective mask and method of making sameTAIWAN SEMICONDUCTOR MFG·Filed 2014·Granted Dec 15, 2015·5 cites·20 claims
- 3190US10459353B2Lithography system with an embedded cleaning moduleTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Oct 29, 2019·5 cites·20 claims
- 3290US10031411B2Pellicle for EUV mask and fabrication thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Jul 24, 2018·3 cites·20 claims
- 3390US9261774B2Extreme ultraviolet lithography process and mask with reduced shadow effect and enhanced intensityTAIWAN SEMICONDUCTOR MFG·Filed 2014·Granted Feb 16, 2016·4 cites·20 claims
- 3490US9081312B2Method to define multiple layer patterns with a single exposure by E-beam lithographyTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Jul 14, 2015·7 cites·22 claims
- 3589US10276372B2Method for integrated circuit patterningTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Apr 30, 2019·4 cites·20 claims
- 3688US9664999B2Method of making an extreme ultraviolet pellicleTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted May 30, 2017·2 cites·20 claims
- 3787US10429314B2EUV vessel inspection method and related systemTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Oct 1, 2019·3 cites·20 claims
- 3887US10162257B2Extreme ultraviolet lithography system, device, and method for printing low pattern density featuresTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Dec 25, 2018·2 cites·20 claims
- 3987US8916482B2Method of making a lithography maskLEE HSIN-CHANG·Filed 2012·Granted Dec 23, 2014·5 cites·12 claims
- 4086US10036951B2Pellicle assembly and fabrication methods thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Jul 31, 2018·3 cites·18 claims
- 4186US9964850B2Method to mitigate defect printability for ID patternTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted May 8, 2018·3 cites·20 claims
- 4286US9535334B2Extreme ultraviolet lithography process to print low pattern density featuresTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Jan 3, 2017·4 cites·19 claims
- 4385US10007174B2Extreme ultraviolet lithography process and maskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Jun 26, 2018·2 cites·20 claims
- 4485US9535317B2Treating a capping layer of a maskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Jan 3, 2017·4 cites·20 claims
- 4584US9690186B2Extreme ultraviolet lithography process and maskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Jun 27, 2017·2 cites·20 claims
- 4684US9588419B2Extreme ultraviolet light (EUV) photomasks and fabrication methods thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Mar 7, 2017·2 cites·20 claims
- 4784US9316900B2Extreme ultraviolet lithography process and maskTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Apr 19, 2016·3 cites·22 claims
- 4883US11921434B2Mask cleaningTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Mar 5, 2024·0 cites·20 claims
- 4983US9442384B2Extreme ultraviolet lithography process and maskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Sep 13, 2016·3 cites·20 claims
- 5083US9134604B2Extreme ultraviolet (EUV) mask and method of fabricating the EUV maskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2013·Granted Sep 15, 2015·3 cites·20 claims
Showing the top 50 of 158 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →