Inventor · disambiguated record
Katsumi Okashita
Also filed as: OKASHITA KATSUMI
32 granted patents·23 pending applications·216 citations·filing 2004–2020
97Inventor score
Files withPANASONIC CORP20SASAKI YUICHIRO13MATSUSHITA ELECTRIC INDUSTRIAL CO LTD9OKUMURA TOMOHIRO7SUMITOMO RIKO CO LTD4
Top patents by PatentIndex Score
55 records- 0195US7601619B2Method and apparatus for plasma processingPANASONIC CORP·Filed 2006·Granted Oct 13, 2009·32 cites·23 claims
- 0294US7358511B2Plasma doping method and plasma doping apparatusMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2007·Granted Apr 15, 2008·22 cites·19 claims
- 0394US7348264B2Plasma doping methodMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2007·Granted Mar 25, 2008·20 cites·12 claims
- 0493US7407874B2Plasma doping methodMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2006·Granted Aug 5, 2008·18 cites·16 claims
- 0589US7456085B2Method for introducing impuritiesPANASONIC CORP·Filed 2005·Granted Nov 25, 2008·14 cites·10 claims
- 0687US8409939B2Semiconductor device and method for fabricating the sameSASAKI YUICHIRO·Filed 2010·Granted Apr 2, 2013·7 cites·11 claims
- 0786US8536000B2Method for producing a semiconductor device have fin-shaped semiconductor regionsSASAKI YUICHIRO·Filed 2011·Granted Sep 17, 2013·8 cites·14 claims
- 0886US8004045B2Semiconductor device and method for producing the samePANASONIC CORP·Filed 2009·Granted Aug 23, 2011·11 cites·14 claims
- 0982US7800165B2Semiconductor device and method for producing the samePANASONIC CORP·Filed 2008·Granted Sep 21, 2010·7 cites·19 claims
- 1082US7754503B2Method for producing semiconductor device and semiconductor producing apparatusPANASONIC CORP·Filed 2008·Granted Jul 13, 2010·7 cites·22 claims
- 1181US8124507B2Semiconductor device and method for fabricating the sameSASAKI YUICHIRO·Filed 2010·Granted Feb 28, 2012·5 cites·9 claims
- 1281US8063437B2Semiconductor device and method for producing the sameSASAKI YUICHIRO·Filed 2008·Granted Nov 22, 2011·8 cites·22 claims
- 1380US7790586B2Plasma doping methodPANASONIC CORP·Filed 2007·Granted Sep 7, 2010·6 cites·22 claims
- 1479US8193080B2Method for fabricating semiconductor device and plasma doping systemSASAKI YUICHIRO·Filed 2010·Granted Jun 5, 2012·4 cites·19 claims
- 1579US7759254B2Method for forming impurity-introduced layer, method for cleaning object to be processed apparatus for introducing impurity and method for producing devicePANASONIC CORP·Filed 2004·Granted Jul 20, 2010·21 cites·24 claims
- 1674US7972945B2Plasma doping apparatus and method, and method for manufacturing semiconductor devicePANASONIC CORP·Filed 2008·Granted Jul 5, 2011·4 cites·12 claims
- 1774US7858155B2Plasma processing method and plasma processing apparatusPANASONIC CORP·Filed 2005·Granted Dec 28, 2010·4 cites·33 claims
- 1874US7582492B2Method of doping impurities, and electronic element using the samePANASONIC CORP·Filed 2005·Granted Sep 1, 2009·4 cites·10 claims
- 1970US8258585B2Semiconductor deviceSASAKI YUICHIRO·Filed 2009·Granted Sep 4, 2012·4 cites·45 claims
- 2068US8030187B2Method for manufacturing semiconductor devicePANASONIC CORP·Filed 2008·Granted Oct 4, 2011·2 cites·7 claims
- 2167US7939388B2Plasma doping method and plasma doping apparatusPANASONIC CORP·Filed 2007·Granted May 10, 2011·2 cites·32 claims
- 2266US9164467B2Blade member and cleaning bladeSUMITOMO RIKO CO LTD·Filed 2015·Granted Oct 20, 2015·1 cites·18 claims
- 2366US7858479B2Method and apparatus of fabricating semiconductor devicePANASONIC CORP·Filed 2005·Granted Dec 28, 2010·2 cites·6 claims
- 2465US8129202B2Plasma doping method and apparatusOKUMURA TOMOHIRO·Filed 2009·Granted Mar 6, 2012·1 cites·21 claims
- 2562US8105926B2Method for producing a semiconductor device by plasma doping a semiconductor region to form an impurity regionSASAKI YUICHIRO·Filed 2010·Granted Jan 31, 2012·1 cites·12 claims
- 2662US7871853B2Plasma doping method and apparatus employed in the samePANASONIC CORP·Filed 2006·Granted Jan 18, 2011·1 cites·15 claims
- 2757US11548194B2Method for manufacturing fluid device composite memberSUMITOMO RIKO CO LTD·Filed 2020·Granted Jan 10, 2023·0 cites·9 claims
- 2856US11752501B2Silicone member and micro deviceSUMITOMO RIKO CO LTD·Filed 2020·Granted Sep 12, 2023·0 cites·6 claims
- 2956US2008233723A1Plasma doping method and apparatusMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2008·Application pending·0 cites
- 3056US2008318399A1Plasma doping methodMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2008·Application pending·0 cites
- 3154US2007176124A1Plasma doping method and plasma doping apparatusMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2007·Application pending·0 cites
- 3254US2009266298A1Plasma doping apparatusOKASHITA KATSUMI·Filed 2009·Application pending·0 cites
- 3354US2013337641A1Plasma doping method and apparatusPANASONIC CORP·Filed 2013·Application pending·0 cites
- 3453US2007111548A1Plasma doping method and plasma doping apparatusMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2006·Application pending·0 cites
- 3552US2009042321A1Apparatus and method for plasma dopingMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2008·Application pending·0 cites
- 3651US2008308871A1Semiconductor device and method for producing the sameMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2008·Application pending·0 cites
- 3751US2013175586A1Semiconductor devicePANASONIC CORP·Filed 2013·Application pending·0 cites
- 3851US2012186519A1Plasma doping method and apparatusOKUMURA TOMOHIRO·Filed 2012·Application pending·0 cites
- 3951US2013323916A1Plasma doping method and apparatusPANASONIC CORP·Filed 2012·Application pending·0 cites
- 4051US2009233383A1Plasma Doping Method and ApparatusOKUMURA TOMOHIRO·Filed 2006·Application pending·0 cites
- 4150US8652953B2Plasma doping method with gate shutterOKUMURA TOMOHIRO·Filed 2012·Granted Feb 18, 2014·0 cites·8 claims
- 4250US8257501B2Plasma doping device with gate shutterOKUMURA TOMOHIRO·Filed 2006·Granted Sep 4, 2012·0 cites·4 claims
- 4350US8012862B2Method for manufacturing semiconductor device using plasma dopingPANASONIC CORP·Filed 2008·Granted Sep 6, 2011·0 cites·12 claims
- 4450US2011217830A1Plasma doping method and apparatusPANASONIC CORP·Filed 2011·Application pending·0 cites
- 4549US2009181526A1Plasma Doping Method and ApparatusOKUMURA TOMOHIRO·Filed 2006·Application pending·0 cites
- 4648US7820230B2Plasma doping processing device and method thereofPANASONIC CORP·Filed 2008·Granted Oct 26, 2010·0 cites·24 claims
- 4748US2010015788A1Method for manufacturing semiconductor deviceSASAKI YUICHIRO·Filed 2008·Application pending·0 cites
- 4848US2009130335A1Plasma processing apparatus, plasma processing method, dielectric window used therein, and manufacturing method of such a dielectric windowOKUMURA TOMOHIRO·Filed 2006·Application pending·0 cites
- 4946US2012119295A1Semiconductor device and method for fabricating the sameSASAKI YUICHIRO·Filed 2012·Application pending·0 cites
- 5045US2011272763A1Semiconductor device and method for fabricating the sameSASAKI YUICHIRO·Filed 2009·Application pending·0 cites
Showing the top 50 of 55 patent records by PatentIndex Score.
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