Inventor · disambiguated record
Tetsuo Ono
Also filed as: ONO TETSUO
64 granted patents·16 pending applications·1,429 citations·filing 1983–2024
99Inventor score
Files withHITACHI LTD27HITACHI HIGH TECH CORP26MITSUBISHI HEAVY IND LTD6CENTRAL RES INST ELECT4INOUE YOSHIHARU2
Top patents by PatentIndex Score
80 records- 0197US5110407ASurface fabricating deviceHITACHI LTD·Filed 1991·Granted May 5, 1992·521 cites·51 claims
- 0297US5074760AScroll type compressorMITSUBISHI HEAVY IND LTD·Filed 1989·Granted Dec 24, 1991·110 cites·5 claims
- 0395US10600619B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2016·Granted Mar 24, 2020·11 cites·3 claims
- 0495US8889024B2Plasma etching methodHITACHI HIGH TECH CORP·Filed 2014·Granted Nov 18, 2014·17 cites·6 claims
- 0593US9349603B2Plasma processing methodHITACHI HIGH TECH CORP·Filed 2014·Granted May 24, 2016·11 cites·7 claims
- 0692US5074761ARotary compressorMITSUBISHI HEAVY IND LTD·Filed 1991·Granted Dec 24, 1991·59 cites·9 claims
- 0791US9305803B2Plasma processing apparatus and plasma processing methodMORIMOTO MICHIKAZU·Filed 2011·Granted Apr 5, 2016·23 cites·8 claims
- 0891US8828254B2Plasma processing methodINOUE YOSHIHARU·Filed 2012·Granted Sep 9, 2014·11 cites·5 claims
- 0991US5895586APlasma processing apparatus and plasma processing method in which a part of the processing chamber is formed using a pre-fluorinated material of aluminumHITACHI LTD·Filed 1995·Granted Apr 20, 1999·74 cites·5 claims
- 1091US5891252APlasma processing apparatusHITACHI LTD·Filed 1996·Granted Apr 6, 1999·60 cites·30 claims
- 1189US4886425ACapacity control device of scroll-type fluid compressorMITSUBISHI HEAVY IND LTD·Filed 1988·Granted Dec 12, 1989·50 cites·5 claims
- 1286US10090162B2Plasma processing method and plasma processing deviceHITACHI HIGH TECH CORP·Filed 2016·Granted Oct 2, 2018·3 cites·9 claims
- 1386US8969211B2Method and apparatus for plasma processingHITACHI HIGH TECH CORP·Filed 2013·Granted Mar 3, 2015·8 cites·10 claims
- 1486US7259866B2Semiconductor fabricating apparatus with function of determining etching processing stateHITACHI HIGH TECH CORP·Filed 2005·Granted Aug 21, 2007·9 cites·4 claims
- 1586US6759253B2Process monitoring methods in a plasma processing apparatus, monitoring units, and a sample processing method using the monitoring unitsHITACHI LTD·Filed 2001·Granted Jul 6, 2004·27 cites·33 claims
- 1686US6033481APlasma processing apparatusHITACHI LTD·Filed 1999·Granted Mar 7, 2000·41 cites·23 claims
- 1786US4933602AApparatus for generating light by utilizing microwaveHITACHI LTD·Filed 1988·Granted Jun 12, 1990·35 cites·13 claims
- 1883US12094687B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2021·Granted Sep 17, 2024·1 cites·13 claims
- 1983US10121640B2Method and apparatus for plasma processingHITACHI HIGH TECH CORP·Filed 2015·Granted Nov 6, 2018·4 cites·11 claims
- 2082US5034655ACircular fluorescent lampHITACHI LTD·Filed 1989·Granted Jul 23, 1991·30 cites·21 claims
- 2181US2025118566A1Plasma processing method and plasma processing deviceHITACHI HIGH TECH CORP·Filed 2024·Application pending·0 cites
- 2280US9514967B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2013·Granted Dec 6, 2016·4 cites·5 claims
- 2380US6677244B2Specimen surface processing methodHITACHI LTD·Filed 2002·Granted Jan 13, 2004·18 cites·4 claims
- 2476US4879493ALow-pressure discharge lampHITACHI LTD·Filed 1987·Granted Nov 7, 1989·22 cites·18 claims
- 2574US7601241B2Plasma processing apparatus and plasma processing methodHITACHI LTD·Filed 2004·Granted Oct 13, 2009·9 cites·11 claims
- 2673US6488722B1Method and apparatus for spheroidizing particlesCENTRAL RES INST ELECT·Filed 2000·Granted Dec 3, 2002·6 cites·1 claims
- 2772US8365993B2Self scanning systemTERAOKA SEIKO KK·Filed 2007·Granted Feb 5, 2013·5 cites·4 claims
- 2871US6767838B1Method and apparatus for treating surface of semiconductorHITACHI LTD·Filed 2000·Granted Jul 27, 2004·11 cites·9 claims
- 2970US7611993B2Plasma processing method and plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2007·Granted Nov 3, 2009·2 cites·2 claims
- 3070US6700090B2Plasma processing method and plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2002·Granted Mar 2, 2004·9 cites·14 claims
- 3169US11658011B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2020·Granted May 23, 2023·0 cites·3 claims
- 3269US6972848B2Semiconductor fabricating apparatus with function of determining etching processing stateHITACH HIGH TECHNOLOGIES CORP·Filed 2003·Granted Dec 6, 2005·11 cites·5 claims
- 3367US8801951B2Plasma processing methodINOUE YOSHIHARU·Filed 2011·Granted Aug 12, 2014·2 cites·8 claims
- 3467US6660647B1Method for processing surface of sampleHITACHI LTD·Filed 1999·Granted Dec 9, 2003·28 cites·14 claims
- 3566US8501608B2Method for processing semiconductor deviceONO TETSUO·Filed 2010·Granted Aug 6, 2013·2 cites·9 claims
- 3665US7771607B2Plasma processing apparatus and plasma processing methodHITACHI LTD·Filed 2007·Granted Aug 10, 2010·1 cites·1 claims
- 3765US6849191B2Method and apparatus for treating surface of semiconductorHITACHI LTD·Filed 1999·Granted Feb 1, 2005·24 cites·6 claims
- 3864US6083286AHigh-concentration coal/water mixture fuel and process for production thereofCENTRAL RES INST ELECT·Filed 1996·Granted Jul 4, 2000·15 cites·7 claims
- 3964US5505778ASurface treating apparatus, surface treating method and semiconductor device manufacturing methodHITACHI LTD·Filed 1991·Granted Apr 9, 1996·24 cites·73 claims
- 4064US5012984AProcess for production of coal-water mixtureCENTRAL RES INST ELECT·Filed 1990·Granted May 7, 1991·20 cites·3 claims
- 4163US6967109B2Process monitoring methods in a plasma processing apparatus, monitoring units, and a sample processing method using the monitoring unitsHITACHI LTD·Filed 2004·Granted Nov 22, 2005·6 cites·6 claims
- 4259US8440513B2Method of semiconductor processingONO TETSUO·Filed 2008·Granted May 14, 2013·1 cites·5 claims
- 4357US2018366335A1Plasma processing method and plasma processing deviceHITACHI HIGH TECH CORP·Filed 2018·Application pending·0 cites
- 4456US6888094B2Plasma processing method and plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2004·Granted May 3, 2005·3 cites·1 claims
- 4556US5462635ASurface processing method and an apparatus for carrying out the sameHITACHI LTD·Filed 1994·Granted Oct 31, 1995·24 cites·3 claims
- 4654US8741166B2Plasma etching methodHITACHI HIGH TECH CORP·Filed 2012·Granted Jun 3, 2014·0 cites·6 claims
- 4754US8071397B2Semiconductor fabricating apparatus with function of determining etching processing stateUSUI TATEHITO·Filed 2007·Granted Dec 6, 2011·0 cites·7 claims
- 4854US4666380AScroll type fluid machine with prevention of stress concentrationMITSUBISHI HEAVY IND LTD·Filed 1985·Granted May 19, 1987·16 cites·5 claims
- 4953US4642512AStain resistant fluorescent lampHITACHI LTD·Filed 1984·Granted Feb 10, 1987·6 cites·8 claims
- 5052US4611148ALow-pressure mercury vapor discharge lampHITACHI LTD·Filed 1984·Granted Sep 9, 1986·5 cites·9 claims
Showing the top 50 of 80 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →