Inventor · disambiguated record
Yukinobu Yoshizaki
Also filed as: YOSHIZAKI YUKINOBU
20 granted patents·9 pending applications·14 citations·filing 2012–2025
90Inventor score
Files withFUJIMI INC29
Top patents by PatentIndex Score
29 records- 0178US10876082B2Surface treatment composition, method for producing surface treatment composition, surface treatment method, and method for producing semiconductor substrateFUJIMI INC·Filed 2018·Granted Dec 29, 2020·2 cites·14 claims
- 0278US9390938B2Polishing compositionFUJIMI INC·Filed 2016·Granted Jul 12, 2016·2 cites·9 claims
- 0375US10478939B2Polishing methodFUJIMI INC·Filed 2016·Granted Nov 19, 2019·2 cites·6 claims
- 0473US10851267B2Polishing compositionFUJIMI INC·Filed 2019·Granted Dec 1, 2020·2 cites·14 claims
- 0571US10703936B2Polishing compositionFUJIMI INC·Filed 2017·Granted Jul 7, 2020·2 cites·11 claims
- 0670US2024018390A1Polishing compositionFUJIMI INC·Filed 2023·Application pending·0 cites
- 0767US10138396B2Polishing compositionFUJIMI INC·Filed 2016·Granted Nov 27, 2018·1 cites·7 claims
- 0866US11447660B2Polishing compositionFUJIMI INC·Filed 2020·Granted Sep 20, 2022·0 cites·6 claims
- 0966US10414019B2Polishing compositionFUJIMI INC·Filed 2016·Granted Sep 17, 2019·1 cites·11 claims
- 1064US9631121B2Polishing compositionFUJIMI INC·Filed 2013·Granted Apr 25, 2017·1 cites·8 claims
- 1163US10144907B2Polishing compositionFUJIMI INC·Filed 2015·Granted Dec 4, 2018·1 cites·12 claims
- 1261US2022089907A1Polishing compositionFUJIMI INC·Filed 2021·Application pending·0 cites
- 1360US12269970B2Polishing composition, polishing method and method for producing semiconductor substrateFUJIMI INC·Filed 2022·Granted Apr 8, 2025·0 cites·12 claims
- 1457US11384256B2Polishing method and method for manufacturing semiconductor substrateFUJIMI INC·Filed 2021·Granted Jul 12, 2022·0 cites·17 claims
- 1554US2025304829A1Method for producing polishing composition and method for producing rinse compositionFUJIMI INC·Filed 2025·Application pending·0 cites
- 1651US11518911B2Polishing composition, manufacturing method of polishing composition, polishing method, and manufacturing method of semiconductor substrateFUJIMI INC·Filed 2019·Granted Dec 6, 2022·0 cites·13 claims
- 1751US10907073B2Polishing compositionFUJIMI INC·Filed 2017·Granted Feb 2, 2021·0 cites·7 claims
- 1850US2015218709A1Polishing compositionFUJIMI INC·Filed 2013·Application pending·0 cites
- 1947US11492512B2Polishing composition and polishing methodFUJIMI INC·Filed 2020·Granted Nov 8, 2022·0 cites·14 claims
- 2047US2022098441A1Polishing composition, method for producing the same, polishing method, and method for producing substrateFUJIMI INC·Filed 2021·Application pending·0 cites
- 2147US2016108284A1Polishing compositionFUJIMI INC·Filed 2014·Application pending·0 cites
- 2246US2014242798A1Polishing compositionFUJIMI INC·Filed 2012·Application pending·0 cites
- 2345US10781342B2Polishing compositionFUJIMI INC·Filed 2016·Granted Sep 22, 2020·0 cites·12 claims
- 2442US11028340B2Composition for surface treatment, method for producing the same, surface treatment method using composition for surface treatment, and method for producing semiconductor substrateFUJIMI INC·Filed 2018·Granted Jun 8, 2021·0 cites·21 claims
- 2541US11377627B2Composition for surface treatment, method for producing the same, and surface treatment method using the sameFUJIMI INC·Filed 2018·Granted Jul 5, 2022·0 cites·18 claims
- 2639US10858615B2Surface treatment composition, preparation method thereof, surface treatment method using the sameFUJIMI INC·Filed 2018·Granted Dec 8, 2020·0 cites·20 claims
- 2739US2020017719A1Composition for surface treatment, method for producing the same, surface treatment method using composition for surface treatment, and method for producing semiconductor substrateFUJIMI INC·Filed 2018·Application pending·0 cites
- 2836US11643573B2Polishing composition, production method therefor, and polishing method and production method for substrate, using polishing compositionFUJIMI INC·Filed 2018·Granted May 9, 2023·0 cites·20 claims
- 2934US2019300821A1Surface treatment compositionFUJIMI INC·Filed 2017·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →