Inventor · disambiguated record
Jin-Hwa Heo
Also filed as: HEO JIN-HWA
12 granted patents·6 pending applications·333 citations·filing 2001–2016
92Inventor score
Files withSAMSUNG ELECTRONICS CO LTD14HEO JIN-HWA1KIM CHUL-SUNG1LEE JONG-HYUN1POSTECH ACAD IND FOUND1
Top patents by PatentIndex Score
18 records- 0194US7535061B2Fin-field effect transistors (Fin-FETs) having protection layersSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted May 19, 2009·23 cites·15 claims
- 0294US6566229B2Method of forming an insulating layer in a trench isolation type semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2001·Granted May 20, 2003·102 cites·14 claims
- 0390US6756654B2Structure of trench isolation and a method of forming the sameSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Jun 29, 2004·57 cites·13 claims
- 0489US6683354B2Semiconductor device having trench isolation layer and a method of forming the sameSAMSUNG ELECTRONICS CO LTD·Filed 2001·Granted Jan 27, 2004·51 cites·22 claims
- 0583US7160787B2Structure of trench isolation and a method of forming the sameSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Jan 9, 2007·31 cites·22 claims
- 0677US7141456B2Methods of fabricating Fin-field effect transistors (Fin-FETs) having protection layersSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Nov 28, 2006·16 cites·13 claims
- 0777US6593207B2Method of forming a trench device isolation structure with upper liner patternSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Jul 15, 2003·25 cites·23 claims
- 0871US8008154B2Methods of forming impurity containing insulating films and flash memory devices including the sameSAMSUNG ELECTRONICS CO LTD·Filed 2008·Granted Aug 30, 2011·3 cites·21 claims
- 0970US6740955B1Trench device isolation structureSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted May 25, 2004·16 cites·11 claims
- 1062US7351661B2Semiconductor device having trench isolation layer and a method of forming the sameSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Apr 1, 2008·9 cites·9 claims
- 1159US2015191818A1Vertical furnaceSAMSUNG ELECTRONICS CO LTD·Filed 2014·Application pending·0 cites
- 1251US10053589B2Surface treatment compositon for forming self-assembled coating capable of being easily coated, removed or recoatedPOSTECH ACAD IND FOUND·Filed 2015·Granted Aug 21, 2018·0 cites·9 claims
- 1349US2009020805A1Non-volatile memory devices and methods of forming the sameSAMSUNG ELECTRONICS CO LTD·Filed 2007·Application pending·0 cites
- 1447US2009203190A1Method of forming a mask stack pattern and method of manufacturing a flash memory device including an active area having rounded cornersSAMSUNG ELECTRONICS CO LTD·Filed 2009·Application pending·0 cites
- 1545US2008032512A1Method forming silicon oxynitride gate dielectric layer with uniform nitrogen concentrationSAMSUNG ELECTRONICS CO LTD·Filed 2007·Application pending·0 cites
- 1640US2016358751A1Arc discharge apparatus and plasma processing system including the sameLEE JONG-HYUN·Filed 2016·Application pending·0 cites
- 1739US8525275B2Methods of forming non-volatile memory devicesHEO JIN-HWA·Filed 2010·Granted Sep 3, 2013·0 cites·3 claims
- 1839US2005285162A1Semiconductor devices having a stacked structure and methods of forming the sameKIM CHUL-SUNG·Filed 2005·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →