Inventor · disambiguated record
Katsuhiro Takushima
Also filed as: TAKUSHIMA KATSUHIRO
6 granted patents·3 pending applications·12 citations·filing 2000–2012
78Inventor score
Top patents by PatentIndex Score
9 records- 0178US7585418B2Lithographic mask and manufacturing method thereofHOYA CORP·Filed 2005·Granted Sep 8, 2009·4 cites·25 claims
- 0276US8535856B2Lithographic mask and manufacturing method thereofMORI JUNJI·Filed 2012·Granted Sep 17, 2013·2 cites·25 claims
- 0369US8263294B2Lithographic mask and manufacturing method thereofMORI JUNJI·Filed 2009·Granted Sep 11, 2012·2 cites·9 claims
- 0459US8067132B2Photomask and exposure methodTAKUSHIMA KATSUHIRO·Filed 2007·Granted Nov 29, 2011·2 cites·11 claims
- 0550US2008271752A1Cleaning method, particle removing method, cleaning apparatus, and cleaning liquidHOYA CORP·Filed 2008·Application pending·0 cites
- 0644US6800214B2Method for correcting characteristics of attenuated phase-shift maskOKI ELECTRIC IND CO LTD·Filed 2002·Granted Oct 5, 2004·1 cites·6 claims
- 0743US6508949B1Method for correcting characteristics of attenuated phase-shift maskOKI ELECTRIC IND CO LTD·Filed 2000·Granted Jan 21, 2003·1 cites·4 claims
- 0839US2006151008A1Cleaning method, method for removing foreign particle, cleaning apparatus, and cleaning liquidHOYA CORP·Filed 2004·Application pending·0 cites
- 0938US2004229137A1Method for correcting characteristics of attenuated phase-shift maskFiled 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →