Inventor · disambiguated record
Jens Ossmann
Also filed as: OSSMANN JENS
11 granted patents·6 pending applications·38 citations·filing 2007–2014
86Inventor score
Top patents by PatentIndex Score
17 records- 0192US8587767B2Illumination optics for EUV microlithography and related system and apparatusFIOLKA DAMIAN·Filed 2010·Granted Nov 19, 2013·12 cites·22 claims
- 0286US7626770B2Illumination system with zoom objectiveZEISS CARL SMT AG·Filed 2007·Granted Dec 1, 2009·9 cites·32 claims
- 0379US8253925B2Catoptric illumination system for microlithography toolOSSMANN JENS·Filed 2009·Granted Aug 28, 2012·5 cites·24 claims
- 0476US9310692B2Component for setting a scan-integrated illumination energy in an object plane of a microlithography projection exposure apparatusSTUETZLE RALF·Filed 2010·Granted Apr 12, 2016·3 cites·35 claims
- 0573US8174677B2Illumination optical system for microlithographyOSSMANN JENS·Filed 2008·Granted May 8, 2012·4 cites·20 claims
- 0671US8937708B2Illumination optics for microlithographyENDRES MARTIN·Filed 2010·Granted Jan 20, 2015·2 cites·30 claims
- 0766US9110378B2Illumination optical system for projection lithographyZEISS CARL SMT GMBH·Filed 2013·Granted Aug 18, 2015·1 cites·24 claims
- 0860US7586113B2EUV illumination systemZEISS CARL SMT AG·Filed 2007·Granted Sep 8, 2009·2 cites·20 claims
- 0957US9671608B2Illumination system for EUV lithographyZEISS CARL SMT GMBH·Filed 2014·Granted Jun 6, 2017·0 cites·31 claims
- 1054US8227770B2EUV illumination systemENDRES MARTIN·Filed 2009·Granted Jul 24, 2012·0 cites·26 claims
- 1153US2009041182A1Illumination system for euv lithographyZEISS CARL SMT AG·Filed 2008·Application pending·0 cites
- 1252US9588434B2Catoptric illumination system for microlithography toolOSSMANN JENS·Filed 2012·Granted Mar 7, 2017·0 cites·25 claims
- 1345US2008259303A1Projection exposure apparatus for microlithographyZEISS CARL SMT AG·Filed 2008·Application pending·0 cites
- 1445US2009251677A1Illuminating optical unit and projection exposure apparatus for microlithographyZEISS CARL SMT AG·Filed 2009·Application pending·0 cites
- 1544US2008278704A1ILLUMINATION SYSTEM FOR A PROJECTION EXPOSURE APPARATUS WITH WAVELENGTHS LESS THAN OR EQUAL TO 193 nmZEISS CARL SMT AG·Filed 2007·Application pending·0 cites
- 1643US2008049206A1Illumination system with a detector for registering a light intensityZEISS CARL SMT AG·Filed 2007·Application pending·0 cites
- 1736US2011235015A1Illumination optics for euv microlithographyCarl Zeiss GmbH·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →