Inventor · disambiguated record
Shigeru Yokoi
Also filed as: YOKOI SHIGERU
20 granted patents·34 pending applications·100 citations·filing 1989–2013
93Inventor score
Files withYOKOI SHIGERU21TOKYO OHKA KOGYO CO LTD9HARAGUCHI TAKAYUKI4WAKIYA KAZUMASA3MITSUBISHI ELECTRIC CORP2
Top patents by PatentIndex Score
54 records- 0186USD654518SLaser beam machineMIYAKE TAKANORI·Filed 2011·Granted Feb 21, 2012·37 cites·1 claims
- 0283US8697345B2Photoresist stripping solution and a method of stripping photoresists using the sameWAKIYA KAZUMASA·Filed 2010·Granted Apr 15, 2014·6 cites·10 claims
- 0379US8212176B2Machining head, nozzle changer and laser beam machining apparatusAKIYAMA TAKASHI·Filed 2007·Granted Jul 3, 2012·11 cites·13 claims
- 0475US8192923B2Photoresist stripping solution and a method of stripping photoresists using the sameYOKOI SHIGERU·Filed 2007·Granted Jun 5, 2012·3 cites·12 claims
- 0574US8158568B2Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewithYOKOI SHIGERU·Filed 2010·Granted Apr 17, 2012·1 cites·9 claims
- 0673US8354215B2Method for stripping photoresistTOKYO OHKA KOGYO CO LTD·Filed 2010·Granted Jan 15, 2013·1 cites·5 claims
- 0772US8685910B2Cleaning liquid used in photolithography and a method for treating substrate therewithYOKOI SHIGERU·Filed 2010·Granted Apr 1, 2014·1 cites·10 claims
- 0868US7442675B2Cleaning composition and method of cleaning semiconductor substrateTOKYO OHKA KOGYO CO LTD·Filed 2004·Granted Oct 28, 2008·12 cites·6 claims
- 0967US8114825B2Photoresist stripping solutionYOKOI SHIGERU·Filed 2009·Granted Feb 14, 2012·1 cites·9 claims
- 1066US9352542B2Processing method and processing apparatusTOKYO OHKA KOGYO CO LTD·Filed 2013·Granted May 31, 2016·2 cites·18 claims
- 1164US8803026B2Laser machining device and bellows deviceYOKOI SHIGERU·Filed 2011·Granted Aug 12, 2014·1 cites·10 claims
- 1263US8097397B2Material for formation of protective film, method for formation of photoresist pattern, and solution for washing/removal of protective filmTAKAYAMA TOSHIKAZU·Filed 2007·Granted Jan 17, 2012·2 cites·14 claims
- 1359US2010112495A1Photoresist stripping solution and a method of stripping photoresists using the sameYOKOI SHIGERU·Filed 2009·Application pending·0 cites
- 1459US2010051582A1Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewithYOKOI SHIGERU·Filed 2009·Application pending·0 cites
- 1558US2009156005A1Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewithYOKOI SHIGERU·Filed 2009·Application pending·0 cites
- 1658US2010056411A1Treating liquid for photoresist removal and method for treating substrateHARAGUCHI TAKAYUKI·Filed 2009·Application pending·0 cites
- 1758US2009291565A1Method for stripping photoresistYOKOI SHIGERU·Filed 2009·Application pending·0 cites
- 1857US6416930B2Composition for lithographic anti-reflection coating, and resist laminate using the sameTOKYO OHKA KOGYO CO LTD·Filed 2001·Granted Jul 9, 2002·4 cites·7 claims
- 1957US2008280452A1Method for stripping photoresistYOKOI SHIGERU·Filed 2008·Application pending·0 cites
- 2057US2009176677A1Treating liquid for photoresist removal, and method for treating substrateHARAGUCHI TAKAYUKI·Filed 2009·Application pending·0 cites
- 2157US2008241758A1Photoresist stripping solution and a method of stripping photoresists using the sameYOKOI SHIGERU·Filed 2008·Application pending·0 cites
- 2256US2008242575A1Treating liquid for photoresist removal, and method for treating substrateHARAGUCHI TAKAYUKI·Filed 2008·Application pending·0 cites
- 2355US2007298619A1Method for stripping photoresistYOKOI SHIGERU·Filed 2007·Application pending·0 cites
- 2455US2007243494A1Photoresist stripping solution and a method of stripping photoresists using the sameYOKOI SHIGERU·Filed 2007·Application pending·0 cites
- 2553US6894248B2Laser beam machining apparatusMITSUBISHI ELECTRIC CORP·Filed 2003·Granted May 17, 2005·8 cites·19 claims
- 2653US2007003859A1Photoresist stripping solution and a method of stripping photoresists using the sameYOKOI SHIGERU·Filed 2006·Application pending·0 cites
- 2753US2006241012A1Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewithYOKOI SHIGERU·Filed 2006·Application pending·0 cites
- 2852US2007027052A1Cleaning liquid used in photolithography and a method for treating substrate therewithYOKOI SHIGERU·Filed 2006·Application pending·0 cites
- 2952US2007078072A1Photoresist stripping solutionYOKOI SHIGERU·Filed 2006·Application pending·0 cites
- 3052US2006035176A1Photoresist stripping solution and a method of stripping photoresists using the sameYOKOI SHIGERU·Filed 2005·Application pending·0 cites
- 3152US2007037087A1Photoresist stripping solution and a method of stripping photoresists using the sameYOKOI SHIGERU·Filed 2006·Application pending·0 cites
- 3251US2006110690A1Treating liquid for photoresist removal, and method for treating substrateHARAGUCHI TAKAYUKI·Filed 2005·Application pending·0 cites
- 3349US2007105035A1Photoresist stripping solution and method of treating substrate with the sameYOKOI SHIGERU·Filed 2006·Application pending·0 cites
- 3449US2007004933A1Photoresist stripping solution and a method of stripping photoresists using the sameWAKIYA KAZUMASA·Filed 2006·Application pending·0 cites
- 3548US2006014110A1Photoresist stripping solution and a method of stripping photoresists using the sameWAKIYA KAZUMASA·Filed 2005·Application pending·0 cites
- 3646US7129020B2Liquid coating composition for forming a top antireflective film and photoresist laminate using the same, as well as method for forming photoresist patternTOKYO OHKA KOGYO CO LTD·Filed 2003·Granted Oct 31, 2006·1 cites·6 claims
- 3746US2006063688A1Photoresist stripping solution and method of treating substrate with the sameYOKOI SHIGERU·Filed 2005·Application pending·0 cites
- 3845US8859187B2Method of forming resist pattern and negative resist compositionTANAKA KEN·Filed 2007·Granted Oct 14, 2014·0 cites·19 claims
- 3945US2005106492A1Photoresist stripping solution and a method of stripping photoresists using the sameFiled 2004·Application pending·0 cites
- 4045US2015184047A1Method for modifying substrate surface, modifying film and coating solution used for modification of substrate surfaceTOKYO OHKA KOGYO CO LTD·Filed 2013·Application pending·0 cites
- 4145US2005084792A1Photoresist stripping solution and a method of stripping photoresists using the sameFiled 2004·Application pending·0 cites
- 4244US2005019688A1Photoresist stripping solution and a method of stripping photoresists using the sameFiled 2004·Application pending·0 cites
- 4343US2004121937A1Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewithFiled 2003·Application pending·0 cites
- 4442US2003138737A1Photoresist stripping solution and a method of stripping photoresists using the sameFiled 2002·Application pending·0 cites
- 4542US2005176259A1Method for removing photoresistTOKYO OHKA KOGYO CO LTD·Filed 2003·Application pending·0 cites
- 4642US2003114014A1Photoresist stripping solution and a method of stripping photoresists using the sameFiled 2002·Application pending·0 cites
- 4742US2004106532A1Cleaning liquid used in photolithography and a method for treating substrate therewithFiled 2003·Application pending·0 cites
- 4842US2003099908A1Photoresist stripping solution and a method of stripping photoresists using the sameFiled 2002·Application pending·0 cites
- 4940US2013032580A1Optical path structure of laser processing machineMITSUBISHI ELECTRIC CORP·Filed 2011·Application pending·0 cites
- 5039US2005187118A1Cleaning solution, method for cleaning semiconductor substrate using the same, and method for forming metal wiringFiled 2005·Application pending·0 cites
Showing the top 50 of 54 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →