Inventor · disambiguated record
Shoichiro Matsuyama
Also filed as: MATSUYAMA SHOICHIRO
24 granted patents·21 pending applications·153 citations·filing 2003–2024
95Inventor score
Top patents by PatentIndex Score
45 records- 0195US7585386B2Plasma processing apparatus, electrode plate for plasma processing apparatus, and electrode plate manufacturing methodOCTEC INC·Filed 2005·Granted Sep 8, 2009·33 cites·12 claims
- 0292US11830751B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2021·Granted Nov 28, 2023·2 cites·12 claims
- 0392US7619870B2Electrostatic chuckTOKYO ELECTRON LTD·Filed 2007·Granted Nov 17, 2009·24 cites·15 claims
- 0491US11728144B2Edge ring and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Aug 15, 2023·2 cites·15 claims
- 0588US8741098B2Table for use in plasma processing system and plasma processing systemKOSHIISHI AKIRA·Filed 2007·Granted Jun 3, 2014·11 cites·13 claims
- 0688US7625494B2Plasma etching method and plasma etching unitTOKYO ELECTRON LTD·Filed 2004·Granted Dec 1, 2009·35 cites·14 claims
- 0787US12125679B2Plasma processing apparatus and processing methodTOKYO ELECTRON LTD·Filed 2022·Granted Oct 22, 2024·1 cites·11 claims
- 0886US7922862B2Plasma processing apparatus, electrode plate for plasma processing apparatus, and electrode plate manufacturing methodOCTEC INC·Filed 2009·Granted Apr 12, 2011·9 cites·18 claims
- 0981US12046457B2Electrostatic chuck, focus ring, support base, plasma processing apparatus, and plasma processing methodTOKYO ELECTRON LTD·Filed 2019·Granted Jul 23, 2024·2 cites·16 claims
- 1079US11538668B2Mounting stage, substrate processing device, and edge ringTOKYO ELECTRON LTD·Filed 2019·Granted Dec 27, 2022·2 cites·10 claims
- 1179US8295026B2Electrostatic chuck and substrate processing apparatus having sameMATSUYAMA SHOICHIRO·Filed 2009·Granted Oct 23, 2012·7 cites·10 claims
- 1278US9390943B2Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2013·Granted Jul 12, 2016·4 cites·10 claims
- 1377US12394607B2Attracting methodTOKYO ELECTRON LTD·Filed 2023·Granted Aug 19, 2025·0 cites·12 claims
- 1476US7767055B2Capacitive coupling plasma processing apparatusTOKYO ELECTRON LTD·Filed 2005·Granted Aug 3, 2010·5 cites·17 claims
- 1575US8636872B2Upper electrode and plasma processing apparatusMATSUYAMA SHOICHIRO·Filed 2012·Granted Jan 28, 2014·3 cites·12 claims
- 1675US8284538B2Electrostatic chuck deviceHIMORI SHINJI·Filed 2007·Granted Oct 9, 2012·5 cites·15 claims
- 1775US2024347322A1Electrostatic chuck, focus ring, support base, plasma processing apparatus, and plasma processing methodTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1874US11004717B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2018·Granted May 11, 2021·1 cites·12 claims
- 1964US9230824B2Method of manufacturing semiconductor deviceTOKYO ELECTRON LTD·Filed 2014·Granted Jan 5, 2016·2 cites·14 claims
- 2061US11764038B2Plasma processing apparatus, electrostatic attraction method, and electrostatic attraction programTOKYO ELECTRON LTD·Filed 2020·Granted Sep 19, 2023·0 cites·7 claims
- 2160US2021126559A1Attracting method, mounting table, and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2020·Application pending·0 cites
- 2260US2024087857A1Plasma processing apparatus and substrate supportTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 2360US2023369019A1Plasma processing apparatus and method for controlling source frequency of source radio-frequency powerTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 2457US7419613B2Method and device for plasma-etching organic material filmTOKYO ELECTRON LTD·Filed 2003·Granted Sep 2, 2008·5 cites·11 claims
- 2556US8840753B2Plasma etching unitHONDA MASANOBU·Filed 2009·Granted Sep 23, 2014·0 cites·20 claims
- 2655US10879050B2Plasma processing apparatus, electrostatic attraction method, and electrostatic attraction programTOKYO ELECTRON LTD·Filed 2018·Granted Dec 29, 2020·0 cites·6 claims
- 2755US2022375731A1Substrate support, plasma processing apparatus, and plasma processing methodTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 2853US2009101284A1Table for plasma processing apparatus and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 2952US8293655B2Dry etching methodHONDA MASANOBU·Filed 2009·Granted Oct 23, 2012·0 cites·17 claims
- 3050US2008073032A1Stage for plasma processing apparatus, and plasma processing apparatusKOSHIISHI AKIRA·Filed 2007·Application pending·0 cites
- 3149US2010068888A1Dry etching methodTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 3249US2010081287A1Dry etching methodTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 3348US2009203219A1Plasma etching method, plasma etching apparatus and computer-readable storage mediumTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 3448US2021280397A1Plasma processing apparatus, semiconductive member, and semiconductive ringTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 3548US2009203218A1Plasma etching method and computer-readable storage mediumTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 3647US8920598B2Electrode and plasma processing apparatusHAYASHI DAISUKE·Filed 2011·Granted Dec 30, 2014·0 cites·10 claims
- 3747US2011162802A1Plasma processing apparatus, electrode plate for plasma processing apparatus, and electrode plate manufacturing methodOKUMURA KATSUYA·Filed 2011·Application pending·0 cites
- 3847US2011192540A1Table for plasma processing apparatus and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2011·Application pending·0 cites
- 3945US2008062609A1Electrostatic chuck deviceHIMORI SHINJI·Filed 2007·Application pending·0 cites
- 4044US2008062610A1Electrostatic chuck deviceHIMORI SHINJI·Filed 2007·Application pending·0 cites
- 4144US2014284308A1Plasma etching method and plasma etching apparatusTOSHIBA KK·Filed 2014·Application pending·0 cites
- 4243US2006081337A1Capacitive coupling plasma processing apparatusHIMORI SHINJI·Filed 2005·Application pending·0 cites
- 4343US2008041312A1Stage for plasma processing apparatus, and plasma processing apparatusMATSUYAMA SHOICHIRO·Filed 2007·Application pending·0 cites
- 4440US2005039854A1Plasma etching method and plasma etching unitFiled 2004·Application pending·0 cites
- 4537US2011056912A1Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2010·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →