Assignee
MATSUYAMA SHOICHIRO
JP·2 granted patents·1 pending application·10 citations·filing 2007–2012
Top patents by PatentIndex Score
3 records- 0179US8295026B2Electrostatic chuck and substrate processing apparatus having sameMATSUYAMA SHOICHIRO·Filed 2009·Granted Oct 23, 2012·7 cites·10 claims
- 0275US8636872B2Upper electrode and plasma processing apparatusMATSUYAMA SHOICHIRO·Filed 2012·Granted Jan 28, 2014·3 cites·12 claims
- 0343US2008041312A1Stage for plasma processing apparatus, and plasma processing apparatusMATSUYAMA SHOICHIRO·Filed 2007·Application pending·0 cites
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