Inventor · disambiguated record
Yuji Urano
Also filed as: URANO YUJI
13 granted patents·5 pending applications·75 citations·filing 2001–2023
90Inventor score
Top patents by PatentIndex Score
18 records- 0193US9620357B2Method of manufacturing semiconductor device, substrate processing apparatus, and recording mediumHITACHI INT ELECTRIC INC·Filed 2016·Granted Apr 11, 2017·8 cites·14 claims
- 0284US8304328B2Manufacturing method of semiconductor device and substrate processing apparatusMAEDA TAKAHIRO·Filed 2007·Granted Nov 6, 2012·10 cites·26 claims
- 0381US9895727B2Method of manufacturing semiconductor device, method of cleaning interior of process chamber, substrate processing apparatus, and recording mediumHITACHI INT ELECTRIC INC·Filed 2016·Granted Feb 20, 2018·3 cites·21 claims
- 0479USD740769SBoat for substrate processing apparatusHITACHI INT ELECTRIC INC·Filed 2013·Granted Oct 13, 2015·23 cites·1 claims
- 0579US8741783B2Cleaning method, method of manufacturing semiconductor device, substrate processing apparatus and recording mediumKAMEDA KENJI·Filed 2012·Granted Jun 3, 2014·5 cites·17 claims
- 0676US9856560B2Method for manufacturing semiconductor device and substrate processing apparatusKAMEDA KENJI·Filed 2009·Granted Jan 2, 2018·2 cites·19 claims
- 0773US9587308B2Cleaning method, method of manufacturing semiconductor device, substrate processing apparatus, and recording mediumHITACHI INT ELECTRIC INC·Filed 2015·Granted Mar 7, 2017·2 cites·16 claims
- 0871US12195848B2Method of cleaning, method of manufacturing semiconductor device, substrate processing apparatus, and recording mediumKOKUSAI ELECTRIC CORP·Filed 2023·Granted Jan 14, 2025·0 cites·22 claims
- 0971US9881789B2Method of manufacturing semiconductor device, substrate processing apparatus, and recording mediumHITACHI INT ELECTRIC INC·Filed 2017·Granted Jan 30, 2018·1 cites·10 claims
- 1069USD739831SBoat for substrate processing apparatusHITACHI INT ELECTRIC INC·Filed 2013·Granted Sep 29, 2015·15 cites·1 claims
- 1165US2009149032A1Method for manufacturing semiconductor device and substrate processing apparatusHITACHI INT ELECTRIC INC·Filed 2008·Application pending·0 cites
- 1258US11618947B2Method of cleaning, method of manufacturing semiconductor device, substrate processing apparatus, and recording mediumKOKUSAI ELECTRIC CORP·Filed 2019·Granted Apr 4, 2023·0 cites·19 claims
- 1358US2024003005A1Cleaning method, method of manufacturing semiconductor device, substrate processing apparatus, and recording mediumKOKUSAI ELECTRIC CORP·Filed 2023·Application pending·0 cites
- 1457US6777609B2Thermoelectric conversion material and thermoelectric conversion deviceHOKUSHIN CORP·Filed 2002·Granted Aug 17, 2004·4 cites·4 claims
- 1557US2023402281A1Processing method, method of manufacturing semiconductor device, processing apparatus, and recording mediumKOKUSAI ELECTRIC CORP·Filed 2023·Application pending·0 cites
- 1649US2013068159A1Manufacturing Method of Semiconductor Device and Substrate Processing ApparatusHITACHI INT ELECTRIC INC·Filed 2012·Application pending·0 cites
- 1743US6707249B2Electroluminescent device and oxide phosphor for use thereinHOKUSHIN CORP·Filed 2001·Granted Mar 16, 2004·2 cites·20 claims
- 1840US2006033025A1Fluoride single-crystal material for thermoluminescence dosimeter, and thermoluminescence dosimeterHOKUSHIN CORP·Filed 2005·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →