Inventor · disambiguated record
Lindsey Hall
Also filed as: HALL LINDSEY · HALL LINDSEY H
34 granted patents·8 pending applications·664 citations·filing 1994–2014
97Inventor score
Top patents by PatentIndex Score
42 records- 0198US6656748B2FeRAM capacitor post stack etch clean/repairTEXAS INSTRUMENTS INC·Filed 2002·Granted Dec 2, 2003·196 cites·14 claims
- 0295US8944105B2Capacitive sensing apparatus and method for faucetsRODENBECK ROBERT W·Filed 2008·Granted Feb 3, 2015·51 cites·38 claims
- 0392US7060579B2Increased drive current by isotropic recess etchTEXAS INSTRUMENTS INC·Filed 2004·Granted Jun 13, 2006·62 cites·17 claims
- 0486US7422967B2Method for manufacturing a semiconductor device containing metal silicide regionsTEXAS INSTRUMENTS INC·Filed 2005·Granted Sep 9, 2008·15 cites·13 claims
- 0586US7220600B2Ferroelectric capacitor stack etch cleaning methodsTEXAS INSTRUMENTS INC·Filed 2004·Granted May 22, 2007·35 cites·20 claims
- 0686US6876021B2Use of amorphous aluminum oxide on a capacitor sidewall for use as a hydrogen barrierTEXAS INSTRUMENTS INC·Filed 2002·Granted Apr 5, 2005·43 cites·17 claims
- 0784US8940634B2Overlapping contacts for semiconductor deviceENGEL BRETT H·Filed 2011·Granted Jan 27, 2015·8 cites·12 claims
- 0879US7157358B2Method for using a wet etch to manufacturing a semiconductor device having a silicided gate electrode and a method for manufacturing an integrated circuit including the sameTEXAS INSTRUMENTS INC·Filed 2004·Granted Jan 2, 2007·20 cites·19 claims
- 0977US6019806AHigh selectivity slurry for shallow trench isolation processingFiled 1998·Granted Feb 1, 2000·53 cites·36 claims
- 1075US7253049B2Method for fabricating dual work function metal gatesTEXAS INSTRUMENTS INC·Filed 2004·Granted Aug 7, 2007·19 cites·30 claims
- 1174US7253086B2Recessed drain extensions in transistor deviceTEXAS INSTRUMENTS INC·Filed 2004·Granted Aug 7, 2007·15 cites·25 claims
- 1274US7217626B2Transistor fabrication methods using dual sidewall spacersTEXAS INSTRUMENTS INC·Filed 2004·Granted May 15, 2007·18 cites·21 claims
- 1371US9230857B2Method to improve semiconductor surfaces and polishingIBM·Filed 2014·Granted Jan 5, 2016·2 cites·17 claims
- 1471US7422968B2Method for manufacturing a semiconductor device having silicided regionsTEXAS INSTRUMENTS INC·Filed 2004·Granted Sep 9, 2008·16 cites·20 claims
- 1568US8119470B2Mitigation of gate to contact capacitance in CMOS flowEKBOTE SHASHANK SURESHCHANDRA·Filed 2007·Granted Feb 21, 2012·6 cites·10 claims
- 1665US7799582B2Mitigation of edge degradation in ferroelectric memory devices through plasma etch cleanTEXAS INSTRUMENTS INC·Filed 2009·Granted Sep 21, 2010·1 cites·6 claims
- 1762US7244654B2Drive current improvement from recessed SiGe incorporation close to gateTEXAS INSTRUMENTS INC·Filed 2004·Granted Jul 17, 2007·10 cites·20 claims
- 1861US6048406ABenign method for etching silicon dioxideTEXAS INSTRUMENTS INC·Filed 1998·Granted Apr 11, 2000·25 cites·8 claims
- 1960US6372648B1Integrated circuit planarization methodTEXAS INSTRUMENTS INC·Filed 1999·Granted Apr 16, 2002·24 cites·5 claims
- 2059US8053252B2Mitigation of edge degradation in ferroelectric memory devices through plasma etch cleanTEXAS INSTRUMENTS INC·Filed 2009·Granted Nov 8, 2011·0 cites·7 claims
- 2157US6448182B1Stabilization of peroxygen-containing slurries used in a chemical mechanical planarizationTEXAS INSTRUMENTS INC·Filed 1999·Granted Sep 10, 2002·18 cites·11 claims
- 2255US7252773B2Clean for high density capacitorsTEXAS INSTRUMENTS INC·Filed 2002·Granted Aug 7, 2007·4 cites·20 claims
- 2354US7153706B2Ferroelectric capacitor having a substantially planar dielectric layer and a method of manufacture thereforTEXAS INSTRUMENTS INC·Filed 2004·Granted Dec 26, 2006·4 cites·26 claims
- 2453US7572698B2Mitigation of edge degradation in ferroelectric memory devices through plasma etch cleanTEXAS INSTRUMENTS INC·Filed 2006·Granted Aug 11, 2009·0 cites·16 claims
- 2552US7371691B2Silicon recess improvement through improved post implant resist removal and cleansTEXAS INSTRUMENTS INC·Filed 2004·Granted May 13, 2008·3 cites·14 claims
- 2650US7517779B2Recessed drain extensions in transistor deviceTEXAS INSTRUMENTS INC·Filed 2007·Granted Apr 14, 2009·0 cites·7 claims
- 2750US7448395B2Process method to facilitate silicidationTEXAS INSTRUMENTS INC·Filed 2004·Granted Nov 11, 2008·3 cites·14 claims
- 2849US2013241070A1Overlapping contacts for semiconductor deviceIBM·Filed 2013·Application pending·0 cites
- 2947US7723199B2Method for cleaning post-etch noble metal residuesTEXAS INSTRUMENTS INC·Filed 2007·Granted May 25, 2010·0 cites·28 claims
- 3047US6995088B2Surface treatment of copper to improve interconnect formationTEXAS INSTRUMENTS INC·Filed 2004·Granted Feb 7, 2006·2 cites·21 claims
- 3144US2005045590A1FRAM capacitor stack cleanFiled 2004·Application pending·0 cites
- 3243US7341933B2Method for manufacturing a silicided gate electrode using a buffer layerTEXAS INSTRUMENTS INC·Filed 2004·Granted Mar 11, 2008·1 cites·20 claims
- 3343US7228865B2FRAM capacitor stack cleanTEXAS INSTRUMENTS INC·Filed 2003·Granted Jun 12, 2007·0 cites·16 claims
- 3443US2015008488A1Uniform height replacement metal gateST MICROELECTRONICS INC·Filed 2013·Application pending·0 cites
- 3542US9252050B2Method to improve semiconductor surfaces and polishingHALL LINDSEY H·Filed 2012·Granted Feb 2, 2016·0 cites·11 claims
- 3642US6294145B1Piranha etch preparation having long shelf life and method of making sameTEXAS INSTRUMENTS INC·Filed 1994·Granted Sep 25, 2001·8 cites·8 claims
- 3741US2008076191A1GCIB smoothing of the contact level to improve PZT filmsTEXAS INSTRUMENTS INC·Filed 2006·Application pending·0 cites
- 3838US2004166678A1Wet clean method for PZT capacitorsFiled 2003·Application pending·0 cites
- 3938US2004157456A1Surface defect elimination using directed beam methodFiled 2004·Application pending·0 cites
- 4038US2004115946A1Use of a sulfuric acid clean to remove titanium fluoride nodulesFiled 2002·Application pending·0 cites
- 4132US2005233563A1Recess reduction for leakage improvement in high density capacitorsTEXAS INSTRUMENTS INC·Filed 2004·Application pending·0 cites
- 4230US6145372AApparatus and method for detecting impurities in wet chemicalsTEXAS INSTRUMENTS INC·Filed 1998·Granted Nov 14, 2000·2 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →