Inventor · disambiguated record
Kim Kong Tham
Also filed as: THAM KIM KONG
4 granted patents·8 pending applications·3 citations·filing 2015–2021
61Inventor score
Files withTANAKA PRECIOUS METAL IND12
Top patents by PatentIndex Score
12 records- 0179US11072851B2Sputtering targetTANAKA PRECIOUS METAL IND·Filed 2016·Granted Jul 27, 2021·1 cites·3 claims
- 0276US11810700B2In-plane magnetized film, in-plane magnetized film multilayer structure, hard bias layer, magnetoresistive element, and sputtering targetTANAKA PRECIOUS METAL IND·Filed 2019·Granted Nov 7, 2023·1 cites·20 claims
- 0375US10636633B2Sputtering target and process for production thereofTANAKA PRECIOUS METAL IND·Filed 2015·Granted Apr 28, 2020·1 cites·20 claims
- 0468US2021269911A1Sputtering targetTANAKA PRECIOUS METAL IND·Filed 2021·Application pending·0 cites
- 0556US10971181B2Sputtering target for magnetic recording mediaTANAKA PRECIOUS METAL IND·Filed 2017·Granted Apr 6, 2021·0 cites·20 claims
- 0652US2022383901A1Sputtering target for heat-assisted magnetic recording mediumTANAKA PRECIOUS METAL IND·Filed 2020·Application pending·0 cites
- 0748US2021242000A1Sputtering target for magnetic recording mediumTANAKA PRECIOUS METAL IND·Filed 2019·Application pending·0 cites
- 0846US2021087673A1Sputtering targetTANAKA PRECIOUS METAL IND·Filed 2019·Application pending·0 cites
- 0936US2023168319A1In-plane magnetized film multilayer structure, hard bias layer, and magnetoresistive effect elementTANAKA PRECIOUS METAL IND·Filed 2021·Application pending·0 cites
- 1035US2022122635A1Perpendicular magnetic recording mediumTANAKA PRECIOUS METAL IND·Filed 2019·Application pending·0 cites
- 1130US2023203639A1Pt-OXIDE SPUTTERING TARGET AND PERPENDICULAR MAGNETIC RECORDING MEDIUMTANAKA PRECIOUS METAL IND·Filed 2021·Application pending·0 cites
- 1229US2023187109A1In-plane magnetized film, in-plane magnetized film multilayer structure, hard bias layer, magnetoresistance effect element, and sputtering targetTANAKA PRECIOUS METAL IND·Filed 2021·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →