Inventor · disambiguated record
Vishwanathan Rangarajan
Also filed as: RANGARAJAN VISHWANATHAN
12 granted patents·1 pending application·348 citations·filing 2009–2017
93Inventor score
Top patents by PatentIndex Score
13 records- 0198US10043655B2Plasma activated conformal dielectric film depositionNOVELLUS SYSTEMS INC·Filed 2017·Granted Aug 7, 2018·28 cites·20 claims
- 0298US9570274B2Plasma activated conformal dielectric film depositionNOVELLUS SYSTEMS INC·Filed 2015·Granted Feb 14, 2017·30 cites·11 claims
- 0397US8999859B2Plasma activated conformal dielectric film depositionNOVELLUS SYSTEMS INC·Filed 2013·Granted Apr 7, 2015·56 cites·25 claims
- 0497US8846525B2Hardmask materialsNOVELLUS SYSTEMS INC·Filed 2013·Granted Sep 30, 2014·21 cites·7 claims
- 0597US8637411B2Plasma activated conformal dielectric film depositionSWAMINATHAN SHANKAR·Filed 2011·Granted Jan 28, 2014·99 cites·44 claims
- 0694US8288292B2Depositing conformal boron nitride film by CVD without plasmaANTONELLI GEORGE ANDREW·Filed 2010·Granted Oct 16, 2012·16 cites·30 claims
- 0794US8247332B2Hardmask materialsRANGARAJAN VISHWANATHAN·Filed 2009·Granted Aug 21, 2012·20 cites·13 claims
- 0894US8217513B2Remote plasma processing of interface surfacesANTONELLI GEORGE ANDREW·Filed 2011·Granted Jul 10, 2012·24 cites·19 claims
- 0994US8084339B2Remote plasma processing of interface surfacesANTONELLI GEORGE ANDREW·Filed 2009·Granted Dec 27, 2011·29 cites·16 claims
- 1093US8178443B2Hardmask materialsRANGARAJAN VISHWANATHAN·Filed 2009·Granted May 15, 2012·18 cites·21 claims
- 1182US8479683B2Apparatus including a plasma chamber and controller including instructions for forming a boron nitride layerANTONELLI GEORGE ANDREW·Filed 2012·Granted Jul 9, 2013·4 cites·1 claims
- 1265US8536073B2Hardmask materialsRANGARAJAN VISHWANATHAN·Filed 2012·Granted Sep 17, 2013·3 cites·15 claims
- 1348US2010317198A1Remote plasma processing of interface surfacesNOVELLUS SYSTEMS INC·Filed 2009·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →