Inventor · disambiguated record
Youzou Fukagawa
Also filed as: FUKAGAWA YOUZOU
15 granted patents·3 pending applications·238 citations·filing 1994–2017
92Inventor score
Top patents by PatentIndex Score
18 records- 0196US5684856AStage device and pattern transfer system using the sameCANON KK·Filed 1994·Granted Nov 4, 1997·133 cites·16 claims
- 0283US7346886B2Method and apparatus for determining chip arrangement position on substrateCANON KK·Filed 2005·Granted Mar 18, 2008·9 cites·5 claims
- 0383US7301615B2Optical apparatus, method of determining position of optical element in optical system, and device manufacturing methodCANON KK·Filed 2007·Granted Nov 27, 2007·14 cites·12 claims
- 0479US8811714B2Method, apparatus and medium for determining the intensity distribution formed on a pupil plane of an illumination optical systemGYODA YUICHI·Filed 2011·Granted Aug 19, 2014·3 cites·11 claims
- 0579US6081319AIllumination system and scan type exposure apparatusCANON KK·Filed 1995·Granted Jun 27, 2000·45 cites·39 claims
- 0677US7230692B2Optical apparatus, method of determining position of optical element in optical system, and device manufacturing methodCANON KK·Filed 2005·Granted Jun 12, 2007·9 cites·12 claims
- 0771US8450031B2Determination method, exposure method and storage mediumGYODA YUICHI·Filed 2011·Granted May 28, 2013·2 cites·7 claims
- 0861US7084957B2Scanning exposure techniqueCANON KK·Filed 2004·Granted Aug 1, 2006·6 cites·14 claims
- 0958US7894039B2Exposure apparatus and method, and device manufacturing methodCANON KK·Filed 2007·Granted Feb 22, 2011·2 cites·13 claims
- 1057US6947119B2Distortion measurement method and exposure apparatusCANON KK·Filed 2003·Granted Sep 20, 2005·6 cites·21 claims
- 1156US6854105B2Chip arrangement determining apparatus and methodCANON KK·Filed 2003·Granted Feb 8, 2005·5 cites·16 claims
- 1249US2010002212A1Scanning exposure apparatus, exposure method, and device manufacturing methodCANON KK·Filed 2009·Application pending·0 cites
- 1342US9310695B2Exposure apparatus, method of obtaining amount of regulation of object to be regulated, program, and method of manufacturing articleCANON KK·Filed 2013·Granted Apr 12, 2016·0 cites·7 claims
- 1442US2016354969A1Imprint apparatus, imprint method, and article manufacturing methodCANON KK·Filed 2016·Application pending·0 cites
- 1534US2001006422A1Stage system in projection exposure apparatusFiled 2000·Application pending·0 cites
- 1632US5878068AEnergy quantity control methodCANON KK·Filed 1997·Granted Mar 2, 1999·4 cites·10 claims
- 1731US8493551B2Scanning exposure apparatus, control apparatus and method of manufacturing deviceFUKAGAWA YOUZOU·Filed 2010·Granted Jul 23, 2013·0 cites·8 claims
- 1830US10810340B2Semiconductor chip designing method, non-transitory storage medium storing semiconductor chip designing program, semiconductor device production method, and arithmetic deviceLLC Suugakuya Honpo·Filed 2017·Granted Oct 20, 2020·0 cites·13 claims
Join the waitlist — get patent alerts
Get an alert when Youzou Fukagawa files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →