Inventor · disambiguated record
Clifford Stow
Also filed as: STOW CLIFFORD · STOW CLIFFORD C
13 granted patents·7 pending applications·446 citations·filing 2001–2010
94Inventor score
Files withAPPLIED MATERIALS INC18
Top patents by PatentIndex Score
20 records- 0196US6776873B1Yttrium oxide based surface coating for semiconductor IC processing vacuum chambersFiled 2002·Granted Aug 17, 2004·153 cites·6 claims
- 0295US6565984B1Clean aluminum alloy for semiconductor processing equipmentAPPLIED MATERIALS INC·Filed 2002·Granted May 20, 2003·70 cites·24 claims
- 0390US6902628B2Method of cleaning a coated process chamber componentAPPLIED MATERIALS INC·Filed 2002·Granted Jun 7, 2005·41 cites·11 claims
- 0489US8021743B2Process chamber component with layered coating and methodAPPLIED MATERIALS INC·Filed 2009·Granted Sep 20, 2011·17 cites·36 claims
- 0588US6713188B2Clean aluminum alloy for semiconductor processing equipmentAPPLIED MATERIALS INC·Filed 2003·Granted Mar 30, 2004·27 cites·33 claims
- 0686US6659331B2Plasma-resistant, welded aluminum structures for use in semiconductor apparatusAPPLIED MATERIALS INC·Filed 2002·Granted Dec 9, 2003·30 cites·36 claims
- 0783US7048814B2Halogen-resistant, anodized aluminum for use in semiconductor processing apparatusAPPLIED MATERIALS INC·Filed 2002·Granted May 23, 2006·16 cites·4 claims
- 0881US7910218B2Cleaning and refurbishing chamber components having metal coatingsAPPLIED MATERIALS INC·Filed 2003·Granted Mar 22, 2011·25 cites·23 claims
- 0979US7579067B2Process chamber component with layered coating and methodAPPLIED MATERIALS INC·Filed 2004·Granted Aug 25, 2009·18 cites·33 claims
- 1079US6656535B2Method of fabricating a coated process chamber componentAPPLIED MATERIALS INC·Filed 2001·Granted Dec 2, 2003·19 cites·16 claims
- 1178US6899798B2Reusable ceramic-comprising component which includes a scrificial surface layerAPPLIED MATERIALS INC·Filed 2001·Granted May 31, 2005·18 cites·16 claims
- 1262US7033447B2Halogen-resistant, anodized aluminum for use in semiconductor processing apparatusAPPLIED MATERIALS INC·Filed 2002·Granted Apr 25, 2006·8 cites·2 claims
- 1354US7055732B2Semiconductor processing apparatus including plasma-resistant, welded aluminum structuresAPPLIED MATERIALS INC·Filed 2003·Granted Jun 6, 2006·4 cites·23 claims
- 1454US2008213496A1Method of coating semiconductor processing apparatus with protective yttrium-containing coatingsAPPLIED MATERIALS INC·Filed 2007·Application pending·0 cites
- 1552US2004224171A1Electrochemically roughened aluminum semiconductor chamber surfacesFiled 2004·Application pending·0 cites
- 1646US2003047464A1Electrochemically roughened aluminum semiconductor processing apparatus surfacesAPPLIED MATERIALS INC·Filed 2001·Application pending·0 cites
- 1739US2011070811A1Point of use recycling system for cmp slurryAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
- 1837US2005238807A1Refurbishment of a coated chamber componentAPPLIED MATERIALS INC·Filed 2004·Application pending·0 cites
- 1936US2003188685A1Laser drilled surfaces for substrate processing chambersAPPLIED MATERIALS INC·Filed 2002·Application pending·0 cites
- 2035US2011023908A1Methods and apparatus for process abatement with recovery and reuse of abatement effluentAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →